{"id":2100,"date":"2026-05-12T03:59:56","date_gmt":"2026-05-12T03:59:56","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&#038;p=2100"},"modified":"2026-05-12T03:59:56","modified_gmt":"2026-05-12T03:59:56","slug":"customized-sic-ceramic-end-effector-for-wafer-handling","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/nl\/product\/customized-sic-ceramic-end-effector-for-wafer-handling\/","title":{"rendered":"Aangepaste SiC keramische eindeffector voor waferbehandeling"},"content":{"rendered":"<p data-start=\"737\" data-end=\"989\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2101 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-3-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-3-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-3-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-3-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-3-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-3-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-3-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-3.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>De keramische eindeffector van siliciumcarbide (SiC) is een uiterst nauwkeurig waferhandelingsonderdeel dat is ontworpen voor automatiseringssystemen voor halfgeleiders, waaronder robots voor wafertransfer, AMHS-systemen, EUV-lithografieapparatuur en procesgereedschappen voor hoge temperaturen.<\/p>\n<p data-start=\"991\" data-end=\"1308\">Deze eindeffector is gemaakt van hoogzuiver CVD SiC of geconstrueerd SSiC en biedt uitzonderlijke stijfheid, ultralage deeltjesvorming en uitstekende thermische en chemische stabiliteit. Hij wordt veel gebruikt in halfgeleiderfabrieken van 300 mm en geavanceerde knooppunten, waar verontreinigingscontrole en positioneringsnauwkeurigheid van cruciaal belang zijn.<\/p>\n<p data-start=\"1310\" data-end=\"1470\">Vergeleken met traditionele aluminium of kwarts eindeffectors, verbeteren SiC keramische oplossingen de processtabiliteit, de veiligheid van de wafer en de levensduur van de apparatuur aanzienlijk.<\/p>\n<hr data-start=\"1472\" data-end=\"1475\" \/>\n<h2 data-section-id=\"ruuu6i\" data-start=\"1477\" data-end=\"1494\">Belangrijkste voordelen<\/h2>\n<h3 data-section-id=\"1igp1it\" data-start=\"1496\" data-end=\"1532\">Ultralage deeltjesverontreiniging<\/h3>\n<ul data-start=\"1533\" data-end=\"1664\">\n<li data-section-id=\"1lx1qmw\" data-start=\"1533\" data-end=\"1587\">Deeltjesvorming: &lt;0,1\/cm\u00b2 (conform SEMI F57)<\/li>\n<li data-section-id=\"8gkyog\" data-start=\"1588\" data-end=\"1618\">Geen verontreiniging met metaalionen<\/li>\n<li data-section-id=\"m28nyw\" data-start=\"1619\" data-end=\"1664\">Ideaal voor EUV en geavanceerde knooppuntprocessen<\/li>\n<\/ul>\n<hr data-start=\"1666\" data-end=\"1669\" \/>\n<h3 data-section-id=\"nha58o\" data-start=\"1671\" data-end=\"1710\">Hoge stijfheid en precisiestabiliteit<\/h3>\n<ul data-start=\"1711\" data-end=\"1837\">\n<li data-section-id=\"n58wtx\" data-start=\"1711\" data-end=\"1740\">Modulus van Young: ~420 GPa<\/li>\n<li