{"id":2041,"date":"2026-05-08T05:45:52","date_gmt":"2026-05-08T05:45:52","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&p=2041"},"modified":"2026-05-08T05:45:52","modified_gmt":"2026-05-08T05:45:52","slug":"sic-ceramic-end-effector-for-precision-wafer-handling-in-semiconductor-equipment","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/sv\/product\/sic-ceramic-end-effector-for-precision-wafer-handling-in-semiconductor-equipment\/","title":{"rendered":"SiC-keramisk endeffektor f\u00f6r precisionshantering av wafers i halvledarutrustning"},"content":{"rendered":"

\"\"Den SiC-keramisk endeffektor<\/strong> \u00e4r en h\u00f6gpresterande waferhanteringskomponent avsedd f\u00f6r halvledarautomation och precisionsrobotsystem. Den \u00e4r tillverkad av kiselkarbidkeramik (SiC) med mycket h\u00f6g renhet och erbjuder enast\u00e5ende mekanisk styrka, termisk stabilitet och kemisk resistens i extrema processmilj\u00f6er.<\/p>\n

J\u00e4mf\u00f6rt med konventionella slutstycken i aluminium, rostfritt st\u00e5l eller kvarts \u00e4r SiC-keramisk endeffektor<\/strong> ger betydligt l\u00e4gre partikelgenerering, \u00f6verl\u00e4gsen dimensionsstabilitet och utm\u00e4rkt motst\u00e5ndskraft mot termisk deformation. Den anv\u00e4nds ofta i system f\u00f6r \u00f6verf\u00f6ring av wafers d\u00e4r precision, renhet och tillf\u00f6rlitlighet \u00e4r avg\u00f6rande.<\/p>\n

Denna produkt \u00e4r l\u00e4mplig f\u00f6r avancerade milj\u00f6er f\u00f6r halvledartillverkning, inklusive vakuumkammare, plasmaprocesser och h\u00f6gtemperaturutrustning.<\/p>\n

\n

Tekniska specifikationer<\/h2>\n
\n
\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n
Fastighet<\/th>\nEnhet<\/th>\nV\u00e4rde<\/th>\n<\/tr>\n<\/thead>\n
Kristallstruktur<\/td>\n-<\/td>\nFCC \u03b2 Fas<\/td>\n<\/tr>\n
T\u00e4thet<\/td>\ng\/cm\u00b3<\/td>\n3.21<\/td>\n<\/tr>\n
Kemisk renhet<\/td>\n%<\/td>\n99.99995<\/td>\n<\/tr>\n
H\u00e5rdhet<\/td>\nHV<\/td>\n2500<\/td>\n<\/tr>\n
B\u00f6jh\u00e5llfasthet<\/td>\nMPa<\/td>\n415<\/td>\n<\/tr>\n
Young's modul<\/td>\nGPa<\/td>\n430<\/td>\n<\/tr>\n
Termisk konduktivitet<\/td>\nW\/m-K<\/td>\n300<\/td>\n<\/tr>\n
Termisk expansionskoefficient<\/td>\n10-\u2076\/K<\/td>\n4.5<\/td>\n<\/tr>\n
Maximal driftstemperatur<\/td>\n\u00b0C<\/td>\n2700<\/td>\n<\/tr>\n
V\u00e4rmekapacitet<\/td>\nJ-kg-\u00b9-K-\u00b9<\/td>\n640<\/td>\n<\/tr>\n
Kornstorlek<\/td>\n\u03bcm<\/td>\n2-10<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n
\n

\"\"Viktiga funktioner<\/h2>\n

Material med ultrah\u00f6g renhet<\/strong>
S\u00e4kerst\u00e4ller minimal partikelf\u00f6rorening i renrumsmilj\u00f6er.<\/p>\n

Utm\u00e4rkt termisk stabilitet<\/strong>
Bibeh\u00e5ller strukturell integritet under upprepad termisk cykling och bearbetning vid h\u00f6g temperatur.<\/p>\n

