{"id":2095,"date":"2026-05-12T03:44:27","date_gmt":"2026-05-12T03:44:27","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&#038;p=2095"},"modified":"2026-05-12T03:44:27","modified_gmt":"2026-05-12T03:44:27","slug":"high-purity-silicon-carbide-wafer-tray-for-semiconductor-cvd-processing","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/pt\/product\/high-purity-silicon-carbide-wafer-tray-for-semiconductor-cvd-processing\/","title":{"rendered":"Tabuleiro de bolachas de carboneto de sil\u00edcio de elevada pureza para processamento de semicondutores e CVD"},"content":{"rendered":"<p data-start=\"199\" data-end=\"404\"><img fetchpriority=\"high\" decoding=\"async\" class=\"wp-image-2097 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-300x300.png\" alt=\"\" width=\"288\" height=\"288\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2.png 1000w\" sizes=\"(max-width: 288px) 100vw, 288px\" \/>O tabuleiro para bolachas de carboneto de sil\u00edcio \u00e9 um suporte cer\u00e2mico de precis\u00e3o de elevado desempenho, concebido para o processamento de bolachas semicondutoras, sistemas CVD\/PECVD, fornos de v\u00e1cuo e ambientes industriais de alta temperatura.<\/p>\n<p data-start=\"406\" data-end=\"666\">Fabricado a partir de SiC CVD de elevada pureza ou SSiC (carboneto de sil\u00edcio sinterizado), este tabuleiro oferece uma excelente estabilidade t\u00e9rmica, resist\u00eancia mec\u00e2nica e resist\u00eancia qu\u00edmica, assegurando um manuseamento est\u00e1vel da bolacha e um desempenho consistente do processo em condi\u00e7\u00f5es extremas.<\/p>\n<p data-start=\"668\" data-end=\"818\">\u00c9 amplamente utilizado no fabrico de semicondutores, epitaxia de LED, processamento de bolacha de safira, sinteriza\u00e7\u00e3o de cer\u00e2mica avan\u00e7ada e sistemas t\u00e9rmicos de v\u00e1cuo.<\/p>\n<hr data-start=\"820\" data-end=\"823\" \/>\n<h2 data-section-id=\"1ma7m6t\" data-start=\"825\" data-end=\"840\">Carater\u00edsticas principais<\/h2>\n<h3 data-section-id=\"1mskj6p\" data-start=\"842\" data-end=\"888\">Estabilidade a altas temperaturas (at\u00e9 1600\u00b0C+)<\/h3>\n<p data-start=\"889\" data-end=\"1000\">Mant\u00e9m a integridade estrutural e o desempenho em funcionamento cont\u00ednuo a alta temperatura sem deforma\u00e7\u00e3o.<\/p>\n<h3 data-section-id=\"obi2s6\" data-start=\"1002\" data-end=\"1036\">Excelente condutividade t\u00e9rmica<\/h3>\n<p data-start=\"1037\" data-end=\"1136\">Assegura uma transfer\u00eancia de calor r\u00e1pida e uniforme, reduzindo os gradientes de temperatura e melhorando o rendimento do processo.<\/p>\n<h3 data-section-id=\"hstd5z\" data-start=\"1138\" data-end=\"1175\">Resist\u00eancia superior a choques t\u00e9rmicos<\/h3>\n<p data-start=\"1176\" data-end=\"1248\">Resiste a ciclos r\u00e1pidos de aquecimento e arrefecimento sem fissurar ou deformar.