![\"Hassas](\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Precision-Machined-Alumina-Ceramic-Gas-Shower-Disc-for-Semiconductor-and-Industrial-Gas-Distribution-Systems-1-300x300.png\")
99% Al\u00fcmina Seramik Gaz Da\u011f\u0131t\u0131m Yuvas\u0131, geli\u015fmi\u015f end\u00fcstriyel sistemlerde ultra kararl\u0131 gaz ak\u0131\u015f kontrol\u00fc i\u00e7in tasarlanm\u0131\u015f y\u00fcksek performansl\u0131 hassas bir seramik bile\u015fendir. Y\u00fcksek safl\u0131kta 99% al\u00fcminyum oksitten (Al\u2082O\u2083) \u00fcretilmi\u015ftir ve ola\u011fan\u00fcst\u00fc mekanik mukavemet, kimyasal stabilite ve elektrik yal\u0131t\u0131m performans\u0131 sunar.<\/p>\n
Bu bile\u015fen yar\u0131 iletken \u00fcretim ekipmanlar\u0131nda, vakum kaplama sistemlerinde, plazma a\u015f\u0131nd\u0131rma odalar\u0131nda, CVD ve PECVD sistemlerinde ve y\u00fcksek safl\u0131kta gaz da\u011f\u0131t\u0131m mod\u00fcllerinde yayg\u0131n olarak kullan\u0131lmaktad\u0131r.<\/p>\n
Temel i\u015flevi, proses odalar\u0131 boyunca tek tip ve istikrarl\u0131 gaz dif\u00fczyonu sa\u011flamak, proses varyasyonunu azaltmak, verim tutarl\u0131l\u0131\u011f\u0131n\u0131 art\u0131rmak ve kontaminasyon risklerini en aza indirmektir. Metal, kuvars veya daha d\u00fc\u015f\u00fck dereceli seramiklerle kar\u015f\u0131la\u015ft\u0131r\u0131ld\u0131\u011f\u0131nda, 99% al\u00fcmina \u00f6nemli \u00f6l\u00e7\u00fcde \u00fcst\u00fcn a\u015f\u0131nma direnci, boyutsal kararl\u0131l\u0131k ve uzun vadeli g\u00fcvenilirlik sa\u011flar.<\/p>\n
Bu \u00fcr\u00fcn, hassas end\u00fcstriyel ortamlarda en kararl\u0131 ve yayg\u0131n olarak kullan\u0131lan geli\u015fmi\u015f m\u00fchendislik seramiklerinden biri olarak kabul edilen y\u00fcksek yo\u011funluklu 99% al\u00fcmina seramikten yap\u0131lm\u0131\u015ft\u0131r.<\/p>\n
![\"Hassas](\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Precision-Machined-Alumina-Ceramic-Gas-Shower-Disc-for-Semiconductor-and-Industrial-Gas-Distribution-Systems-2-300x300.png\")
Temel malzeme \u00f6zellikleri:<\/h3>\n95% al\u00fcmina ile kar\u015f\u0131la\u015ft\u0131r\u0131ld\u0131\u011f\u0131nda, 99% al\u00fcmina daha y\u00fcksek sertlik, daha iyi a\u015f\u0131nma direnci ve geli\u015fmi\u015f yap\u0131sal stabilite sa\u011flayarak \u00fcst d\u00fczey yar\u0131 iletken ve hassas kaplama sistemleri i\u00e7in daha uygun hale getirir.<\/p>\n
Seramik gaz da\u011f\u0131t\u0131m yuvas\u0131, hassas bir \u015fekilde kontrol edilen g\u00f6zenekli bir yap\u0131 veya mikro kanal sistemi ile tasarlanm\u0131\u015ft\u0131r. Bu yap\u0131, proses gazlar\u0131n\u0131n vakum veya reaksiyon odalar\u0131 i\u00e7inde kontroll\u00fc dif\u00fczyonunu sa\u011flar.<\/p>\n
G\u00f6zenek yap\u0131s\u0131 belirli ak\u0131\u015f h\u0131zlar\u0131na, gaz t\u00fcrlerine ve oda konfig\u00fcrasyonlar\u0131na uyacak \u015fekilde tasarlanabilir.<\/p>\n
![\"Hassas](\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Precision-Machined-Alumina-Ceramic-Gas-Shower-Disc-for-Semiconductor-and-Industrial-Gas-Distribution-Systems-3-300x300.png\")
99% Al\u00fcminan\u0131n Temel Performans Avantajlar\u0131<\/h2>\n| M\u00fclkiyet<\/th>\n | 99% Al\u00fcmina (Al\u2082O\u2083 \u2265 99%)<\/th>\n | 95% Al\u00fcmina<\/th>\n | Zirkonya<\/th>\n | Steatit<\/th>\n<\/tr>\n<\/thead>\n | ||||||||||||||||||||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Yo\u011funluk (g\/cm\u00b3)<\/td>\n | 3.85<\/td>\n | 3.65<\/td>\n | 5.9<\/td>\n | 2.8<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| Su Emme (%)<\/td>\n | 0<\/td>\n | 0<\/td>\n | 0<\/td>\n | 0<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| Sinterleme S\u0131cakl\u0131\u011f\u0131 (\u2103)<\/td>\n | 1690<\/td>\n | 1670<\/td>\n | 1650<\/td>\n | 1350<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| Sertlik (HV)<\/td>\n | 1700<\/td>\n | 1600<\/td>\n | 1400<\/td>\n | 800<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| E\u011filme Dayan\u0131m\u0131 (MPa)<\/td>\n | >350<\/td>\n | >290<\/td>\n | >1100<\/td>\n | 90<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| Bas\u0131n\u00e7 Dayan\u0131m\u0131 (Kgf\/cm\u00b2)<\/td>\n | 30000<\/td>\n | 25000<\/td>\n | 25000<\/td>\n | 4000<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| Maksimum \u00c7al\u0131\u015fma S\u0131cakl\u0131\u011f\u0131 (\u2103)<\/td>\n | 1500<\/td>\n | 1400<\/td>\n | 1600<\/td>\n | 1100<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| Termal Genle\u015fme (\u00d710-\u2076\/\u2103)<\/td>\n | 8<\/td>\n | 7.8<\/td>\n | 10<\/td>\n | 6<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| Termal \u015eok Direnci (\u0394T \u2103)<\/td>\n | 200<\/td>\n | 220<\/td>\n | 350<\/td>\n | 200<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| Termal \u0130letkenlik (W\/m-K)<\/td>\n | 3<\/td>\n | 2<\/td>\n | 3<\/td>\n | 2.5<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| Hacim Diren\u00e7lili\u011fi (\u03a9-cm)<\/td>\n | >10\u00b9\u00b2<\/td>\n | >10\u00b9\u00b2<\/td>\n | >10\u00b9\u00b2<\/td>\n | 10\u00b9\u00b2<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| Dielektrik Dayan\u0131m\u0131 (KV\/mm)<\/td>\n | 18<\/td>\n | 16<\/td>\n | 15<\/td>\n | 10<\/td>\n<\/tr>\n | ||||||||||||||||||||||||||||||
| Dielektrik Sabiti (1MHz)<\/td>\n | 9.2-10.5<\/td>\n | 9.0-10<\/td>\n | 12<\/td>\n | 5.8<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n \n Teknik Parametreler<\/h2>\n\n
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