L\u00e5g v\u00e4rmeutvidgning<\/strong>
Ger h\u00f6g dimensionell noggrannhet vid \u00f6verf\u00f6ring av wafers.<\/p>\n

H\u00f6g mekanisk h\u00e5llfasthet<\/strong>
Motst\u00e5ndskraftig mot brott, slitage och l\u00e5ngvarig utmattning i kontinuerliga produktionssystem.<\/p>\n

Kemisk best\u00e4ndighet<\/strong>
Stabil i plasma, korrosiva gaser och vakuummilj\u00f6er.<\/p>\n

Ultra sl\u00e4t ytfinish<\/strong>
Minskar repor p\u00e5 wafern och f\u00f6rb\u00e4ttrar hanteringss\u00e4kerheten.<\/p>\n

L\u00e5ng livsl\u00e4ngd<\/strong>
Utformad f\u00f6r tillverkningssystem f\u00f6r halvledare med h\u00f6g kapacitet.<\/p>\n

\n

Tillverkningsprocess<\/h2>\n

Den SiC-keramisk endeffektor<\/strong> tillverkas med hj\u00e4lp av avancerad keramisk teknik.<\/p>\n

Kiselkarbidpulver med h\u00f6g renhet v\u00e4ljs ut och kontrolleras strikt f\u00f6r att s\u00e4kerst\u00e4lla materialkonsistens.<\/p>\n

Precisionsformning sker med hj\u00e4lp av isostatisk kallpressning eller formsprutning f\u00f6r att uppn\u00e5 komplexa geometrier.<\/p>\n

H\u00f6gtemperatursintring \u00f6ver 2000\u00b0C s\u00e4kerst\u00e4ller full f\u00f6rt\u00e4tning och strukturell stabilitet.<\/p>\n

CNC-diamantbearbetning anv\u00e4nds f\u00f6r att uppn\u00e5 precision p\u00e5 mikroniv\u00e5 och planhet av wafer-kvalitet.<\/p>\n

Slutlig polering och inspektion s\u00e4kerst\u00e4ller \u00f6verensst\u00e4mmelse med standarder f\u00f6r halvledarkvalitet.<\/p>\n

Varje produkt genomg\u00e5r en strikt dimensionskontroll, ytkvalitetstestning och icke-f\u00f6rst\u00f6rande utv\u00e4rdering f\u00f6re leverans.<\/p>\n

\n

Till\u00e4mpningar<\/h2>\n

Den SiC-keramisk endeffektor<\/strong> anv\u00e4nds ofta i halvledar- och h\u00f6gprecisionsautomationssystem.<\/p>\n

System f\u00f6r \u00f6verf\u00f6ring av wafers f\u00f6r 6-tums, 8-tums och 12-tums wafers<\/p>\n

Robotiserade waferhanteringssystem i vakuumkammare<\/p>\n

CVD-, ALD-, ets- och deponeringsutrustning<\/p>\n

Automatiserade lastnings- och lossningssystem FOUP och FOSB<\/p>\n

Produktionslinjer f\u00f6r automatisering av wafers i renrum<\/p>\n

System f\u00f6r laserbearbetning och termisk gl\u00f6dgning<\/p>\n

\"\"<\/p>\n

\n

F\u00f6rdelar j\u00e4mf\u00f6rt med traditionella material<\/h2>\n

J\u00e4mf\u00f6rt med aluminiumslutstycken ger SiC-keramik b\u00e4ttre termisk stabilitet och eliminerar risken f\u00f6r metallkontaminering.<\/p>\n

J\u00e4mf\u00f6rt med kvarts erbjuder den h\u00f6gre mekanisk h\u00e5llfasthet och l\u00e4gre partikelgenerering.<\/p>\n

J\u00e4mf\u00f6rt med rostfritt st\u00e5l fungerar det mer tillf\u00f6rlitligt i plasma- och h\u00f6gtemperaturmilj\u00f6er.<\/p>\n

