![\"\"](\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-4-300x300.png\")
\u00a0Silisyum Karb\u00fcr (SiC) Kademeli Seramik Plaka, yar\u0131 iletken i\u015fleme ekipman\u0131 ve y\u00fcksek s\u0131cakl\u0131kl\u0131 end\u00fcstriyel sistemler i\u00e7in tasarlanm\u0131\u015f y\u00fcksek performansl\u0131 bir yap\u0131sal seramik bile\u015fendir. Hassas i\u015flenmi\u015f kademeli bir profile sahip olan bile\u015fen, zorlu proses ortamlar\u0131nda do\u011fru konumland\u0131rma, g\u00fcvenli montaj ve m\u00fckemmel boyutsal kararl\u0131l\u0131k sa\u011flar.<\/p>\n
Y\u00fcksek safl\u0131kta silisyum karb\u00fcr seramikten \u00fcretilen bu bile\u015fen, plazmaya maruz kalma, termal \u015fok, kimyasal korozyon ve a\u015f\u0131r\u0131 s\u0131cakl\u0131klara kar\u015f\u0131 ola\u011fan\u00fcst\u00fc diren\u00e7 sunar. Y\u00fcksek sertli\u011fi ve termal iletkenli\u011fi, yar\u0131 iletken ekipman i\u00e7indeki yap\u0131sal ve koruyucu uygulamalar i\u00e7in idealdir.<\/p>\n
Uzun s\u00fcreli g\u00fcvenilirlik i\u00e7in tasarlanan SiC kademeli seramik plakalar, proses odalar\u0131nda, vakum sistemlerinde, termal ekipmanlarda ve plazma ile ilgili yar\u0131 iletken uygulamalar\u0131nda yayg\u0131n olarak kullan\u0131lmaktad\u0131r.<\/p>\n
M\u00fckemmel termal ve mekanik performansa sahip \u226599% SiC seramikten \u00fcretilmi\u015ftir.<\/p>\n
Kademeli kenar geometrisi, do\u011fru konumland\u0131rma ve dengeli mekanik montaj sa\u011flar.<\/p>\n
\u0130nert ortamlarda 1600\u00b0C'nin \u00fczerindeki s\u0131cakl\u0131klarda minimum deformasyonla s\u00fcrekli olarak \u00e7al\u0131\u015fabilir.<\/p>\n
Yar\u0131 iletken \u00fcretiminde kullan\u0131lan plazma erozyonuna ve a\u015f\u0131nd\u0131r\u0131c\u0131 proses gazlar\u0131na kar\u015f\u0131 dayan\u0131kl\u0131d\u0131r.<\/p>\n
120-200 W\/m-K termal iletkenlik, verimli \u0131s\u0131 transferi ve s\u0131cakl\u0131k homojenli\u011fi sa\u011flar.<\/p>\n
Zorlu ko\u015fullar alt\u0131nda uzun s\u00fcreli \u00e7al\u0131\u015fma i\u00e7in m\u00fckemmel sertlik ve a\u015f\u0131nma direnci.<\/p>\n
D\u00fc\u015f\u00fck gaz \u00e7\u0131k\u0131\u015f\u0131 \u00f6zellikleri, temiz ve vakumlu i\u015fleme ortamlar\u0131 i\u00e7in uygun olmas\u0131n\u0131 sa\u011flar.<\/p>\n
Boyutlar, basamak yap\u0131s\u0131, toleranslar ve kenar geometrisi \u00e7izimlere g\u00f6re \u00f6zelle\u015ftirilebilir.<\/p>\n
![\"\"](\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-1-300x300.png\")
Tipik Uygulamalar<\/h2>\n| \u00d6\u011fe<\/th>\n | \u015eartname<\/th>\n<\/tr>\n<\/thead>\n |
|---|---|
| Malzeme<\/td>\n | Silisyum Karb\u00fcr (SiC)<\/td>\n<\/tr>\n |
| Safl\u0131k<\/td>\n | \u226599%<\/td>\n<\/tr>\n |
| Yo\u011funluk<\/td>\n | 3,10-3,20 g\/cm\u00b3<\/td>\n<\/tr>\n |
| Sertlik<\/td>\n | \u22652500 HV<\/td>\n<\/tr>\n |
| E\u011filme Dayan\u0131m\u0131<\/td>\n | \u2265350 MPa<\/td>\n<\/tr>\n |
| Elastik Mod\u00fcl<\/td>\n | ~410 GPa<\/td>\n<\/tr>\n |
| Termal \u0130letkenlik<\/td>\n | 120-200 W\/m-K<\/td>\n<\/tr>\n |
| Termal Genle\u015fme Katsay\u0131s\u0131<\/td>\n | ~4.0 \u00d710-\u2076 \/K<\/td>\n<\/tr>\n |
| Maksimum S\u0131cakl\u0131k (\u0130nert Atmosfer)<\/td>\n | >1600\u00b0C<\/td>\n<\/tr>\n |
| Maksimum S\u0131cakl\u0131k (Hava)<\/td>\n | ~1400\u00b0C<\/td>\n<\/tr>\n |
| Y\u00fczey \u0130\u015flemi<\/td>\n | Zemin \/ \u0130ste\u011fe ba\u011fl\u0131 parlatma<\/td>\n<\/tr>\n |
| \u00c7evre Uyumlulu\u011fu<\/td>\n | Vakum, plazma, a\u015f\u0131nd\u0131r\u0131c\u0131 gaz<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n \n \u00dcretim Kabiliyetleri<\/h2>\nA\u015fa\u011f\u0131dakiler de dahil olmak \u00fczere geli\u015fmi\u015f seramik i\u015fleme teknolojilerini destekliyoruz:<\/p>\n
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