data-section-id=\"wiw01d\" data-start=\"1741\" data-end=\"1790\">Voorkomt door trillingen veroorzaakte verkeerde uitlijning van de wafer<\/li>\n<li data-section-id=\"kx1hzh\" data-start=\"1791\" data-end=\"1837\">Zorgt voor een stabiele robottransfer met hoge snelheid<\/li>\n<\/ul>\n<hr data-start=\"1839\" data-end=\"1842\" \/>\n<h3 data-section-id=\"2ge170\" data-start=\"1844\" data-end=\"1875\">Uitstekende thermische stabiliteit<\/h3>\n<ul data-start=\"1876\" data-end=\"2015\">\n<li data-section-id=\"ibg0yp\" data-start=\"1876\" data-end=\"1927\">Bedrijfstemperatuur: tot 1600\u00b0C (oxiderend)<\/li>\n<li data-section-id=\"1e7mmjn\" data-start=\"1928\" data-end=\"1963\">Tot 1950\u00b0C (inerte atmosfeer)<\/li>\n<li data-section-id=\"j5ees9\" data-start=\"1964\" data-end=\"2015\">Geschikt voor extreme halfgeleideromgevingen<\/li>\n<\/ul>\n<hr data-start=\"2017\" data-end=\"2020\" \/>\n<h3 data-section-id=\"1twxua8\" data-start=\"2022\" data-end=\"2063\">Superieure chemische weerstand en plasmaweerstand<\/h3>\n<ul data-start=\"2064\" data-end=\"2212\">\n<li data-section-id=\"x6lsw\" data-start=\"2064\" data-end=\"2120\">Bestand tegen zuren, alkali\u00ebn en plasma-omgevingen<\/li>\n<li data-section-id=\"1c1d6qm\" data-start=\"2121\" data-end=\"2169\">Geen corrosie in CVD \/ PVD \/ etskamers<\/li>\n<li data-section-id=\"1o7zcce\" data-start=\"2170\" data-end=\"2212\">Stabiel in SiH\u2084, NH\u2083, HCl procesgassen<\/li>\n<\/ul>\n<hr data-start=\"2214\" data-end=\"2217\" \/>\n<h3 data-section-id=\"14bamzt\" data-start=\"2219\" data-end=\"2252\">Slijtagevrij &amp; lange levensduur<\/h3>\n<ul data-start=\"2253\" data-end=\"2380\">\n<li data-section-id=\"10g9b8f\" data-start=\"2253\" data-end=\"2283\">Vickers-hardheid: ~2800 HV<\/li>\n<li data-section-id=\"14dvdy4\" data-start=\"2284\" data-end=\"2335\">Geen deeltjesverspreiding tijdens langdurig gebruik<\/li>\n<li data-section-id=\"12rqc97\" data-start=\"2336\" data-end=\"2380\">Uitstekende duurzaamheid van het oppervlak (Ra &lt; 0,2 \u03bcm)<\/li>\n<\/ul>\n<hr data-start=\"2382\" data-end=\"2385\" \/>\n<h2 data-section-id=\"1xqplm3\" data-start=\"2387\" data-end=\"2418\">Structurele en ontwerpkenmerken<\/h2>\n<h3 data-section-id=\"1nh5g76\" data-start=\"2420\" data-end=\"2457\">Nauwkeurige Wafer-behandeling Geometrie<\/h3>\n<p data-start=\"2458\" data-end=\"2467\">Ondersteunt:<\/p>\n<ul data-start=\"2468\" data-end=\"2596\">\n<li data-section-id=\"15tpg53\" data-start=\"2468\" data-end=\"2508\">150mm \/ 200mm \/ 300mm \/ 450mm wafers<\/li>\n<li data-section-id=\"1rnwp5m\" data-start=\"2509\" data-end=\"2563\">Ontwerpen met randbevestiging\/inkepinguitlijning\/vlakke ondersteuning<\/li>\n<li data-section-id=\"qm27un\" data-start=\"2564\" data-end=\"2596\">Integratie van robotarmen op maat<\/li>\n<\/ul>\n<hr data-start=\"2598\" data-end=\"2601\" \/>\n<h3 data-section-id=\"1yw23gm\" data-start=\"2603\" data-end=\"2643\">Lichtgewicht structuur met hoge stijfheid<\/h3>\n<ul data-start=\"2644\" data-end=\"2768\">\n<li data-section-id=\"tt3pyh\" data-start=\"2644\" data-end=\"2677\">Hoge