<\/p>\n<h3 data-section-id=\"1wy3za\" data-start=\"1250\" data-end=\"1278\">Elevada resist\u00eancia mec\u00e2nica<\/h3>\n<p data-start=\"1279\" data-end=\"1377\">A estrutura refor\u00e7ada proporciona uma excelente capacidade de carga e estabilidade dimensional a longo prazo.<\/p>\n<h3 data-section-id=\"1cdcof9\" data-start=\"1379\" data-end=\"1411\">Resist\u00eancia qu\u00edmica e a plasma<\/h3>\n<p data-start=\"1412\" data-end=\"1521\">Altamente resistente a \u00e1cidos, \u00e1lcalis, gases corrosivos e ambientes de plasma utilizados em processos de semicondutores.<\/p>\n<h3 data-section-id=\"1vb1ood\" data-start=\"1523\" data-end=\"1557\">Maquina\u00e7\u00e3o de precis\u00e3o ultra-elevada<\/h3>\n<p data-start=\"1558\" data-end=\"1663\">A retifica\u00e7\u00e3o CNC garante toler\u00e2ncias apertadas, planicidade e superf\u00edcies de contacto de bolacha lisas para sistemas automatizados.<\/p>\n<hr data-start=\"1665\" data-end=\"1668\" \/>\n<h2 data-section-id=\"1lh3gui\" data-start=\"1670\" data-end=\"1690\">Conce\u00e7\u00e3o estrutural<\/h2>\n<h3 data-section-id=\"1s8wich\" data-start=\"1692\" data-end=\"1726\">Conce\u00e7\u00e3o de ranhura anular multi-zona<\/h3>\n<ul data-start=\"1727\" data-end=\"1850\">\n<li data-section-id=\"gkdwm3\" data-start=\"1727\" data-end=\"1745\">Reduz o peso<\/li>\n<li data-section-id=\"18issq2\" data-start=\"1746\" data-end=\"1777\">Melhora a uniformidade t\u00e9rmica<\/li>\n<li data-section-id=\"l3j2gw\" data-start=\"1778\" data-end=\"1807\">Melhora a dissipa\u00e7\u00e3o de calor<\/li>\n<li data-section-id=\"1tnc39l\" data-start=\"1808\" data-end=\"1850\">Minimiza a concentra\u00e7\u00e3o de tens\u00f5es t\u00e9rmicas<\/li>\n<\/ul>\n<p data-start=\"1852\" data-end=\"1942\">Esta estrutura est\u00e1 optimizada para o processamento de bolachas a alta temperatura e aplica\u00e7\u00f5es de v\u00e1cuo.<\/p>\n<hr data-start=\"1944\" data-end=\"1947\" \/>\n<h3 data-section-id=\"10p8bw6\" data-start=\"1949\" data-end=\"1984\">Sistema de nervuras de refor\u00e7o radial<\/h3>\n<ul data-start=\"1985\" data-end=\"2144\">\n<li data-section-id=\"93l2pt\" data-start=\"1985\" data-end=\"2018\">Aumenta a rigidez mec\u00e2nica<\/li>\n<li data-section-id=\"xmgkcx\" data-start=\"2019\" data-end=\"2054\">Evita a deforma\u00e7\u00e3o sob carga<\/li>\n<li data-section-id=\"16xz56l\" data-start=\"2055\" data-end=\"2088\">Melhora a estabilidade rotacional<\/li>\n<li data-section-id=\"1i3nv5f\" data-start=\"2089\" data-end=\"2144\">Prolonga a vida \u00fatil em ambientes t\u00e9rmicos c\u00edclicos<\/li>\n<\/ul>\n<hr data-start=\"2146\" data-end=\"2149\" \/>\n<h3 data-section-id=\"erqgsk\" data-start=\"2151\" data-end=\"2181\">Superf\u00edcie maquinada de precis\u00e3o<\/h3>\n<ul data-start=\"2182\" data-end=\"2334\">\n<li data-section-id=\"tdalbr\" data-start=\"2182\" data-end=\"2215\">Elevada planicidade e consist\u00eancia<\/li>\n<li data-section-id=\"1jpgedk\" data-start=\"2216\" data-end=\"2250\">Interface de contacto de bolacha suave<\/li>\n<li data-section-id=\"muk23v\" data-start=\"2251\" data-end=\"2297\">Compat\u00edvel