{"id":2335,"date":"2026-05-29T03:42:15","date_gmt":"2026-05-29T03:42:15","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&#038;p=2335"},"modified":"2026-05-29T03:42:16","modified_gmt":"2026-05-29T03:42:16","slug":"sic-ceramic-tray-for-wafer-processing-custom-semiconductor-applications","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/hu\/product\/sic-ceramic-tray-for-wafer-processing-custom-semiconductor-applications\/","title":{"rendered":"SiC ker\u00e1mia t\u00e1lca ostyafeldolgoz\u00e1shoz \u00e9s egyedi f\u00e9lvezet\u0151 alkalmaz\u00e1sokhoz"},"content":{"rendered":"<p class=\"isSelectedEnd\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2336 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-4-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-4-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-4-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-4-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-4-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-4-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-4-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-4.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>A SiC ker\u00e1mia t\u00e1lca egy nagy teljes\u00edtm\u00e9ny\u0171 szil\u00edcium-karbid hordoz\u00f3, amelyet fejlett ostyafeldolgoz\u00e1si \u00e9s f\u00e9lvezet\u0151gy\u00e1rt\u00e1si k\u00f6rnyezetekhez terveztek. A nagy tisztas\u00e1g\u00fa szil\u00edcium-karbid (SiC) ker\u00e1mia anyagb\u00f3l k\u00e9sz\u00fclt t\u00e1lc\u00e1k kiv\u00e9teles h\u0151stabilit\u00e1st, nagy mechanikai szil\u00e1rds\u00e1got \u00e9s kiv\u00e1l\u00f3 k\u00e9miai ellen\u00e1ll\u00e1st biztos\u00edtanak az ig\u00e9nyes, magas h\u0151m\u00e9rs\u00e9klet\u0171 alkalmaz\u00e1sokhoz.<\/p>\n<p class=\"isSelectedEnd\">A SiC ker\u00e1mia t\u00e1lc\u00e1kat sz\u00e9les k\u00f6rben haszn\u00e1lj\u00e1k a f\u00e9lvezet\u0151gy\u00e1rt\u00e1si folyamatokban, mint p\u00e9ld\u00e1ul:<\/p>\n<ul data-spread=\"false\">\n<li>LPCVD \/ CVD feldolgoz\u00e1s<\/li>\n<li>Wafer l\u00e1gy\u00edt\u00e1s<\/li>\n<li>Diff\u00fazi\u00f3<\/li>\n<li>Oxid\u00e1ci\u00f3<\/li>\n<li>Epitaxis (EPI)<\/li>\n<li>Magas h\u0151m\u00e9rs\u00e9klet\u0171 szinterez\u00e9s<\/li>\n<li>F\u00e9lvezet\u0151 h\u0151kezel\u00e9s<\/li>\n<\/ul>\n<p class=\"isSelectedEnd\">El\u00e9rhet\u0151:<\/p>\n<ul data-spread=\"false\">\n<li>2 h\u00fcvelykes ostyafeldolgoz\u00e1s<\/li>\n<li>4 h\u00fcvelykes ostyafeldolgoz\u00e1s<\/li>\n<li>6 h\u00fcvelykes ostyafeldolgoz\u00e1s<\/li>\n<li>8 h\u00fcvelykes ostyafeldolgoz\u00e1s<\/li>\n<li>Testreszabott ostyam\u00e9retek \u00e9s strukt\u00far\u00e1k<\/li>\n<\/ul>\n<p class=\"isSelectedEnd\">Ezek a t\u00e1lc\u00e1k kiv\u00e1l\u00f3 ostyatart\u00e1st, egyenletes h\u0151m\u00e9rs\u00e9kletet \u00e9s szennyez\u0151d\u00e9s-ellen\u0151rz\u00e9st biztos\u00edtanak a gy\u00e1rt\u00e1si folyamat sor\u00e1n.