verhouding stijfheid-gewicht<\/li>\n<li data-section-id=\"1sb17em\" data-start=\"2678\" data-end=\"2721\">Geschikt voor snelle robotsystemen<\/li>\n<li data-section-id=\"1j6yie2\" data-start=\"2722\" data-end=\"2768\">Minimaliseert dynamische doorbuiging tijdens beweging<\/li>\n<\/ul>\n<hr data-start=\"2770\" data-end=\"2773\" \/>\n<h3 data-section-id=\"97w9la\" data-start=\"2775\" data-end=\"2809\">Ultrazuivere oppervlaktebehandeling<\/h3>\n<ul data-start=\"2810\" data-end=\"2905\">\n<li data-section-id=\"1lu1i7j\" data-start=\"2810\" data-end=\"2844\">Precisieslijpen en -polijsten<\/li>\n<li data-section-id=\"1amctgl\" data-start=\"2845\" data-end=\"2870\">Lage oppervlakteruwheid<\/li>\n<li data-section-id=\"1js4nxo\" data-start=\"2871\" data-end=\"2905\">Structuur geschikt voor cleanrooms<\/li>\n<\/ul>\n<hr data-start=\"2907\" data-end=\"2910\" \/>\n<h3 data-section-id=\"50i47d\" data-start=\"2912\" data-end=\"2944\">Technische interface op maat<\/h3>\n<ul data-start=\"2945\" data-end=\"3063\">\n<li data-section-id=\"1dle0c1\" data-start=\"2945\" data-end=\"2981\">Robotarm montage compatibiliteit<\/li>\n<li data-section-id=\"19fhsyz\" data-start=\"2982\" data-end=\"3018\">OEM-integratie voor AMHS-systemen<\/li>\n<li data-section-id=\"3wahd3\" data-start=\"3019\" data-end=\"3063\">Aangepaste posities van gaten en ontwerp van opspanningen<\/li>\n<\/ul>\n<hr data-start=\"3065\" data-end=\"3068\" \/>\n<h2 data-section-id=\"rb24ym\" data-start=\"3070\" data-end=\"3089\">Materiaalopties<\/h2>\n<h3 data-section-id=\"87v3o9\" data-start=\"3091\" data-end=\"3124\">CVD Siliciumcarbide (CVD SiC)<\/h3>\n<ul data-start=\"3125\" data-end=\"3232\">\n<li data-section-id=\"1qjlbs6\" data-start=\"3125\" data-end=\"3146\">Ultrazuiver<\/li>\n<li data-section-id=\"1856ohe\" data-start=\"3147\" data-end=\"3198\">Beste voor EUV \/ geavanceerde halfgeleiderprocessen<\/li>\n<li data-section-id=\"1lwpzbt\" data-start=\"3199\" data-end=\"3232\">Ultralaag verontreinigingsniveau<\/li>\n<\/ul>\n<hr data-start=\"3234\" data-end=\"3237\" \/>\n<h3 data-section-id=\"gwj4n0\" data-start=\"3239\" data-end=\"3274\">Gesinterd siliciumcarbide (SSiC)<\/h3>\n<ul data-start=\"3275\" data-end=\"3402\">\n<li data-section-id=\"1hi8oju\" data-start=\"3275\" data-end=\"3312\">Hoge sterkte en slijtvastheid<\/li>\n<li data-section-id=\"1rnk9x7\" data-start=\"3313\" data-end=\"3363\">Geschikt voor industri\u00eble waferhandlingsystemen<\/li>\n<li data-section-id=\"67fp04\" data-start=\"3364\" data-end=\"3402\">Uitstekende balans tussen kosten en prestatie<\/li>\n<\/ul>\n<hr data-start=\"3404\" data-end=\"3407\" \/>\n<h2 data-section-id=\"1cgu054\" data-start=\"3409\" data-end=\"3436\">Technische specificaties<\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"3438\" data-end=\"3888\">\n<thead data-start=\"3438\" data-end=\"3462\">\n<tr data-start=\"3438\" data-end=\"3462\">\n<th class=\"last:pe-10\" data-start=\"3438\" data-end=\"3445\" data-col-size=\"sm\">Item<\/th>\n<th