\n

VANLIGA FR\u00c5GOR<\/h2>\n

Varf\u00f6r v\u00e4lja SiC keramisk endeffektor ist\u00e4llet f\u00f6r metall eller kvarts?<\/strong>
SiC-keramik ger \u00f6verl\u00e4gsen termisk stabilitet, kemisk best\u00e4ndighet och extremt l\u00e5g partikelgenerering, vilket g\u00f6r den idealisk f\u00f6r avancerade halvledarprocesser.<\/p>\n

Kan den anpassas?<\/strong>
Ja, vi st\u00f6der fullst\u00e4ndig kundanpassning, inklusive geometri, arml\u00e4ngd, monteringsgr\u00e4nssnitt och kompatibilitet med waferstorlek.<\/p>\n

\u00c4r den l\u00e4mplig f\u00f6r vakuum- och plasmasystem?<\/strong>
Ja, SiC-keramik \u00e4r kemiskt inert och fungerar tillf\u00f6rlitligt i ultrah\u00f6gt vakuum och plasmamilj\u00f6er.<\/p>\n

Hur l\u00e5ng \u00e4r livsl\u00e4ngden?<\/strong>
Den erbjuder betydligt l\u00e4ngre livsl\u00e4ngd j\u00e4mf\u00f6rt med konventionella \u00e4ndstycken av metall eller kvarts under normala driftsf\u00f6rh\u00e5llanden.<\/p>\n

Tillhandah\u00e5ller du inspektionsrapporter?<\/strong>
Ja, vi tillhandah\u00e5ller m\u00e5ttrapporter, materialcertifikat och dokumentation fr\u00e5n kvalitetskontroller p\u00e5 beg\u00e4ran.<\/p>","protected":false},"excerpt":{"rendered":"

Den SiC-keramisk endeffektor<\/strong> \u00e4r en h\u00f6gpresterande waferhanteringskomponent avsedd f\u00f6r halvledarautomation och precisionsrobotsystem. Den \u00e4r tillverkad av kiselkarbidkeramik (SiC) med mycket h\u00f6g renhet och erbjuder enast\u00e5ende mekanisk styrka, termisk stabilitet och kemisk resistens i extrema processmilj\u00f6er.<\/p>","protected":false},"featured_media":2045,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}}},"product_brand":[],"product_cat":[23],"product_tag":[114,116,117,115,113,119,112,108,107,110,105,104,109,118,111,106],"class_list":["post-2041","product","type-product","status-publish","has-post-thumbnail","product_cat-silicon-carbide-sic","product_tag-cleanroom-automation","product_tag-cvd-ald-equipment-parts","product_tag-etching-equipment-components","product_tag-foup-fosb-handling","product_tag-high-temperature-ceramic","product_tag-industrial-ceramic-components","product_tag-plasma-resistant-materials","product_tag-precision-ceramic-components","product_tag-robotic-end-effector","product_tag-semiconductor-equipment-parts","product_tag-semiconductor-wafer-handling","product_tag-sic-ceramic-end-effector","product_tag-silicon-carbide-ceramic","product_tag-ultra-high-purity-ceramics","product_tag-vacuum-compatible-components","product_tag-wafer-transfer-system","desktop-align-left","tablet-align-left","mobile-align-left","first","instock","shipping-taxable","product-type-simple"],"_links":{"self":[{"href":"https:\/\/www.xkh-ceramics.com\/sv\/wp-json\/wp\/v2\/product\/2041","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.xkh-ceramics.com\/sv\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.xkh-ceramics.com\/sv\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/sv\/wp-json\/wp\/v2\/comments?post=2041"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/sv\/wp-json\/wp\/v2\/media\/2045"}],"wp:attachment":[{"href":"https:\/\/www.xkh-ceramics.com\/sv\/wp-json\/wp\/v2\/media?parent=2041"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/sv\/wp-json\/wp\/v2\/product_brand?post=2041"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/sv\/wp-json\/wp\/v2\/product_cat?post=2041"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/sv\/wp-json\/wp\/v2\/product_tag?post=2041"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}