<\/p>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>A term\u00e9k jellemz\u0151i<\/h1>\n<h2>Kiv\u00e1l\u00f3 magas h\u0151m\u00e9rs\u00e9kleti ellen\u00e1ll\u00e1s<\/h2>\n<p class=\"isSelectedEnd\">A szil\u00edcium-karbid ker\u00e1miat\u00e1lc\u00e1k sz\u00e9ls\u0151s\u00e9ges h\u0151m\u00e9rs\u00e9kleten is kiv\u00e1l\u00f3 stabilit\u00e1st biztos\u00edtanak, \u00edgy ide\u00e1lisak f\u00e9lvezet\u0151 kemenc\u00e9k \u00e9s h\u0151kezel\u0151 rendszerek sz\u00e1m\u00e1ra.<\/p>\n<h3>El\u0151ny\u00f6k:<\/h3>\n<ul data-spread=\"false\">\n<li>Kiv\u00e1l\u00f3 termikus sokk\u00e1ll\u00f3s\u00e1g<\/li>\n<li>Stabil teljes\u00edtm\u00e9ny gyors f\u0171t\u00e9s \u00e9s h\u0171t\u00e9s k\u00f6zben<\/li>\n<li>Hossz\u00fa \u00e9lettartam folyamatos magas h\u0151m\u00e9rs\u00e9klet\u0171 \u00fczemel\u00e9s mellett<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h2>Nagy mechanikai szil\u00e1rds\u00e1g<\/h2>\n<p class=\"isSelectedEnd\">A hagyom\u00e1nyos ker\u00e1miaanyagokhoz k\u00e9pest a SiC t\u00e1lc\u00e1k kiv\u00e1l\u00f3 kem\u00e9nys\u00e9get \u00e9s hajl\u00edt\u00f3szil\u00e1rds\u00e1got k\u00edn\u00e1lnak, cs\u00f6kkentve a feldolgoz\u00e1s sor\u00e1n bek\u00f6vetkez\u0151 deform\u00e1ci\u00f3 vagy reped\u00e9s kock\u00e1zat\u00e1t.<\/p>\n<h3>El\u0151ny\u00f6k:<\/h3>\n<ul data-spread=\"false\">\n<li>Nagy teherb\u00edr\u00f3 k\u00e9pess\u00e9g<\/li>\n<li>Kiv\u00e1l\u00f3 m\u00e9retstabilit\u00e1s<\/li>\n<li>Alkalmas az automatiz\u00e1lt ostyakezel\u0151 rendszerekhez<\/li>\n<li>Cs\u00f6kkentett karbantart\u00e1si gyakoris\u00e1g<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h2>Kiv\u00e1l\u00f3 k\u00e9miai ellen\u00e1ll\u00e1s<\/h2>\n<p class=\"isSelectedEnd\">A SiC ker\u00e1mia t\u00e1lc\u00e1k rendk\u00edv\u00fcl ellen\u00e1ll\u00f3ak a f\u00e9lvezet\u0151gy\u00e1rt\u00e1sban \u00e1ltal\u00e1nosan haszn\u00e1lt mar\u00f3 vegyszerekkel \u00e9s reakt\u00edv technol\u00f3giai g\u00e1zokkal szemben.<\/p>\n<h3>Ellen\u00e1ll:<\/h3>\n<ul data-spread=\"false\">\n<li>Savak<\/li>\n<li>L\u00fagok<\/li>\n<li>Korroz\u00edv g\u00e1zok<\/li>\n<li>K\u00e9miai g\u0151z\u00f6k<\/li>\n<\/ul>\n<p class=\"isSelectedEnd\">Ez biztos\u00edtja a hossz\u00fa t\u00e1v\u00fa megb\u00edzhat\u00f3s\u00e1got a zord technol\u00f3giai k\u00f6rnyezetekben.<\/p>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h2>Kiv\u00e1l\u00f3 h\u0151vezet\u0151 k\u00e9pess\u00e9g<\/h2>\n<p class=\"isSelectedEnd\">A szil\u00edcium-karbid nagy h\u0151vezet\u0151 k\u00e9pess\u00e9ge gyors \u00e9s egyenletes h\u0151\u00e1tad\u00e1st tesz lehet\u0151v\u00e9 a t\u00e1lca fel\u00fclet\u00e9n.<\/p>\n<h3>Feldolgoz\u00e1si el\u0151ny\u00f6k:<\/h3>\n<ul data-spread=\"false\">\n<li>Jav\u00edtott wafer-h\u0151m\u00e9rs\u00e9klet egyenletess\u00e9g<\/li>\n<li>Cs\u00f6kkentett h\u0151gradiensek<\/li>\n<li>Fokozott folyamat-konzisztencia<\/li>\n<li>Alacsonyabb wafer hibaar\u00e1ny<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h2>Alacsony h\u0151t\u00e1gul\u00e1s<\/h2>\n<p class=\"isSelectedEnd\">Az alacsony h\u0151t\u00e1gul\u00e1si egy\u00fctthat\u00f3 seg\u00edt meg\u0151rizni a szerkezeti pontoss\u00e1got az ism\u00e9telt h\u0151ciklusok sor\u00e1n.