com sistemas de automa\u00e7\u00e3o rob\u00f3tica<\/li>\n<li data-section-id=\"t302yy\" data-start=\"2298\" data-end=\"2334\">Reduz o risco de gera\u00e7\u00e3o de part\u00edculas<\/li>\n<\/ul>\n<hr data-start=\"2336\" data-end=\"2339\" \/>\n<h3 data-section-id=\"1jxpmtp\" data-start=\"2341\" data-end=\"2371\">Interface de montagem central<\/h3>\n<p data-start=\"2372\" data-end=\"2415\">A estrutura central perfurada com precis\u00e3o garante:<\/p>\n<ul data-start=\"2416\" data-end=\"2541\">\n<li data-section-id=\"1prbs8w\" data-start=\"2416\" data-end=\"2441\">Fixa\u00e7\u00e3o est\u00e1vel do eixo<\/li>\n<li data-section-id=\"cemghk\" data-start=\"2442\" data-end=\"2483\">Alinhamento exato em sistemas de fornos<\/li>\n<li data-section-id=\"pxfn4\" data-start=\"2484\" data-end=\"2541\">Compatibilidade com equipamento automatizado de manuseamento de bolachas<\/li>\n<\/ul>\n<hr data-start=\"2543\" data-end=\"2546\" \/>\n<h3 data-section-id=\"gqycxw\" data-start=\"2548\" data-end=\"2573\">Anel exterior refor\u00e7ado<\/h3>\n<ul data-start=\"2574\" data-end=\"2688\">\n<li data-section-id=\"17dniqy\" data-start=\"2574\" data-end=\"2605\">Melhora o equil\u00edbrio estrutural<\/li>\n<li data-section-id=\"yaoils\" data-start=\"2606\" data-end=\"2639\">Melhora a resist\u00eancia \u00e0s vibra\u00e7\u00f5es<\/li>\n<li data-section-id=\"16bzx41\" data-start=\"2640\" data-end=\"2688\">Refor\u00e7a a durabilidade dos bordos durante o funcionamento<\/li>\n<\/ul>\n<hr data-start=\"2690\" data-end=\"2693\" \/>\n<h2 data-section-id=\"rb24ym\" data-start=\"2695\" data-end=\"2714\">Op\u00e7\u00f5es de materiais<\/h2>\n<h3 data-section-id=\"87v3o9\" data-start=\"2716\" data-end=\"2749\">Carboneto de sil\u00edcio CVD (CVD SiC)<\/h3>\n<ul data-start=\"2750\" data-end=\"2880\">\n<li data-section-id=\"1qjlbs6\" data-start=\"2750\" data-end=\"2771\">Pureza ultra-alta<\/li>\n<li data-section-id=\"ujmjxb\" data-start=\"2772\" data-end=\"2803\">Contamina\u00e7\u00e3o extremamente baixa<\/li>\n<li data-section-id=\"1529x9w\" data-start=\"2804\" data-end=\"2833\">Excelente qualidade de superf\u00edcie<\/li>\n<li data-section-id=\"3atv6m\" data-start=\"2834\" data-end=\"2880\">Ideal para processos avan\u00e7ados de semicondutores<\/li>\n<\/ul>\n<hr data-start=\"2882\" data-end=\"2885\" \/>\n<h3 data-section-id=\"gwj4n0\" data-start=\"2887\" data-end=\"2922\">Carboneto de sil\u00edcio sinterizado (SSiC)<\/h3>\n<ul data-start=\"2923\" data-end=\"3068\">\n<li data-section-id=\"16na2wg\" data-start=\"2923\" data-end=\"2952\">Elevada resist\u00eancia e densidade<\/li>\n<li data-section-id=\"v14n1q\" data-start=\"2953\" data-end=\"2982\">Excelente resist\u00eancia ao desgaste<\/li>\n<li data-section-id=\"1s1u32c\" data-start=\"2983\" data-end=\"3015\">Est\u00e1vel em ambientes agressivos<\/li>\n<li data-section-id=\"1586k58\" data-start=\"3016\" data-end=\"3068\">Adequado para sistemas industriais de alta