{"id":2110,"date":"2026-05-12T06:26:35","date_gmt":"2026-05-12T06:26:35","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&#038;p=2110"},"modified":"2026-05-12T06:28:57","modified_gmt":"2026-05-12T06:28:57","slug":"full-cvd-sic-wafer-carrier-tray-plate-for-semiconductor-mocvd-etching-equipment","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/pt\/product\/full-cvd-sic-wafer-carrier-tray-plate-for-semiconductor-mocvd-etching-equipment\/","title":{"rendered":"Placa de bandeja de suporte de wafer SiC totalmente CVD para equipamento de grava\u00e7\u00e3o e MOCVD de semicondutores"},"content":{"rendered":"<p data-start=\"199\" data-end=\"387\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2111 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>A placa de bandeja de cer\u00e2mica SiC \u00e9 um suporte de bolacha de alto desempenho concebido para processos avan\u00e7ados de semicondutores, como MOCVD, epitaxia e grava\u00e7\u00e3o ICP. Est\u00e1 dispon\u00edvel em duas estruturas:<\/p>\n<ul data-start=\"389\" data-end=\"486\">\n<li data-section-id=\"1a2m83y\" data-start=\"389\" data-end=\"434\">Substrato de grafite com revestimento de SiC por CVD<\/li>\n<li data-section-id=\"h6gq41\" data-start=\"435\" data-end=\"486\">Tabuleiro monol\u00edtico de SiC CVD de elevada pureza (\u226599,99%)<\/li>\n<\/ul>\n<p data-start=\"488\" data-end=\"728\">Em compara\u00e7\u00e3o com os suportes de grafite convencionais, este produto oferece uma estabilidade t\u00e9rmica, resist\u00eancia \u00e0 corros\u00e3o e vida \u00fatil significativamente melhoradas, tornando-o ideal para ambientes exigentes de fabrico de semicondutores a alta temperatura.<\/p>\n<p data-start=\"730\" data-end=\"847\">\u00c9 amplamente utilizado na produ\u00e7\u00e3o de LED GaN, no fabrico de semicondutores de pot\u00eancia e em sistemas de processamento de bolachas de precis\u00e3o.<\/p>\n<hr data-start=\"849\" data-end=\"852\" \/>\n<h1 data-section-id=\"1j1pcx4\" data-start=\"854\" data-end=\"885\"><span role=\"text\">Principais carater\u00edsticas e vantagens<\/span><\/h1>\n<h3 data-section-id=\"1alapmz\" data-start=\"887\" data-end=\"931\"><span role=\"text\">1. Resist\u00eancia a temperaturas ultra-elevadas<\/span><\/h3>\n<ul data-start=\"932\" data-end=\"1084\">\n<li data-section-id=\"n8q3t9\" data-start=\"932\" data-end=\"970\">Funcionamento est\u00e1vel a 1100-1200\u00b0C+<\/li>\n<li data-section-id=\"zbjl5k\" data-start=\"971\" data-end=\"1033\">Adequado para ambientes agressivos de MOCVD e crescimento epitaxial<\/li>\n<li data-section-id=\"1p7r2f0\" data-start=\"1034\" data-end=\"1084\">Sem deforma\u00e7\u00e3o sob ciclos t\u00e9rmicos de longa dura\u00e7\u00e3o<\/li>\n<\/ul>\n<h3 data-section-id=\"1xbme7x\" data-start=\"1086\" data-end=\"1132\"><span role=\"text\">2. Prote\u00e7\u00e3o superior do revestimento CVD SiC<\/span><\/h3>\n<ul data-start=\"1133\" data-end=\"1295\">\n<li data-section-id=\"1yg8xxq\" data-start=\"1133\" data-end=\"1163\">Pureza at\u00e9 99,999% SiC<\/li>\n<li data-section-id=\"fof224\" data-start=\"1164\" data-end=\"1228\">O revestimento denso impede a penetra\u00e7\u00e3o de g\u00e1s e a eros\u00e3o do