{"id":2237,"date":"2026-05-18T06:28:52","date_gmt":"2026-05-18T06:28:52","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&#038;p=2237"},"modified":"2026-05-18T06:28:52","modified_gmt":"2026-05-18T06:28:52","slug":"custom-silicon-carbide-stepped-ceramic-plate-for-semiconductor-high-temperature-equipment","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/sv\/product\/custom-silicon-carbide-stepped-ceramic-plate-for-semiconductor-high-temperature-equipment\/","title":{"rendered":"Custom Silicon Carbide Stepped Ceramic Plate for Semiconductor High Temperature Equipment"},"content":{"rendered":"<p data-start=\"444\" data-end=\"817\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2238 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-4-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-4-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-4-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-4-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-4-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-4-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-4-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-4.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/> \u00a0The Silicon Carbide (SiC) Stepped Ceramic Plate is a high-performance structural ceramic component engineered for semiconductor processing equipment and high-temperature industrial systems. Featuring a precision-machined stepped profile, the component enables accurate positioning, secure assembly, and excellent dimensional stability in demanding process environments.<\/p>\n<p data-start=\"819\" data-end=\"1136\">Manufactured from high-purity silicon carbide ceramic, this component offers exceptional resistance to plasma exposure, thermal shock, chemical corrosion, and extreme temperatures. Its high stiffness and thermal conductivity make it ideal for structural and protective applications inside semiconductor equipment.<\/p>\n<p data-start=\"1138\" data-end=\"1319\">Designed for long-term reliability, SiC stepped ceramic plates are widely used in process chambers, vacuum systems, thermal equipment, and plasma-related semiconductor applications.<\/p>\n<hr data-start=\"1321\" data-end=\"1324\" \/>\n<h2 data-section-id=\"1ma7m6t\" data-start=\"1326\" data-end=\"1341\">Viktiga funktioner<\/h2>\n<h3 data-section-id=\"f95hxz\" data-start=\"1343\" data-end=\"1383\">High Purity Silicon Carbide Material<\/h3>\n<p data-start=\"1384\" data-end=\"1469\">Manufactured from \u226599% SiC ceramic with excellent thermal and mechanical performance.<\/p>\n<h3 data-section-id=\"svmjfq\" data-start=\"1471\" data-end=\"1502\">Precision Stepped Structure<\/h3>\n<p data-start=\"1503\" data-end=\"1586\">Stepped edge geometry provides accurate positioning and stable mechanical assembly.<\/p>\n<h3 data-section-id=\"k945fu\" data-start=\"1588\" data-end=\"1621\">Outstanding Thermal Stability<\/h3>\n<p data-start=\"1622\" data-end=\"1736\">Capable of operating continuously at temperatures above 1600\u00b0C in inert environments with minimal deformation.<\/p>\n<h3 data-section-id=\"12w321v\" data-start=\"1738\" data-end=\"1769\">Excellent Plasma Resistance<\/h3>\n<p data-start=\"1770\" data-end=\"1862\">Resistant to plasma erosion and corrosive process gases used in semiconductor manufacturing.<\/p>\n<h3 data-section-id=\"e3yx30\" data-start=\"1864\" data-end=\"1893\">High Thermal Conductivity<\/h3>\n<p data-start=\"1894\" data-end=\"1995\">Thermal conductivity of 120\u2013200 W\/m\u00b7K enables efficient heat transfer and temperature uniformity.