class=\"last:pe-10\" data-start=\"3445\" data-end=\"3462\" data-col-size=\"sm\">Specificatie<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"3487\" data-end=\"3888\">\n<tr data-start=\"3487\" data-end=\"3516\">\n<td data-start=\"3487\" data-end=\"3498\" data-col-size=\"sm\">Materiaal<\/td>\n<td data-col-size=\"sm\" data-start=\"3498\" data-end=\"3516\">CVD SiC \/ SSiC<\/td>\n<\/tr>\n<tr data-start=\"3517\" data-end=\"3536\">\n<td data-start=\"3517\" data-end=\"3526\" data-col-size=\"sm\">Zuiverheid<\/td>\n<td data-start=\"3526\" data-end=\"3536\" data-col-size=\"sm\">&gt;99,5%<\/td>\n<\/tr>\n<tr data-start=\"3537\" data-end=\"3561\">\n<td data-start=\"3537\" data-end=\"3550\" data-col-size=\"sm\">Korrelgrootte<\/td>\n<td data-col-size=\"sm\" data-start=\"3550\" data-end=\"3561\">4-10 \u03bcm<\/td>\n<\/tr>\n<tr data-start=\"3562\" data-end=\"3587\">\n<td data-start=\"3562\" data-end=\"3572\" data-col-size=\"sm\">Dichtheid<\/td>\n<td data-col-size=\"sm\" data-start=\"3572\" data-end=\"3587\">&gt;3,14 g\/cm\u00b3<\/td>\n<\/tr>\n<tr data-start=\"3588\" data-end=\"3611\">\n<td data-start=\"3588\" data-end=\"3599\" data-col-size=\"sm\">Hardheid<\/td>\n<td data-col-size=\"sm\" data-start=\"3599\" data-end=\"3611\">~2800 HV<\/td>\n<\/tr>\n<tr data-start=\"3612\" data-end=\"3643\">\n<td data-start=\"3612\" data-end=\"3632\" data-col-size=\"sm\">Buigsterkte<\/td>\n<td data-col-size=\"sm\" data-start=\"3632\" data-end=\"3643\">450 MPa<\/td>\n<\/tr>\n<tr data-start=\"3644\" data-end=\"3673\">\n<td data-start=\"3644\" data-end=\"3662\" data-col-size=\"sm\">Elastische modulus<\/td>\n<td data-col-size=\"sm\" data-start=\"3662\" data-end=\"3673\">420 GPa<\/td>\n<\/tr>\n<tr data-start=\"3674\" data-end=\"3710\">\n<td data-start=\"3674\" data-end=\"3697\" data-col-size=\"sm\">Thermische geleidbaarheid<\/td>\n<td data-col-size=\"sm\" data-start=\"3697\" data-end=\"3710\">160 W\/m-K<\/td>\n<\/tr>\n<tr data-start=\"3711\" data-end=\"3768\">\n<td data-start=\"3711\" data-end=\"3729\" data-col-size=\"sm\">Max. temperatuur<\/td>\n<td data-col-size=\"sm\" data-start=\"3729\" data-end=\"3768\">1600\u00b0C (oxidatie) \/ 1950\u00b0C (inert)<\/td>\n<\/tr>\n<tr data-start=\"3769\" data-end=\"3810\">\n<td data-start=\"3769\" data-end=\"3794\" data-col-size=\"sm\">Elektrische weerstand<\/td>\n<td data-col-size=\"sm\" data-start=\"3794\" data-end=\"3810\">10\u2076-10\u2078 \u03a9-cm<\/td>\n<\/tr>\n<tr data-start=\"3811\" data-end=\"3851\">\n<td data-start=\"3811\" data-end=\"3828\" data-col-size=\"sm\">Afwerking oppervlak<\/td>\n<td data-col-size=\"sm\" data-start=\"3828\" data-end=\"3851\">Ultrafijn gepolijst<\/td>\n<\/tr>\n<tr data-start=\"3852\" data-end=\"3888\">\n<td data-start=\"3852\" data-end=\"3859\" data-col-size=\"sm\">Maat<\/td>\n<td data-start=\"3859\" data-end=\"3888\" data-col-size=\"sm\">Aangepast (150-450 mm wafers)<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"3890\" data-end=\"3893\" \/>\n<h2 data-section-id=\"mu966k\" data-start=\"3895\" data-end=\"3910\">Toepassingen<\/h2>\n<h3 data-section-id=\"6yu2ul\" data-start=\"3912\" data-end=\"3943\">Productie van