temperatura<\/li>\n<\/ul>\n<hr data-start=\"3070\" data-end=\"3073\" \/>\n<h3 data-section-id=\"129y1qt\" data-start=\"3075\" data-end=\"3106\">SiC ligado por rea\u00e7\u00e3o (RBSiC)<\/h3>\n<ul data-start=\"3107\" data-end=\"3214\">\n<li data-section-id=\"rz6j8a\" data-start=\"3107\" data-end=\"3134\">Solu\u00e7\u00e3o econ\u00f3mica<\/li>\n<li data-section-id=\"dvvzgf\" data-start=\"3135\" data-end=\"3168\">Boa resist\u00eancia ao choque t\u00e9rmico<\/li>\n<li data-section-id=\"ag3lnk\" data-start=\"3169\" data-end=\"3214\">Adequado para aplica\u00e7\u00f5es industriais em massa<\/li>\n<\/ul>\n<hr data-start=\"3216\" data-end=\"3219\" \/>\n<h2 data-section-id=\"1cgu054\" data-start=\"3221\" data-end=\"3248\">Especifica\u00e7\u00f5es t\u00e9cnicas<\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"3250\" data-end=\"3636\">\n<thead data-start=\"3250\" data-end=\"3274\">\n<tr data-start=\"3250\" data-end=\"3274\">\n<th class=\"last:pe-10\" data-start=\"3250\" data-end=\"3257\" data-col-size=\"sm\">Item<\/th>\n<th class=\"last:pe-10\" data-start=\"3257\" data-end=\"3274\" data-col-size=\"sm\">Especifica\u00e7\u00e3o<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"3299\" data-end=\"3636\">\n<tr data-start=\"3299\" data-end=\"3336\">\n<td data-start=\"3299\" data-end=\"3310\" data-col-size=\"sm\">Material<\/td>\n<td data-start=\"3310\" data-end=\"3336\" data-col-size=\"sm\">CVD SiC \/ SSiC \/ RBSiC<\/td>\n<\/tr>\n<tr data-start=\"3337\" data-end=\"3361\">\n<td data-start=\"3337\" data-end=\"3346\" data-col-size=\"sm\">Pureza<\/td>\n<td data-start=\"3346\" data-end=\"3361\" data-col-size=\"sm\">At\u00e9 99,9%<\/td>\n<\/tr>\n<tr data-start=\"3362\" data-end=\"3398\">\n<td data-start=\"3362\" data-end=\"3386\" data-col-size=\"sm\">Temperatura de funcionamento<\/td>\n<td data-start=\"3386\" data-end=\"3398\" data-col-size=\"sm\">\u2264 1600\u00b0C<\/td>\n<\/tr>\n<tr data-start=\"3399\" data-end=\"3428\">\n<td data-start=\"3399\" data-end=\"3409\" data-col-size=\"sm\">Densidade<\/td>\n<td data-start=\"3409\" data-end=\"3428\" data-col-size=\"sm\">2,3 - 3,9 g\/cm\u00b3<\/td>\n<\/tr>\n<tr data-start=\"3429\" data-end=\"3469\">\n<td data-start=\"3429\" data-end=\"3456\" data-col-size=\"sm\">Resist\u00eancia ao choque t\u00e9rmico<\/td>\n<td data-start=\"3456\" data-end=\"3469\" data-col-size=\"sm\">Excelente<\/td>\n<\/tr>\n<tr data-start=\"3470\" data-end=\"3518\">\n<td data-start=\"3470\" data-end=\"3487\" data-col-size=\"sm\">Acabamento da superf\u00edcie<\/td>\n<td data-start=\"3487\" data-end=\"3518\" data-col-size=\"sm\">Retifica\u00e7\u00e3o de precis\u00e3o \/ Polimento<\/td>\n<\/tr>\n<tr data-start=\"3519\" data-end=\"3560\">\n<td data-start=\"3519\" data-end=\"3527\" data-col-size=\"sm\">Forma<\/td>\n<td data-start=\"3527\" data-end=\"3560\" data-col-size=\"sm\">Personalizado (redondo \/ anel \/ placa)<\/td>\n<\/tr>\n<tr data-start=\"3561\" data-end=\"3588\">\n<td data-start=\"3561\" data-end=\"3568\" data-col-size=\"sm\">Tamanho<\/td>\n<td