<\/p>\n<h3>Eredm\u00e9ny:<\/h3>\n<ul data-spread=\"false\">\n<li>Cs\u00f6kkentett torzul\u00e1s<\/li>\n<li>Jobb wafer igaz\u00edt\u00e1s<\/li>\n<li>Jav\u00edtott termel\u00e9si stabilit\u00e1s<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h2>F\u00e9lvezet\u0151 tisztas\u00e1g\u00fa tisztas\u00e1g<\/h2>\n<p class=\"isSelectedEnd\">A 99,9% nagytisztas\u00e1g\u00fa szil\u00edciumkarbid anyagb\u00f3l k\u00e9sz\u00fclt t\u00e1lc\u00e1k seg\u00edtenek minimaliz\u00e1lni a r\u00e9szecskeszennyez\u00e9st \u00e9s t\u00e1mogatj\u00e1k a tisztaszobai f\u00e9lvezet\u0151gy\u00e1rt\u00e1si szabv\u00e1nyokat.<\/p>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>M\u0171szaki specifik\u00e1ci\u00f3k<\/h1>\n<table>\n<tbody>\n<tr>\n<th>Ingatlan<\/th>\n<th>\u00c9rt\u00e9k<\/th>\n<\/tr>\n<tr>\n<td>Anyag<\/td>\n<td>Szil\u00edcium-karbid (SiC)<\/td>\n<\/tr>\n<tr>\n<td>Tisztas\u00e1g<\/td>\n<td>99.9%<\/td>\n<\/tr>\n<tr>\n<td>Sz\u00ednes<\/td>\n<td>Fekete<\/td>\n<\/tr>\n<tr>\n<td>S\u0171r\u0171s\u00e9g<\/td>\n<td>3,14 g\/cm\u00b3<\/td>\n<\/tr>\n<tr>\n<td>Hajl\u00edt\u00f3szil\u00e1rds\u00e1g<\/td>\n<td>410 MPa<\/td>\n<\/tr>\n<tr>\n<td>Young modulus<\/td>\n<td>430 GPa<\/td>\n<\/tr>\n<tr>\n<td>Poisson-sz\u00e1m<\/td>\n<td>0.17<\/td>\n<\/tr>\n<tr>\n<td>T\u00f6r\u00e9sszil\u00e1rds\u00e1g<\/td>\n<td>2-3 MPa-m1\/2<\/td>\n<\/tr>\n<tr>\n<td>H\u0151t\u00e1gul\u00e1si egy\u00fctthat\u00f3<\/td>\n<td>4.1 \u00d7 10-\u2076\/K<\/td>\n<\/tr>\n<tr>\n<td>H\u0151vezet\u0151 k\u00e9pess\u00e9g<\/td>\n<td>170 W\/m-K<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>SiC gy\u00e1rt\u00e1si technol\u00f3gia \u00f6sszehasonl\u00edt\u00e1s<\/h1>\n<table>\n<tbody>\n<tr>\n<td>Gy\u00e1rt\u00e1si m\u00f3dszer<\/td>\n<td>Jellemz\u0151k<\/td>\n<td>Tipikus alkalmaz\u00e1sok<\/td>\n<\/tr>\n<tr>\n<td>Nyom\u00e1smentes szinterezett SiC<\/td>\n<td>Nagy tisztas\u00e1g \u00e9s h\u0151stabilit\u00e1s<\/td>\n<td>F\u00e9lvezet\u0151 ostyat\u00e1lc\u00e1k<\/td>\n<\/tr>\n<tr>\n<td>Forr\u00f3n pr\u00e9selt SiC<\/td>\n<td>Nagyobb mechanikai szil\u00e1rds\u00e1g<\/td>\n<td>Szerkezeti ker\u00e1mia alkatr\u00e9szek<\/td>\n<\/tr>\n<tr>\n<td>CVD SiC<\/td>\n<td>Rendk\u00edv\u00fcl nagy tisztas\u00e1g\u00fa fel\u00fclet<\/td>\n<td>Fejlett f\u00e9lvezet\u0151 berendez\u00e9sek<\/td>\n<\/tr>\n<tr>\n<td>Si-SiC<\/td>\n<td>K\u00f6lts\u00e9ghat\u00e9kony megold\u00e1s<\/td>\n<td>Ipari kemence alkatr\u00e9szek<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>SiC ker\u00e1mia t\u00e1lc\u00e1k alkalmaz\u00e1sai<\/h1>\n<h2><img decoding=\"async\" class=\"size-medium wp-image-2338 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-2-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-2-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-2-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-2-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-2-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-2-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-2-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-2.