halfgeleiders<\/h3>\n<ul data-start=\"3944\" data-end=\"4097\">\n<li data-section-id=\"49bdmt\" data-start=\"3944\" data-end=\"3978\">EUV-lithografie wafer handling<\/li>\n<li data-section-id=\"11xdzhh\" data-start=\"3979\" data-end=\"4017\">300mm wafer robot transfersystemen<\/li>\n<li data-section-id=\"ox84z0\" data-start=\"4018\" data-end=\"4060\">CVD \/ PVD \/ etskamer automatisering<\/li>\n<li data-section-id=\"teg2xm\" data-start=\"4061\" data-end=\"4097\">Ionenimplantatie wafertransport<\/li>\n<\/ul>\n<hr data-start=\"4099\" data-end=\"4102\" \/>\n<h3 data-section-id=\"sf9357\" data-start=\"4104\" data-end=\"4140\">Geavanceerde halfgeleidermaterialen<\/h3>\n<ul data-start=\"4141\" data-end=\"4248\">\n<li data-section-id=\"iiuum6\" data-start=\"4141\" data-end=\"4176\">Behandeling van SiC power device wafers<\/li>\n<li data-section-id=\"se94ot\" data-start=\"4177\" data-end=\"4211\">GaN epitaxy productiesystemen<\/li>\n<li data-section-id=\"3yciq1\" data-start=\"4212\" data-end=\"4248\">MOCVD-processen bij hoge temperatuur<\/li>\n<\/ul>\n<hr data-start=\"4250\" data-end=\"4253\" \/>\n<h3 data-section-id=\"11khwnl\" data-start=\"4255\" data-end=\"4286\">Fotovolta\u00efsche &amp; LED-industrie<\/h3>\n<ul data-start=\"4287\" data-end=\"4389\">\n<li data-section-id=\"q29bxq\" data-start=\"4287\" data-end=\"4319\">Zonnewafer automatiseringslijnen<\/li>\n<li data-section-id=\"10mww1v\" data-start=\"4320\" data-end=\"4361\">Micro-LED \/ Mini-LED transfersystemen<\/li>\n<li data-section-id=\"dp5vhg\" data-start=\"4362\" data-end=\"4389\">Behandeling van saffierwafers<\/li>\n<\/ul>\n<hr data-start=\"4391\" data-end=\"4394\" \/>\n<h3 data-section-id=\"j366yc\" data-start=\"4396\" data-end=\"4428\">Automatisering &amp; Robotica (AMHS)<\/h3>\n<ul data-start=\"4429\" data-end=\"4533\">\n<li data-section-id=\"fpj2it\" data-start=\"4429\" data-end=\"4459\">Robotarmen voor wafertransport<\/li>\n<li data-section-id=\"e4e8u3\" data-start=\"4460\" data-end=\"4492\">Systemen voor cleanroomautomatisering<\/li>\n<li data-section-id=\"k0rhy6\" data-start=\"4493\" data-end=\"4533\">Materiaalbehandelingssystemen met hoge snelheid<\/li>\n<\/ul>\n<hr data-start=\"4535\" data-end=\"4538\" \/>\n<h3 data-section-id=\"1c5bbdr\" data-start=\"4540\" data-end=\"4573\">Onderzoek en geavanceerde apparatuur<\/h3>\n<ul data-start=\"4574\" data-end=\"4679\">\n<li data-section-id=\"1sbej07\" data-start=\"4574\" data-end=\"4604\">Fabricage van quantumapparaten<\/li>\n<li data-section-id=\"5u37w7\" data-start=\"4605\" data-end=\"4641\">Cryogene waferbehandelingssystemen<\/li>\n<li data-section-id=\"i12e24\" data-start=\"4642\" data-end=\"4679\">Geavanceerde verpakking (3D IC \/ MEMS)<\/li>\n<\/ul>\n<hr data-start=\"4681\" data-end=\"4684\" \/>\n<h2 data-section-id=\"vm5qii\" data-start=\"4686\" data-end=\"4715\">Samenvatting van productvoordelen<\/h2>\n<ul data-start=\"4717\" data-end=\"4996\">\n<li data-section-id=\"r4wmoo\" data-start=\"4717\" data-end=\"4750\">Geen risico op metaalbesmetting<\/li>\n<li data-section-id=\"w80eyq\" data-start=\"4751\" data-end=\"4797\">Ultrahoge