substrato<\/li>\n<li data-section-id=\"i9f016\" data-start=\"1229\" data-end=\"1295\">Elimina a contamina\u00e7\u00e3o por part\u00edculas de grafite no processamento de bolachas<\/li>\n<\/ul>\n<h3 data-section-id=\"r23teu\" data-start=\"1297\" data-end=\"1349\"><span role=\"text\">3. Excelente resist\u00eancia \u00e0 corros\u00e3o e aos produtos qu\u00edmicos<\/span><\/h3>\n<ul data-start=\"1350\" data-end=\"1472\">\n<li data-section-id=\"jgfj1d\" data-start=\"1350\" data-end=\"1412\">Resistente a HF, H\u2082SO\u2084, HCl e gases de processo reactivos<\/li>\n<li data-section-id=\"1yalk8d\" data-start=\"1413\" data-end=\"1472\">Ideal para ambientes agressivos de grava\u00e7\u00e3o de semicondutores<\/li>\n<\/ul>\n<h3 data-section-id=\"ughzy4\" data-start=\"1474\" data-end=\"1528\"><span role=\"text\">4. Alta condutividade t\u00e9rmica e aquecimento uniforme<\/span><\/h3>\n<ul data-start=\"1529\" data-end=\"1642\">\n<li data-section-id=\"10oy89q\" data-start=\"1529\" data-end=\"1594\">Garante uma distribui\u00e7\u00e3o uniforme da temperatura na superf\u00edcie da bolacha<\/li>\n<li data-section-id=\"1rsv4ef\" data-start=\"1595\" data-end=\"1642\">Melhora a qualidade da pel\u00edcula e a estabilidade do processo<\/li>\n<\/ul>\n<h3 data-section-id=\"rhgagc\" data-start=\"1644\" data-end=\"1672\"><span role=\"text\">5. Longa vida \u00fatil<\/span><\/h3>\n<ul data-start=\"1673\" data-end=\"1796\">\n<li data-section-id=\"1wgev4f\" data-start=\"1673\" data-end=\"1743\">Vida \u00fatil at\u00e9 4 vezes mais longa do que os tabuleiros tradicionais \u00e0 base de grafite<\/li>\n<li data-section-id=\"tsrdbt\" data-start=\"1744\" data-end=\"1796\">Tempo de inatividade reduzido e menor frequ\u00eancia de substitui\u00e7\u00e3o<\/li>\n<\/ul>\n<p><img decoding=\"async\" class=\"alignnone size-medium wp-image-2114\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/> <img decoding=\"async\" class=\"alignnone size-medium wp-image-2113\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/> <img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-medium wp-image-2112\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/p>\n<hr data-start=\"1798\" data-end=\"1801\" \/>\n<h1 data-section-id=\"10k15yz\" data-start=\"1803\" data-end=\"1833\"><span role=\"text\">Especifica\u00e7\u00f5es t\u00e9cnicas<\/span><\/h1>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1835\" data-end=\"2207\">\n<thead data-start=\"1835\" data-end=\"1856\">\n<tr data-start=\"1835\" data-end=\"1856\">\n<th class=\"last:pe-10\" data-start=\"1835\" data-end=\"1847\" data-col-size=\"sm\">Par\u00e2metro<\/th>\n<th class=\"last:pe-10\" data-start=\"1847\" data-end=\"1856\" data-col-size=\"md\">Valor<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"1877\" data-end=\"2207\">\n<tr data-start=\"1877\" data-end=\"1938\">\n<td data-start=\"1877\" data-end=\"1893\" data-col-size=\"sm\">Tipo de material<\/td>\n<td data-start=\"1893\" data-end=\"1938\" data-col-size=\"md\">Grafite + revestimento CVD SiC \/ SiC totalmente CVD<\/td>\n<\/tr>\n<tr data-start=\"1939\" data-end=\"1993\">\n<td data-start=\"1939\" data-end=\"1952\" data-col-size=\"sm\">Pureza SiC<\/td>\n<td