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>F\u00e9lvezet\u0151 szeletek feldolgoz\u00e1sa<\/h2>\n<p class=\"isSelectedEnd\">Sz\u00e9les k\u00f6rben haszn\u00e1lj\u00e1k ostyatart\u00f3k\u00e9nt \u00e9s tart\u00f3 t\u00e1lcak\u00e9nt a k\u00f6vetkez\u0151kben:<\/p>\n<ul data-spread=\"false\">\n<li>LPCVD rendszerek<\/li>\n<li>CVD rendszerek<\/li>\n<li>Diff\u00fazi\u00f3s kemenc\u00e9k<\/li>\n<li>Oxid\u00e1ci\u00f3s kemenc\u00e9k<\/li>\n<li>Izzaszt\u00f3 berendez\u00e9s<\/li>\n<li>F\u00e9lvezet\u0151 termikus reaktorok<\/li>\n<\/ul>\n<p class=\"isSelectedEnd\">Kompatibilis a k\u00f6vetkez\u0151kkel:<\/p>\n<ul data-spread=\"false\">\n<li>Szil\u00edcium osty\u00e1k<\/li>\n<li>Zaf\u00edr ostya<\/li>\n<li>SiC osty\u00e1k<\/li>\n<li>GaN osty\u00e1k<\/li>\n<li>\u00d6sszetett f\u00e9lvezet\u0151 szubsztr\u00e1tumok<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h2>Magas h\u0151m\u00e9rs\u00e9klet\u0171 szinterez\u00e9s<\/h2>\n<p class=\"isSelectedEnd\">Ide\u00e1lis fejlett ker\u00e1mia- \u00e9s porszinterez\u00e9si alkalmaz\u00e1sokhoz, amelyek megk\u00f6vetelik:<\/p>\n<ul data-spread=\"false\">\n<li>H\u0151stabilit\u00e1s<\/li>\n<li>Oxid\u00e1ci\u00f3s ellen\u00e1ll\u00e1s<\/li>\n<li>Hossz\u00fa \u00e9lettartam<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h2>K\u00e9miai feldolgoz\u00f3 berendez\u00e9sek<\/h2>\n<p class=\"isSelectedEnd\">Kiv\u00e1l\u00f3 korr\u00f3zi\u00f3\u00e1ll\u00f3s\u00e1ga miatt alkalmas agressz\u00edv k\u00e9miai k\u00f6rnyezetbe.<\/p>\n<p class=\"isSelectedEnd\">Az alkalmaz\u00e1sok k\u00f6z\u00e9 tartoznak:<\/p>\n<ul data-spread=\"false\">\n<li>K\u00e9miai reaktorok<\/li>\n<li>F\u00e9lvezet\u0151k nedves feldolgoz\u00e1sa<\/li>\n<li>Korroz\u00edv g\u00e1zos k\u00f6rnyezetek<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h2>Optikai \u00e9s prec\u00edzi\u00f3s gy\u00e1rt\u00e1s<\/h2>\n<p class=\"isSelectedEnd\">Stabil t\u00e1mogat\u00e1st ny\u00fajt a k\u00f6vetkez\u0151kh\u00f6z:<\/p>\n<ul data-spread=\"false\">\n<li>Optikai hordoz\u00f3k<\/li>\n<li>Zaf\u00edr optikai alkatr\u00e9szek<\/li>\n<li>Prec\u00edzi\u00f3s ker\u00e1mia alkatr\u00e9szek<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h2>Rep\u00fcl\u0151g\u00e9pipari \u00e9s ipari termikus rendszerek<\/h2>\n<p class=\"isSelectedEnd\">Olyan ipar\u00e1gakban haszn\u00e1latos, amelyek megk\u00f6vetelik:<\/p>\n<ul data-spread=\"false\">\n<li>K\u00f6nny\u0171, nagy szil\u00e1rds\u00e1g\u00fa anyagok<\/li>\n<li>H\u0151gazd\u00e1lkod\u00e1s<\/li>\n<li>Korr\u00f3zi\u00f3\u00e1ll\u00f3 alkatr\u00e9szek<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>Testreszab\u00e1si szolg\u00e1ltat\u00e1sok<\/h1>\n<p class=\"isSelectedEnd\">Egyedi SiC ker\u00e1mia t\u00e1lc\u00e1s megold\u00e1sokat k\u00edn\u00e1lunk az \u00fcgyfelek ig\u00e9nyei szerint.