<\/p>\n<h3 data-section-id=\"1wy3za\" data-start=\"1997\" data-end=\"2025\">H\u00f6g mekanisk h\u00e5llfasthet<\/h3>\n<p data-start=\"2026\" data-end=\"2116\">Excellent rigidity and wear resistance for long-term operation under demanding conditions.<\/p>\n<h3 data-section-id=\"cq0yxl\" data-start=\"2118\" data-end=\"2139\">Vacuum Compatible<\/h3>\n<p data-start=\"2140\" data-end=\"2233\">Low outgassing characteristics make it suitable for clean and vacuum processing environments.<\/p>\n<h3 data-section-id=\"1me2xty\" data-start=\"2235\" data-end=\"2257\">Fully Customizable<\/h3>\n<p data-start=\"2258\" data-end=\"2356\">Dimensions, step structure, tolerances, and edge geometry can be customized according to drawings.<\/p>\n<hr data-start=\"2358\" data-end=\"2361\" \/>\n<h2 data-section-id=\"164os46\" data-start=\"2363\" data-end=\"2386\"><img decoding=\"async\" class=\"size-medium wp-image-2241 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-1-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-1-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-1-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-1-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-1-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-1-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-1-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Custom-Silicon-Carbide-Stepped-Ceramic-Plate-for-Semiconductor-High-Temperature-Equipment-1.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Typiska till\u00e4mpningar<\/h2>\n<ul data-start=\"2388\" data-end=\"2667\">\n<li data-section-id=\"3hacrt\" data-start=\"2388\" data-end=\"2422\">Semiconductor process chambers<\/li>\n<li data-section-id=\"1q8epty\" data-start=\"2423\" data-end=\"2454\">CVD \/ PECVD \/ LPCVD systems<\/li>\n<li data-section-id=\"17agkqi\" data-start=\"2455\" data-end=\"2483\">Plasma etching equipment<\/li>\n<li data-section-id=\"kxqlw2\" data-start=\"2484\" data-end=\"2517\">Chamber covers and liner caps<\/li>\n<li data-section-id=\"156kf5a\" data-start=\"2518\" data-end=\"2557\">High-temperature support structures<\/li>\n<li data-section-id=\"1uw29t8\" data-start=\"2558\" data-end=\"2587\">Vacuum processing systems<\/li>\n<li data-section-id=\"1vwknu5\" data-start=\"2588\" data-end=\"2624\">Plasma-facing ceramic components<\/li>\n<li data-section-id=\"1uyzplw\" data-start=\"2625\" data-end=\"2667\">Optoelectronic manufacturing equipment<\/li>\n<\/ul>\n<hr data-start=\"2669\" data-end=\"2672\" \/>\n<h2 data-section-id=\"1cgu054\" data-start=\"2674\" data-end=\"2701\">Tekniska specifikationer<\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2703\" data-end=\"3198\">\n<thead data-start=\"2703\" data-end=\"2727\">\n<tr data-start=\"2703\" data-end=\"2727\">\n<th class=\"last:pe-10\" data-start=\"2703\" data-end=\"2710\" data-col-size=\"sm\">F\u00f6rem\u00e5l<\/th>\n<th class=\"last:pe-10\" data-start=\"2710\" data-end=\"2727\" data-col-size=\"sm\">Specifikation<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2739\" data-end=\"3198\">\n<tr data-start=\"2739\" data-end=\"2775\">\n<td data-start=\"2739\" data-end=\"2750\" data-col-size=\"sm\">Material<\/td>\n<td data-col-size=\"sm\" data-start=\"2750\" data-end=\"2775\">Kiselkarbid (SiC)<\/td>\n<\/tr>\n<tr data-start=\"2776\" data-end=\"2793\">\n<td data-start=\"2776\" data-end=\"2785\" data-col-size=\"sm\">Renhet<\/td>\n<td data-start=\"2785\" data-end=\"2793\" data-col-size=\"sm\">\u226599%<\/td>\n<\/tr>\n<tr data-start=\"2794\" data-end=\"2823\">\n<td