data-start=\"1952\" data-end=\"1993\" data-col-size=\"md\">\u226599,9% (revestido), \u226599,99% (monol\u00edtico)<\/td>\n<\/tr>\n<tr data-start=\"1994\" data-end=\"2032\">\n<td data-start=\"1994\" data-end=\"2011\" data-col-size=\"sm\">Gama de di\u00e2metros<\/td>\n<td data-start=\"2011\" data-end=\"2032\" data-col-size=\"md\">\u03a6380 mm - \u03a6600 mm<\/td>\n<\/tr>\n<tr data-start=\"2033\" data-end=\"2072\">\n<td data-start=\"2033\" data-end=\"2057\" data-col-size=\"sm\">Temperatura de funcionamento<\/td>\n<td data-col-size=\"md\" data-start=\"2057\" data-end=\"2072\">1100-1200\u00b0C<\/td>\n<\/tr>\n<tr data-start=\"2073\" data-end=\"2104\">\n<td data-start=\"2073\" data-end=\"2096\" data-col-size=\"sm\">Condutividade t\u00e9rmica<\/td>\n<td data-col-size=\"md\" data-start=\"2096\" data-end=\"2104\">Elevado<\/td>\n<\/tr>\n<tr data-start=\"2105\" data-end=\"2163\">\n<td data-start=\"2105\" data-end=\"2128\" data-col-size=\"sm\">Resist\u00eancia \u00e0 corros\u00e3o<\/td>\n<td data-col-size=\"md\" data-start=\"2128\" data-end=\"2163\">Excelente (resistente a HF, H\u2082SO\u2084)<\/td>\n<\/tr>\n<tr data-start=\"2164\" data-end=\"2207\">\n<td data-start=\"2164\" data-end=\"2179\" data-col-size=\"sm\">Vida \u00fatil<\/td>\n<td data-start=\"2179\" data-end=\"2207\" data-col-size=\"md\">~4\u00d7 tabuleiros \u00e0 base de grafite<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"2209\" data-end=\"2212\" \/>\n<h1 data-section-id=\"18cvqw\" data-start=\"2214\" data-end=\"2237\"><span role=\"text\">\u00c1reas de aplica\u00e7\u00e3o<\/span><\/h1>\n<h3 data-section-id=\"bm5nu5\" data-start=\"2239\" data-end=\"2274\"><span role=\"text\">Fabrico de semicondutores<\/span><\/h3>\n<ul data-start=\"2275\" data-end=\"2438\">\n<li data-section-id=\"pooj76\" data-start=\"2275\" data-end=\"2326\">MOCVD (Deposi\u00e7\u00e3o de vapor qu\u00edmico org\u00e2nico met\u00e1lico)<\/li>\n<li data-section-id=\"c8v0nb\" data-start=\"2327\" data-end=\"2370\">Crescimento epitaxial de bolachas (GaN, SiC, etc.)<\/li>\n<li data-section-id=\"15uw81h\" data-start=\"2371\" data-end=\"2396\">Processos de grava\u00e7\u00e3o ICP<\/li>\n<li data-section-id=\"1xtyszn\" data-start=\"2397\" data-end=\"2438\">Sistemas de manuseamento de bolachas de alta precis\u00e3o<\/li>\n<\/ul>\n<h3 data-section-id=\"yf7wep\" data-start=\"2440\" data-end=\"2460\"><span role=\"text\">Ind\u00fastria LED<\/span><\/h3>\n<ul data-start=\"2461\" data-end=\"2545\">\n<li data-section-id=\"b1ebdf\" data-start=\"2461\" data-end=\"2508\">Produ\u00e7\u00e3o de LEDs azuis e brancos de alto brilho<\/li>\n<li data-section-id=\"9w14a9\" data-start=\"2509\" data-end=\"2545\">Dispositivos optoelectr\u00f3nicos baseados em GaN<\/li>\n<\/ul>\n<h3 data-section-id=\"d5g3k9\" data-start=\"2547\" data-end=\"2575\"><span role=\"text\">Eletr\u00f3nica avan\u00e7ada<\/span><\/h3>\n<ul data-start=\"2576\" data-end=\"2670\">\n<li data-section-id=\"14t88vj\" data-start=\"2576\" data-end=\"2600\">Semicondutores de pot\u00eancia<\/li>\n<li data-section-id=\"8rvytg\" data-start=\"2601\" data-end=\"2627\">Dispositivos de alta frequ\u00eancia<\/li>\n<li data-section-id=\"4tdco8\" data-start=\"2628\" data-end=\"2670\">Sistemas