<\/p>\n<h2><img decoding=\"async\" class=\"size-medium wp-image-2337 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-3-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-3-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-3-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-3-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-3-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-3-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-3-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/SiC-Ceramic-Tray-for-Wafer-Processing-Custom-Semiconductor-Applications-3.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>El\u00e9rhet\u0151 egy\u00e9ni opci\u00f3k<\/h2>\n<ul data-spread=\"false\">\n<li>Egyedi m\u00e9retek<\/li>\n<li>Multi-wafer t\u00e1lca kialak\u00edt\u00e1s<\/li>\n<li>V\u00e1jat \u00e9s horony megmunk\u00e1l\u00e1s<\/li>\n<li>Prec\u00edzi\u00f3s lyukf\u00far\u00e1s<\/li>\n<li>Fel\u00fclet pol\u00edroz\u00e1sa<\/li>\n<li>Speci\u00e1lis bevonatok<\/li>\n<li>Testreszabott termikus feldolgoz\u00e1si kompatibilit\u00e1s<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>A SiC ker\u00e1mia t\u00e1lc\u00e1k el\u0151nyei<\/h1>\n<p class=\"isSelectedEnd\">A kvarc-, timf\u00f6ld- \u00e9s grafitt\u00e1lc\u00e1kkal \u00f6sszehasonl\u00edtva a szil\u00edcium-karbid ker\u00e1mia t\u00e1lc\u00e1k:<\/p>\n<table>\n<tbody>\n<tr>\n<td>Teljes\u00edtm\u00e9ny<\/td>\n<td>SiC ker\u00e1mia t\u00e1lca<\/td>\n<\/tr>\n<tr>\n<td>H\u0151vezet\u0151 k\u00e9pess\u00e9g<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<\/tr>\n<tr>\n<td>H\u0151sokk-ellen\u00e1ll\u00e1s<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<\/tr>\n<tr>\n<td>Mechanikai szil\u00e1rds\u00e1g<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<\/tr>\n<tr>\n<td>Korr\u00f3zi\u00f3\u00e1ll\u00f3s\u00e1g<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<\/tr>\n<tr>\n<td>M\u00e9retbeli stabilit\u00e1s<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<\/tr>\n<tr>\n<td>\u00c9lettartam<\/td>\n<td>Hossz\u00fa<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>GYIK<\/h1>\n<h2>Testre szabhat\u00f3 a SiC ker\u00e1mia t\u00e1lca?<\/h2>\n<p class=\"isSelectedEnd\">Igen. T\u00e1mogatjuk az egyedi m\u00e9reteket, strukt\u00far\u00e1kat, hornyokat \u00e9s feldolgoz\u00e1si terveket az \u00fcgyf\u00e9l ostyaspecifik\u00e1ci\u00f3knak \u00e9s a berendez\u00e9sek k\u00f6vetelm\u00e9nyeinek megfelel\u0151en.<\/p>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h2>Milyen ostyam\u00e9retek t\u00e1mogatottak?