data-start=\"3568\" data-end=\"3588\" data-col-size=\"sm\">Personalizado dispon\u00edvel<\/td>\n<\/tr>\n<tr data-start=\"3589\" data-end=\"3636\">\n<td data-start=\"3589\" data-end=\"3603\" data-col-size=\"sm\">Aplica\u00e7\u00e3o<\/td>\n<td data-start=\"3603\" data-end=\"3636\" data-col-size=\"sm\">Semicondutores \/ CVD \/ Forno<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"3638\" data-end=\"3641\" \/>\n<h2 data-section-id=\"mu966k\" data-start=\"3643\" data-end=\"3658\">Aplica\u00e7\u00f5es<\/h2>\n<h3 data-section-id=\"1eipr13\" data-start=\"3660\" data-end=\"3686\">Ind\u00fastria de semicondutores<\/h3>\n<ul data-start=\"3687\" data-end=\"3849\">\n<li data-section-id=\"13x15us\" data-start=\"3687\" data-end=\"3728\">Suporte de bolachas para sistemas CVD \/ PECVD<\/li>\n<li data-section-id=\"1ox36e0\" data-start=\"3729\" data-end=\"3774\">Processos de difus\u00e3o, oxida\u00e7\u00e3o e recozimento<\/li>\n<li data-section-id=\"1t8nanb\" data-start=\"3775\" data-end=\"3811\">RTP e sistemas de crescimento epitaxial<\/li>\n<li data-section-id=\"1jzl031\" data-start=\"3812\" data-end=\"3849\">Tabuleiros de transfer\u00eancia e manuseamento de bolachas<\/li>\n<\/ul>\n<hr data-start=\"3851\" data-end=\"3854\" \/>\n<h3 data-section-id=\"l1oj08\" data-start=\"3856\" data-end=\"3881\">LED e Optoelectr\u00f3nica<\/h3>\n<ul data-start=\"3882\" data-end=\"3982\">\n<li data-section-id=\"dgfruo\" data-start=\"3882\" data-end=\"3911\">Processamento de pastilhas de safira<\/li>\n<li data-section-id=\"fwvbk7\" data-start=\"3912\" data-end=\"3943\">Sistemas de suporte de epitaxia de LED<\/li>\n<li data-section-id=\"1gl4kjt\" data-start=\"3944\" data-end=\"3982\">Suporte de substrato de alta temperatura<\/li>\n<\/ul>\n<hr data-start=\"3984\" data-end=\"3987\" \/>\n<h3 data-section-id=\"480g89\" data-start=\"3989\" data-end=\"4018\">Fornos de v\u00e1cuo e t\u00e9rmicos<\/h3>\n<ul data-start=\"4019\" data-end=\"4115\">\n<li data-section-id=\"kqy2l\" data-start=\"4019\" data-end=\"4055\">Tabuleiros de sinteriza\u00e7\u00e3o a alta temperatura<\/li>\n<li data-section-id=\"jgks7q\" data-start=\"4056\" data-end=\"4083\">Suportes para fornos de v\u00e1cuo<\/li>\n<li data-section-id=\"1c2tpui\" data-start=\"4084\" data-end=\"4115\">Dispositivos de processamento t\u00e9rmico<\/li>\n<\/ul>\n<hr data-start=\"4117\" data-end=\"4120\" \/>\n<h3 data-section-id=\"1owf0zc\" data-start=\"4122\" data-end=\"4148\">Fabrico avan\u00e7ado<\/h3>\n<ul data-start=\"4149\" data-end=\"4255\">\n<li data-section-id=\"odfyg7\" data-start=\"4149\" data-end=\"4181\">Processamento de cer\u00e2mica de precis\u00e3o<\/li>\n<li data-section-id=\"1kui91r\" data-start=\"4182\" data-end=\"4215\">Dispositivos de equipamento de automatiza\u00e7\u00e3o<\/li>\n<li data-section-id=\"135k87d\" data-start=\"4216\" data-end=\"4255\">Plataformas mec\u00e2nicas de elevada estabilidade<\/li>\n<\/ul>\n<hr data-start=\"4257\" data-end=\"4260\" \/>\n<h2 