de deposi\u00e7\u00e3o de pel\u00edcula fina de precis\u00e3o<\/li>\n<\/ul>\n<hr data-start=\"2672\" data-end=\"2675\" \/>\n<h1 data-section-id=\"1umg5ep\" data-start=\"2677\" data-end=\"2735\"><span role=\"text\">Vantagens de desempenho em rela\u00e7\u00e3o aos tabuleiros de grafite tradicionais<\/span><\/h1>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2737\" data-end=\"3069\">\n<thead data-start=\"2737\" data-end=\"2783\">\n<tr data-start=\"2737\" data-end=\"2783\">\n<th class=\"last:pe-10\" data-start=\"2737\" data-end=\"2744\" data-col-size=\"sm\">Item<\/th>\n<th class=\"last:pe-10\" data-start=\"2744\" data-end=\"2760\" data-col-size=\"sm\">Tabuleiro em grafite<\/th>\n<th class=\"last:pe-10\" data-start=\"2760\" data-end=\"2783\" data-col-size=\"sm\">Tabuleiro revestido com SiC CVD<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2831\" data-end=\"3069\">\n<tr data-start=\"2831\" data-end=\"2878\">\n<td data-start=\"2831\" data-end=\"2856\" data-col-size=\"sm\">Resist\u00eancia \u00e0 temperatura<\/td>\n<td data-col-size=\"sm\" data-start=\"2856\" data-end=\"2865\">M\u00e9dio<\/td>\n<td data-col-size=\"sm\" data-start=\"2865\" data-end=\"2878\">Muito elevado<\/td>\n<\/tr>\n<tr data-start=\"2879\" data-end=\"2922\">\n<td data-start=\"2879\" data-end=\"2902\" data-col-size=\"sm\">Resist\u00eancia \u00e0 corros\u00e3o<\/td>\n<td data-col-size=\"sm\" data-start=\"2902\" data-end=\"2909\">Pobres<\/td>\n<td data-col-size=\"sm\" data-start=\"2909\" data-end=\"2922\">Excelente<\/td>\n<\/tr>\n<tr data-start=\"2923\" data-end=\"2971\">\n<td data-start=\"2923\" data-end=\"2948\" data-col-size=\"sm\">Contamina\u00e7\u00e3o por part\u00edculas<\/td>\n<td data-col-size=\"sm\" data-start=\"2948\" data-end=\"2960\">Risco elevado<\/td>\n<td data-col-size=\"sm\" data-start=\"2960\" data-end=\"2971\">M\u00ednimo<\/td>\n<\/tr>\n<tr data-start=\"2972\" data-end=\"3010\">\n<td data-start=\"2972\" data-end=\"2987\" data-col-size=\"sm\">Vida \u00fatil<\/td>\n<td data-col-size=\"sm\" data-start=\"2987\" data-end=\"2995\">Curto<\/td>\n<td data-col-size=\"sm\" data-start=\"2995\" data-end=\"3010\">3-4\u00d7 mais tempo<\/td>\n<\/tr>\n<tr data-start=\"3011\" data-end=\"3069\">\n<td data-start=\"3011\" data-end=\"3031\" data-col-size=\"sm\">Estabilidade da superf\u00edcie<\/td>\n<td data-col-size=\"sm\" data-start=\"3031\" data-end=\"3052\">Degrada-se com o tempo<\/td>\n<td data-col-size=\"sm\" data-start=\"3052\" data-end=\"3069\">Altamente est\u00e1vel<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"3071\" data-end=\"3074\" \/>\n<h1 data-section-id=\"7pt5v4\" data-start=\"3076\" data-end=\"3102\"><span role=\"text\">Embalagem e manuseamento<\/span><\/h1>\n<ul data-start=\"3103\" data-end=\"3313\">\n<li data-section-id=\"a3kyzw\" data-start=\"3103\" data-end=\"3142\">Embalagem para salas limpas dispon\u00edvel<\/li>\n<li data-section-id=\"3ss3f2\" data-start=\"3143\" data-end=\"3193\">Caixa de madeira resistente a choques ou selagem a v\u00e1cuo<\/li>\n<li data-section-id=\"iuz9t\" data-start=\"3194\" data-end=\"3253\">Concebida para o transporte de semicondutores sem contamina\u00e7\u00e3o<\/li>\n<li