stijfheid voor precisiewerk<\/li>\n<li data-section-id=\"ovhb2l\" data-start=\"4798\" data-end=\"4842\">Uitstekende thermische en chemische stabiliteit<\/li>\n<li data-section-id=\"1pry50x\" data-start=\"4843\" data-end=\"4878\">Lange levensduur met minimale slijtage<\/li>\n<li data-section-id=\"16clm2x\" data-start=\"4879\" data-end=\"4919\">Compatibel met cleanroomautomatisering<\/li>\n<li data-section-id=\"1usfebt\" data-start=\"4920\" data-end=\"4956\">Aanpasbaar voor alle waferformaten<\/li>\n<li data-section-id=\"whnxc2\" data-start=\"4957\" data-end=\"4996\">Geschikt voor EUV en geavanceerde nodes<\/li>\n<\/ul>\n<hr data-start=\"4998\" data-end=\"5001\" \/>\n<h2 data-section-id=\"rnyyeg\" data-start=\"5003\" data-end=\"5027\">Aanpassingsopties<img decoding=\"async\" class=\"size-medium wp-image-2102 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-2-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-2-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-2-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-2-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-2-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-2-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-2-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Customized-SiC-Ceramic-End-Effector-for-Wafer-Handling-2.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/h2>\n<p data-start=\"5029\" data-end=\"5067\">We ondersteunen volledig OEM\/ODM maatwerk:<\/p>\n<ul data-start=\"5069\" data-end=\"5319\">\n<li data-section-id=\"pzy3qt\" data-start=\"5069\" data-end=\"5127\">Geometrie eindeffector (vlak\/randgreep\/inkeping uitlijnen)<\/li>\n<li data-section-id=\"173oufn\" data-start=\"5128\" data-end=\"5168\">Compatibel met wafergrootte (150-450 mm)<\/li>\n<li data-section-id=\"1sh3bgb\" data-start=\"5169\" data-end=\"5195\">Ontwerp robotinterface<\/li>\n<li data-section-id=\"1ma3ck\" data-start=\"5196\" data-end=\"5252\">Oppervlaktecoating (antistatisch \/ hydrofoob optioneel)<\/li>\n<li data-section-id=\"7mw706\" data-start=\"5253\" data-end=\"5289\">Precisietolerantie optimaliseren<\/li>\n<li data-section-id=\"w4j63d\" data-start=\"5290\" data-end=\"5319\">Cleanroom-afwerking<\/li>\n<\/ul>\n<hr data-start=\"5321\" data-end=\"5324\" \/>\n<h2 data-section-id=\"1hryhf7\" data-start=\"5326\" data-end=\"5332\">FAQ<\/h2>\n<h3 data-section-id=\"1mpzh4o\" data-start=\"5334\" data-end=\"5384\">V1: Waarom SiC gebruiken in plaats van aluminium of kwarts?<\/h3>\n<ul data-start=\"5385\" data-end=\"5556\">\n<li data-section-id=\"1xvhlf0\" data-start=\"5385\" data-end=\"5437\">Aluminium: deeltjesvorming + oxidatieproblemen<\/li>\n<li data-section-id=\"1q7gghy\" data-start=\"5438\" data-end=\"5489\">Kwarts: bros + slecht bestand tegen thermische schokken<\/li>\n<li data-section-id=\"vgt2b3\" data-start=\"5490\" data-end=\"5556\">SiC: beste combinatie van stijfheid, zuiverheid en duurzaamheid<\/li>\n<\/ul>\n<hr data-start=\"5558\" data-end=\"5561\" \/>\n<h3 data-section-id=\"1cxfupn\" data-start=\"5563\" data-end=\"5599\">V2: Kan het 450 mm wafers ondersteunen?