data-start=\"2794\" data-end=\"2804\" data-col-size=\"sm\">T\u00e4thet<\/td>\n<td data-col-size=\"sm\" data-start=\"2804\" data-end=\"2823\">3.10\u20133.20 g\/cm\u00b3<\/td>\n<\/tr>\n<tr data-start=\"2824\" data-end=\"2847\">\n<td data-start=\"2824\" data-end=\"2835\" data-col-size=\"sm\">H\u00e5rdhet<\/td>\n<td data-col-size=\"sm\" data-start=\"2835\" data-end=\"2847\">\u22652500 HV<\/td>\n<\/tr>\n<tr data-start=\"2848\" data-end=\"2880\">\n<td data-start=\"2848\" data-end=\"2868\" data-col-size=\"sm\">B\u00f6jh\u00e5llfasthet<\/td>\n<td data-col-size=\"sm\" data-start=\"2868\" data-end=\"2880\">\u2265350 MPa<\/td>\n<\/tr>\n<tr data-start=\"2881\" data-end=\"2911\">\n<td data-start=\"2881\" data-end=\"2899\" data-col-size=\"sm\">Elastisk modul<\/td>\n<td data-start=\"2899\" data-end=\"2911\" data-col-size=\"sm\">~410 GPa<\/td>\n<\/tr>\n<tr data-start=\"2912\" data-end=\"2952\">\n<td data-start=\"2912\" data-end=\"2935\" data-col-size=\"sm\">Termisk konduktivitet<\/td>\n<td data-col-size=\"sm\" data-start=\"2935\" data-end=\"2952\">120\u2013200 W\/m\u00b7K<\/td>\n<\/tr>\n<tr data-start=\"2953\" data-end=\"3002\">\n<td data-start=\"2953\" data-end=\"2985\" data-col-size=\"sm\">Termisk expansionskoefficient<\/td>\n<td data-col-size=\"sm\" data-start=\"2985\" data-end=\"3002\">~4.0 \u00d710\u207b\u2076 \/K<\/td>\n<\/tr>\n<tr data-start=\"3003\" data-end=\"3051\">\n<td data-start=\"3003\" data-end=\"3040\" data-col-size=\"sm\">Max Temperature (Inert Atmosphere)<\/td>\n<td data-col-size=\"sm\" data-start=\"3040\" data-end=\"3051\">&gt;1600\u00b0C<\/td>\n<\/tr>\n<tr data-start=\"3052\" data-end=\"3087\">\n<td data-start=\"3052\" data-end=\"3076\" data-col-size=\"sm\">Max Temperature (Air)<\/td>\n<td data-col-size=\"sm\" data-start=\"3076\" data-end=\"3087\">~1400\u00b0C<\/td>\n<\/tr>\n<tr data-start=\"3088\" data-end=\"3136\">\n<td data-start=\"3088\" data-end=\"3105\" data-col-size=\"sm\">Ytfinish<\/td>\n<td data-start=\"3105\" data-end=\"3136\" data-col-size=\"sm\">Ground \/ Optional polishing<\/td>\n<\/tr>\n<tr data-start=\"3137\" data-end=\"3198\">\n<td data-start=\"3137\" data-end=\"3165\" data-col-size=\"sm\">Environment Compatibility<\/td>\n<td data-col-size=\"sm\" data-start=\"3165\" data-end=\"3198\">Vacuum, plasma, corrosive gas<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"3200\" data-end=\"3203\" \/>\n<h2 data-section-id=\"1wm5aj7\" data-start=\"3205\" data-end=\"3234\">Tillverkningskapacitet<\/h2>\n<p data-start=\"3236\" data-end=\"3298\">We support advanced ceramic processing technologies including:<\/p>\n<ul data-start=\"3300\" data-end=\"3503\">\n<li data-section-id=\"1yjo1sg\" data-start=\"3300\" data-end=\"3327\">Precision CNC machining<\/li>\n<li data-section-id=\"vpalwr\" data-start=\"3328\" data-end=\"3348\">Surface grinding<\/li>\n<li data-section-id=\"1lp7417\" data-start=\"3349\" data-end=\"3379\">Fine lapping and polishing<\/li>\n<li data-section-id=\"14ieex5\" data-start=\"3380\" data-end=\"3405\">Custom step machining<\/li>\n<li data-section-id=\"1bxh0om\" data-start=\"3406\" data-end=\"3433\">Edge chamfer processing<\/li>\n<li data-section-id=\"7i2q07\" data-start=\"3434\" data-end=\"3467\">Tight tolerance manufacturing<\/li>\n<li data-section-id=\"l5z84m\" data-start=\"3468\" data-end=\"3503\">Prototype and volume production<\/li>\n<\/ul>\n<hr data-start=\"3505\" data-end=\"3508\" \/>\n<h2 data-section-id=\"rnyyeg\" data-start=\"3510\" data-end=\"3534\">Anpassningsalternativ<\/h2>\n<p data-start=\"3536\" data-end=\"3569\">Available customization includes:<\/p>\n<ul data-start=\"3571\" data-end=\"3777\">\n<li