data-section-id=\"11l6t4c\" data-start=\"3254\" data-end=\"3313\">Tamanhos personalizados suportados (\u03a6380-\u03a6600 mm ou desenhos \u00e0 medida)<\/li>\n<\/ul>\n<hr data-start=\"3315\" data-end=\"3318\" \/>\n<h1 data-section-id=\"62o8y8\" data-start=\"3320\" data-end=\"3349\"><span role=\"text\">Porqu\u00ea escolher este produto<\/span><\/h1>\n<p data-start=\"3350\" data-end=\"3688\">Este tabuleiro de suporte de bolachas de SiC foi concebido para o fabrico de semicondutores da pr\u00f3xima gera\u00e7\u00e3o, em que a pureza, a estabilidade t\u00e9rmica e o controlo da contamina\u00e7\u00e3o s\u00e3o fundamentais. Ao substituir os suportes tradicionais \u00e0 base de grafite, melhora significativamente o rendimento da produ\u00e7\u00e3o, reduz os custos de manuten\u00e7\u00e3o e assegura um desempenho est\u00e1vel do processo a longo prazo.<\/p>\n<hr data-start=\"3690\" data-end=\"3693\" \/>\n<h1 data-section-id=\"1iusff4\" data-start=\"3695\" data-end=\"3704\"><span role=\"text\">FAQ<\/span><\/h1>\n<h3 data-section-id=\"1m9x0lv\" data-start=\"3706\" data-end=\"3791\"><span role=\"text\">Q1: Qual \u00e9 a principal vantagem do revestimento CVD SiC em compara\u00e7\u00e3o com os tabuleiros de grafite?<\/span><\/h3>\n<p data-start=\"3792\" data-end=\"3978\">O revestimento CVD SiC proporciona uma camada protetora densa e ultra-pura que impede a penetra\u00e7\u00e3o de g\u00e1s e a queda de part\u00edculas de grafite, melhorando consideravelmente a durabilidade e reduzindo a contamina\u00e7\u00e3o da bolacha.<\/p>\n<hr data-start=\"3980\" data-end=\"3983\" \/>\n<h3 data-section-id=\"7rg8ob\" data-start=\"3985\" data-end=\"4059\"><span role=\"text\">Q2: Este tabuleiro de SiC pode ser utilizado em processos MOCVD de alta temperatura?<\/span><\/h3>\n<p data-start=\"4060\" data-end=\"4219\">Sim. Foi especificamente concebido para aplica\u00e7\u00f5es MOCVD e pode funcionar de forma fi\u00e1vel a 1100-1200\u00b0C com excelente estabilidade t\u00e9rmica e distribui\u00e7\u00e3o uniforme do calor.<\/p>\n<hr data-start=\"4221\" data-end=\"4224\" \/>\n<h3 data-section-id=\"ox8w5l\" data-start=\"4226\" data-end=\"4314\"><span role=\"text\">Q3: Qual \u00e9 a diferen\u00e7a entre os tabuleiros de grafite revestidos e os tabuleiros de SiC totalmente CVD?<\/span><\/h3>\n<p data-start=\"4315\" data-end=\"4510\" data-is-last-node=\"\" data-is-only-node=\"\">Os tabuleiros de grafite revestidos utilizam um n\u00facleo de grafite com uma camada protetora de SiC, enquanto os tabuleiros de SiC totalmente CVD s\u00e3o estruturas monol\u00edticas com maior pureza, melhor resist\u00eancia \u00e0 corros\u00e3o e maior vida \u00fatil.<\/p>","protected":false},"excerpt":{"rendered":"<p>The SiC ceramic tray plate is a high-performance wafer carrier designed for advanced semiconductor processes such as MOCVD, epitaxy, and ICP etching. It is available in two structures: Graphite substrate with CVD SiC coating Monolithic high-purity CVD SiC tray (\u226599.99%) Compared with conventional graphite carriers, this product offers significantly improved thermal stability, corrosion resistance, and 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