data-section-id=\"dysc5y\" data-start=\"4262\" data-end=\"4283\"><img decoding=\"async\" class=\"wp-image-2098 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-300x300.png\" alt=\"\" width=\"276\" height=\"276\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1.png 1000w\" sizes=\"(max-width: 276px) 100vw, 276px\" \/>Vantagens do produto<\/h2>\n<ul data-start=\"4285\" data-end=\"4537\">\n<li data-section-id=\"an6nuo\" data-start=\"4285\" data-end=\"4326\">Excelente resist\u00eancia a altas temperaturas<\/li>\n<li data-section-id=\"1rm14qx\" data-start=\"4327\" data-end=\"4360\">Condutividade t\u00e9rmica superior<\/li>\n<li data-section-id=\"wx5di6\" data-start=\"4361\" data-end=\"4391\">Elevada estabilidade dimensional<\/li>\n<li data-section-id=\"ymf61l\" data-start=\"4392\" data-end=\"4413\">Longa vida \u00fatil<\/li>\n<li data-section-id=\"1v5rrzz\" data-start=\"4414\" data-end=\"4440\">Baixo risco de contamina\u00e7\u00e3o<\/li>\n<li data-section-id=\"ddezgg\" data-start=\"4441\" data-end=\"4472\">Forte resist\u00eancia \u00e0 corros\u00e3o<\/li>\n<li data-section-id=\"xmyntv\" data-start=\"4473\" data-end=\"4507\">Compat\u00edvel com sistemas de v\u00e1cuo<\/li>\n<li data-section-id=\"1ijrpkq\" data-start=\"4508\" data-end=\"4537\">Design totalmente personaliz\u00e1vel<\/li>\n<\/ul>\n<hr data-start=\"4539\" data-end=\"4542\" \/>\n<h2 data-section-id=\"1lwg0so\" data-start=\"4544\" data-end=\"4571\"><img decoding=\"async\" class=\"wp-image-2096 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-300x300.png\" alt=\"\" width=\"280\" height=\"280\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3.png 1000w\" sizes=\"(max-width: 280px) 100vw, 280px\" \/>Capacidade de personaliza\u00e7\u00e3o<\/h2>\n<p data-start=\"4573\" data-end=\"4649\">Apoiamos a personaliza\u00e7\u00e3o total com base em desenhos ou requisitos de aplica\u00e7\u00e3o:<\/p>\n<ul data-start=\"4651\" data-end=\"4883\">\n<li data-section-id=\"1i7bvpn\" data-start=\"4651\" data-end=\"4689\">Personaliza\u00e7\u00e3o do di\u00e2metro\/espessura<\/li>\n<li data-section-id=\"dmyogn\" data-start=\"4690\" data-end=\"4720\">Otimiza\u00e7\u00e3o da geometria da ranhura<\/li>\n<li data-section-id=\"19luai6\" data-start=\"4721\" data-end=\"4749\">Furos de montagem de precis\u00e3o<\/li>\n<li data-section-id=\"r5ngym\" data-start=\"4750\" data-end=\"4781\">Polimento \/ lapida\u00e7\u00e3o de superf\u00edcies<\/li>\n<li data-section-id=\"c4ihff\" data-start=\"4782\" data-end=\"4818\">Maquina\u00e7\u00e3o ultra-plana de n\u00edvel de bolacha<\/li>\n<li data-section-id=\"1lf2kpf\" data-start=\"4819\" data-end=\"4853\">Sele\u00e7\u00e3o de material de elevada pureza<\/li>\n<li data-section-id=\"881e6f\" data-start=\"4854\" data-end=\"4883\">Conce\u00e7\u00e3o estrutural complexa<\/li>\n<\/ul>\n<p data-start=\"4885\" data-end=\"4956\">Servi\u00e7os OEM e ODM dispon\u00edveis para fabricantes de equipamento de semicondutores.