<\/h2>\n<p class=\"isSelectedEnd\">A t\u00e1lc\u00e1k a k\u00f6vetkez\u0151kre tervezhet\u0151k:<\/p>\n<ul data-spread=\"false\">\n<li>2 h\u00fcvelykes osty\u00e1k<\/li>\n<li>4 h\u00fcvelykes osty\u00e1k<\/li>\n<li>6 h\u00fcvelykes osty\u00e1k<\/li>\n<li>8 h\u00fcvelykes osty\u00e1k<\/li>\n<li>Nagyobb egyedi ostyaform\u00e1tumok<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h2>Alkalmas-e a SiC t\u00e1lca f\u00e9lvezet\u0151 kemenc\u00e9kben t\u00f6rt\u00e9n\u0151 alkalmaz\u00e1sra?<\/h2>\n<p>Igen. A SiC ker\u00e1mia t\u00e1lc\u00e1kat kifejezetten magas h\u0151m\u00e9rs\u00e9klet\u0171 f\u00e9lvezet\u0151-feldolgoz\u00e1si k\u00f6rnyezetekhez tervezt\u00e9k, \u00e9s kiv\u00e1l\u00f3 h\u0151stabilit\u00e1st \u00e9s tart\u00f3ss\u00e1got biztos\u00edtanak.<\/p>","protected":false},"excerpt":{"rendered":"<p>A SiC ker\u00e1mia t\u00e1lca egy nagy teljes\u00edtm\u00e9ny\u0171 szil\u00edcium-karbid hordoz\u00f3, amelyet fejlett ostyafeldolgoz\u00e1si \u00e9s f\u00e9lvezet\u0151gy\u00e1rt\u00e1si k\u00f6rnyezetekhez terveztek. A nagy tisztas\u00e1g\u00fa szil\u00edcium-karbid (SiC) ker\u00e1mia anyagb\u00f3l k\u00e9sz\u00fclt t\u00e1lc\u00e1k kiv\u00e9teles h\u0151stabilit\u00e1st, nagy mechanikai szil\u00e1rds\u00e1got \u00e9s kiv\u00e1l\u00f3 k\u00e9miai ellen\u00e1ll\u00e1st biztos\u00edtanak az ig\u00e9nyes, magas h\u0151m\u00e9rs\u00e9klet\u0171 alkalmaz\u00e1sokhoz.<\/p>","protected":false},"featured_media":2340,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}}},"product_brand":[],"product_cat":[23],"product_tag":[634,411,122,635,171,637,301,210,121,633,636,177,632,630,631],"class_list":["post-2335","product","type-product","status-publish","has-post-thumbnail","product_cat-silicon-carbide-sic","product_tag-custom-sic-tray","product_tag-cvd-wafer-carrier","product_tag-high-temperature-ceramic-tray","product_tag-lpcvd-wafer-tray","product_tag-semiconductor-ceramic-components","product_tag-semiconductor-processing-accessories","product_tag-semiconductor-wafer-holder","product_tag-semiconductor-wafer-tray","product_tag-sic-ceramic-tray","product_tag-sic-furnace-tray","product_tag-sic-substrate-carrier","product_tag-sic-wafer-carrier","product_tag-silicon-carbide-ceramic-plate","product_tag-silicon-carbide-tray","product_tag-wafer-processing-tray","desktop-align-left","tablet-align-left","mobile-align-left","first","instock","shipping-taxable","product-type-simple"],"_links":{"self":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/product\/2335","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/comments?post=2335"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/media\/2340"}],"wp:attachment":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/media?parent=2335"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/product_brand?post=2335"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/product_cat?post=2335"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/product_tag?post=2335"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}