data-section-id=\"1tl0gsr\" data-start=\"3571\" data-end=\"3603\">Outer diameter and thickness<\/li>\n<li data-section-id=\"78t2qw\" data-start=\"3604\" data-end=\"3629\">Step height and width<\/li>\n<li data-section-id=\"1t78q28\" data-start=\"3630\" data-end=\"3655\">Flatness requirements<\/li>\n<li data-section-id=\"1mw7yxi\" data-start=\"3656\" data-end=\"3685\">Surface roughness control<\/li>\n<li data-section-id=\"1ecbghc\" data-start=\"3686\" data-end=\"3717\">Edge structure and chamfers<\/li>\n<li data-section-id=\"1d7tha5\" data-start=\"3718\" data-end=\"3744\">Fine polishing options<\/li>\n<li data-section-id=\"yd3rm8\" data-start=\"3745\" data-end=\"3777\">Drawing-based OEM production<\/li>\n<\/ul>\n<hr data-start=\"3779\" data-end=\"3782\" \/>\n<h2 data-section-id=\"9t4t8j\" data-start=\"3784\" data-end=\"3823\">Advantages of SiC Ceramic Components<\/h2>\n<p data-start=\"3825\" data-end=\"3882\">Compared with conventional materials, SiC ceramic offers:<\/p>\n<ul data-start=\"3884\" data-end=\"4091\">\n<li data-section-id=\"1vok2kl\" data-start=\"3884\" data-end=\"3915\">Higher thermal conductivity<\/li>\n<li data-section-id=\"14fpsq4\" data-start=\"3916\" data-end=\"3951\">Better thermal shock resistance<\/li>\n<li data-section-id=\"vpkota\" data-start=\"3952\" data-end=\"3982\">Superior plasma durability<\/li>\n<li data-section-id=\"1y67fsp\" data-start=\"3983\" data-end=\"4010\">L\u00e4gre termisk expansion<\/li>\n<li data-section-id=\"10nv22i\" data-start=\"4011\" data-end=\"4040\">Stark kemisk stabilitet<\/li>\n<li data-section-id=\"sevfm0\" data-start=\"4041\" data-end=\"4091\">Longer service life in semiconductor equipment<\/li>\n<\/ul>\n<hr data-start=\"4093\" data-end=\"4096\" \/>\n<h2 data-section-id=\"1hryhf7\" data-start=\"4098\" data-end=\"4104\">VANLIGA FR\u00c5GOR<\/h2>\n<p data-start=\"4106\" data-end=\"4266\">Q1: What is the primary purpose of the stepped structure?<br data-start=\"4167\" data-end=\"4170\" \/>The stepped geometry enables precise positioning and reliable assembly inside process equipment.<\/p>\n<p data-start=\"4268\" data-end=\"4420\">Q2: Can this component withstand plasma environments?<br data-start=\"4325\" data-end=\"4328\" \/>Yes. Silicon carbide has excellent resistance to plasma erosion and corrosive process gases.<\/p>\n<p data-start=\"4422\" data-end=\"4557\">Q3: Is the component vacuum compatible?<br data-start=\"4465\" data-end=\"4468\" \/>Yes. The material exhibits low outgassing and stable performance under vacuum conditions.<\/p>\n<p data-start=\"4559\" data-end=\"4709\">Q4: Can dimensions be customized?<br data-start=\"4596\" data-end=\"4599\" \/>Yes. Size, step profile, tolerances, and edge features can all be produced according to customer requirements.<\/p>\n<p data-start=\"4711\" data-end=\"4845\">Q5: Are polished versions available?<br data-start=\"4751\" data-end=\"4754\" \/>Optional fine grinding and polishing can be provided depending on application requirements.<\/p>","protected":false},"excerpt":{"rendered":"<p>The Silicon Carbide (SiC) Stepped Ceramic Plate is a high-performance structural ceramic component engineered for semiconductor processing equipment and high-temperature industrial systems. Featuring a precision-machined stepped profile, the component enables accurate positioning, secure assembly, and excellent dimensional stability in demanding process environments.<\/p>","protected":false},"featured_media":2239,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center 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