<\/p>\n<hr data-start=\"4958\" data-end=\"4961\" \/>\n<h2 data-section-id=\"1hryhf7\" data-start=\"4963\" data-end=\"4969\">FAQ<\/h2>\n<h3 data-section-id=\"1rw8tyo\" data-start=\"4971\" data-end=\"5025\">Q1: Para que \u00e9 utilizado um tabuleiro de bolachas de carboneto de sil\u00edcio?<\/h3>\n<p data-start=\"5026\" data-end=\"5173\">\u00c9 utilizado para suportar e transportar bolachas durante os processos de semicondutores, tais como CVD, PECVD, difus\u00e3o, oxida\u00e7\u00e3o e recozimento a alta temperatura.<\/p>\n<hr data-start=\"5175\" data-end=\"5178\" \/>\n<h3 data-section-id=\"8sm145\" data-start=\"5180\" data-end=\"5230\">Q2: Porqu\u00ea utilizar SiC em vez de quartzo ou grafite?<\/h3>\n<p data-start=\"5231\" data-end=\"5244\">O SiC fornece:<\/p>\n<ul data-start=\"5245\" data-end=\"5391\">\n<li data-section-id=\"66suke\" data-start=\"5245\" data-end=\"5278\">Maior resist\u00eancia \u00e0 temperatura<\/li>\n<li data-section-id=\"1k27992\" data-start=\"5279\" data-end=\"5309\">Melhor resist\u00eancia mec\u00e2nica<\/li>\n<li data-section-id=\"1y67fsp\" data-start=\"5310\" data-end=\"5337\">Menor expans\u00e3o t\u00e9rmica<\/li>\n<li data-section-id=\"1kygjim\" data-start=\"5338\" data-end=\"5361\">Vida \u00fatil mais longa<\/li>\n<li data-section-id=\"d0e53t\" data-start=\"5362\" data-end=\"5391\">Melhor estabilidade qu\u00edmica<\/li>\n<\/ul>\n<hr data-start=\"5393\" data-end=\"5396\" \/>\n<h3 data-section-id=\"c1126k\" data-start=\"5398\" data-end=\"5433\">Q3: O tabuleiro pode ser personalizado?<\/h3>\n<p data-start=\"5434\" data-end=\"5527\">Sim. Fornecemos personaliza\u00e7\u00e3o total, incluindo tamanho, estrutura, espessura e design de montagem.<\/p>\n<hr data-start=\"5529\" data-end=\"5532\" \/>\n<h3 data-section-id=\"4sy20p\" data-start=\"5534\" data-end=\"5587\">Q4: \u00c9 adequado para aquecimento e arrefecimento r\u00e1pidos?<\/h3>\n<p data-start=\"5588\" data-end=\"5686\">Sim. O SiC tem uma excelente resist\u00eancia ao choque t\u00e9rmico, o que o torna adequado para processos de ciclos t\u00e9rmicos.<\/p>","protected":false},"excerpt":{"rendered":"<p data-start=\"199\" data-end=\"404\">O tabuleiro para bolachas de carboneto de sil\u00edcio \u00e9 um suporte cer\u00e2mico de precis\u00e3o de elevado desempenho, concebido para o processamento de bolachas semicondutoras, sistemas CVD\/PECVD, fornos de v\u00e1cuo e ambientes industriais de alta temperatura.<\/p>\n<p data-start=\"406\" data-end=\"666\">Fabricado a partir de SiC CVD de elevada pureza ou SSiC (carboneto de sil\u00edcio sinterizado), este tabuleiro oferece uma excelente estabilidade t\u00e9rmica, resist\u00eancia mec\u00e2nica e resist\u00eancia qu\u00edmica, assegurando um manuseamento est\u00e1vel da bolacha e um desempenho consistente do processo em condi\u00e7\u00f5es extremas.<\/p>","protected":false},"featured_media":2097,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center 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