<\/h3>\n<p data-start=\"5600\" data-end=\"5667\">Ja, er zijn aangepaste ontwerpen beschikbaar voor 450mm waferbehandelingssystemen.<\/p>\n<hr data-start=\"5669\" data-end=\"5672\" \/>\n<h3 data-section-id=\"a4nxop\" data-start=\"5674\" data-end=\"5717\">V3: Is het geschikt voor EUV-lithografie?<\/h3>\n<p data-start=\"5718\" data-end=\"5803\">Ja. SiC eindeffectoren voldoen aan de vereisten voor compatibiliteit met ultralage deeltjes en vacu\u00fcm.<\/p>\n<hr data-start=\"5805\" data-end=\"5808\" \/>\n<h3 data-section-id=\"1ajqsm3\" data-start=\"5810\" data-end=\"5872\">V4: Kan het worden gebruikt in vacu\u00fcmsystemen en systemen met hoge temperaturen?<\/h3>\n<p data-start=\"5873\" data-end=\"5951\">Ja. SiC presteert stabiel in vacu\u00fcm, plasma en omgevingen met hoge temperaturen.<\/p>","protected":false},"excerpt":{"rendered":"<p>The Silicon Carbide (SiC) Ceramic End Effector is a high-precision wafer handling component designed for semiconductor automation systems, including wafer transfer robots, AMHS systems, EUV lithography equipment, and high-temperature process tools. Made from high-purity CVD SiC or engineered SSiC, this end effector delivers exceptional rigidity, ultra-low particle generation, and outstanding thermal and chemical stability. It [&hellip;]<\/p>\n","protected":false},"featured_media":2104,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}}},"product_brand":[],"product_cat":[23],"product_tag":[192,191,190,193,194,195,188,104,189,187],"class_list":["post-2100","product","type-product","status-publish","has-post-thumbnail","product_cat-silicon-carbide-sic","product_tag-300mm-wafer-robot-arm","product_tag-amhs-wafer-transfer-tool","product_tag-cvd-sic-end-effector","product_tag-euv-wafer-handling-component","product_tag-high-precision-ceramic-end-effector","product_tag-semiconductor-automation-parts","product_tag-semiconductor-robot-arm","product_tag-sic-ceramic-end-effector","product_tag-silicon-carbide-wafer-handler","product_tag-wafer-handling-end-effector","desktop-align-left","tablet-align-left","mobile-align-left","first","instock","shipping-taxable","product-type-simple"],"_links":{"self":[{"href":"https:\/\/www.xkh-ceramics.com\/nl\/wp-json\/wp\/v2\/product\/2100","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.xkh-ceramics.com\/nl\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.xkh-ceramics.com\/nl\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/nl\/wp-json\/wp\/v2\/comments?post=2100"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/nl\/wp-json\/wp\/v2\/media\/2104"}],"wp:attachment":[{"href":"https:\/\/www.xkh-ceramics.com\/nl\/wp-json\/wp\/v2\/media?parent=2100"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/nl\/wp-json\/wp\/v2\/product_brand?post=2100"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/nl\/wp-json\/wp\/v2\/product_cat?post=2100"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/nl\/wp-json\/wp\/v2\/product_tag?post=2100"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}