{"id":2331,"date":"2026-05-29T03:20:28","date_gmt":"2026-05-29T03:20:28","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&#038;p=2331"},"modified":"2026-05-29T03:21:23","modified_gmt":"2026-05-29T03:21:23","slug":"silicon-carbide-horizontal-process-tube-for-lpcvd-cvd-semiconductor-processes","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/hu\/product\/silicon-carbide-horizontal-process-tube-for-lpcvd-cvd-semiconductor-processes\/","title":{"rendered":"Szil\u00edcium-karbid v\u00edzszintes folyamatcs\u0151 LPCVD\/CVD f\u00e9lvezet\u0151 folyamatokhoz"},"content":{"rendered":"<p class=\"isSelectedEnd\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2332 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>A szil\u00edcium-karbid (SiC) horizont\u00e1lis folyamatcs\u00f6vet magas h\u0151m\u00e9rs\u00e9klet\u0171 LPCVD, CVD, diff\u00fazi\u00f3s, oxid\u00e1ci\u00f3s \u00e9s l\u00e1gy\u00edt\u00e1si alkalmaz\u00e1sokhoz tervezt\u00e9k a f\u00e9lvezet\u0151-, fotovoltaikus \u00e9s fejlett anyaggy\u00e1rt\u00e1sban.<\/p>\n<p class=\"isSelectedEnd\">A horizont\u00e1lis h\u0151feldolgoz\u00f3 rendszerek k\u00f6zponti reakci\u00f3kamra-alkatr\u00e9szek\u00e9nt a folyamatcs\u0151 k\u00f6zvetlen\u00fcl befoly\u00e1solja a h\u0151m\u00e9rs\u00e9klet egyenletess\u00e9g\u00e9t, a szennyez\u0151d\u00e9sek ellen\u0151rz\u00e9s\u00e9t, a folyamat stabilit\u00e1s\u00e1t \u00e9s a berendez\u00e9s teljes \u00e9lettartam\u00e1t.<\/p>\n<p class=\"isSelectedEnd\">SiC v\u00edzszintes folyamatcs\u00f6veinket fejlett monolitikus 3D nyomtat\u00e1si technol\u00f3gi\u00e1val \u00e9s ultra-nagy tisztas\u00e1g\u00fa CVD szil\u00edciumkarbid bevonattal kombin\u00e1lva gy\u00e1rtjuk. A varratmentes, egy darabb\u00f3l \u00e1ll\u00f3 szerkezet kik\u00fcsz\u00f6b\u00f6li a hegeszt\u00e9si illeszt\u00e9seket \u00e9s az \u00f6sszeszerel\u00e9ssel kapcsolatos gyenge pontokat, jelent\u0151sen jav\u00edtva a mechanikai megb\u00edzhat\u00f3s\u00e1got \u00e9s a sziv\u00e1rg\u00e1s\u00e1ll\u00f3s\u00e1got a folyamatos magas h\u0151m\u00e9rs\u00e9klet\u0171 m\u0171k\u00f6d\u00e9s sor\u00e1n.<\/p>\n<p class=\"isSelectedEnd\">A hagyom\u00e1nyos kvarc technol\u00f3giai cs\u00f6vekhez k\u00e9pest a szil\u00edcium-karbid l\u00e9nyegesen nagyobb h\u0151vezet\u0151 k\u00e9pess\u00e9get, jobb h\u0151sokk\u00e1ll\u00f3s\u00e1got, kiv\u00e1l\u00f3 korr\u00f3zi\u00f3\u00e1ll\u00f3s\u00e1got \u00e9s hosszabb \u00e9lettartamot biztos\u00edt, k\u00fcl\u00f6n\u00f6sen agressz\u00edv oxid\u00e1l\u00f3 \u00e9s kl\u00f3rtartalm\u00fa technol\u00f3giai k\u00f6rnyezetben.<\/p>\n<p class=\"isSelectedEnd\">A term\u00e9ket f\u00e9lvezet\u0151 min\u0151s\u00e9g\u0171 tiszta feldolgoz\u00e1si k\u00f6rnyezetekre optimaliz\u00e1lt\u00e1k, amelyek alacsony r\u00e9szecske keletkez\u00e9st, alacsony f\u00e9mszennyezetts\u00e9get \u00e9s stabil termikus teljes\u00edtm\u00e9nyt ig\u00e9nyelnek 1250\u00b0C-ig.<\/p>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>F\u0151 jellemz\u0151k<\/h1>\n<h2><img decoding=\"async\" class=\"size-medium wp-image-2333 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Monolitikus, egy darabb\u00f3l \u00e1ll\u00f3 SiC szerkezet<\/h2>\n<p class=\"isSelectedEnd\">Az integr\u00e1lt 3D nyomtatott szil\u00edcium-karbid test kik\u00fcsz\u00f6b\u00f6li a hagyom\u00e1nyos \u00f6sszeszerelt szerkezetekn\u00e9l tal\u00e1lhat\u00f3 varratokat, forraszt\u00e1si pontokat \u00e9s potenci\u00e1lis sziv\u00e1rg\u00e1si utakat.<\/p>\n<p class=\"isSelectedEnd\">Az el\u0151ny\u00f6k k\u00f6z\u00e9 tartoznak:<\/p>\n<ul data-spread=\"false\">\n<li>Nagyobb szerkezeti stabilit\u00e1s<\/li>\n<li>Jav\u00edtott v\u00e1kuumintegrit\u00e1s<\/li>\n<li>Jobb m\u00e9retbeli konzisztencia<\/li>\n<li>Cs\u00f6kkentett termikus fesz\u00fclts\u00e9gkoncentr\u00e1ci\u00f3<\/li>\n<\/ul>\n<h2>Ultra-nagy tisztas\u00e1g\u00fa CVD SiC bevonat<\/h2>\n<p class=\"isSelectedEnd\">A s\u0171r\u0171 CVD szil\u00edciumkarbid bevonat biztos\u00edtja:<\/p>\n<ul data-spread=\"false\">\n<li>5 ppm alatti fel\u00fcleti szennyez\u0151d\u00e9sek<\/li>\n<li>Kiv\u00e1l\u00f3 k\u00e9miai inertit\u00e1s<\/li>\n<li>Cs\u00f6kkentett r\u00e9szecskeszennyez\u00e9s<\/li>\n<li>Kiv\u00e1l\u00f3 ellen\u00e1ll\u00e1s az oxid\u00e1ci\u00f3val \u00e9s a kl\u00f3rtartalm\u00fa g\u00e1zokkal szemben<\/li>\n<\/ul>\n<p class=\"isSelectedEnd\">Ez teszi a folyamatcs\u00f6vet alkalmass\u00e1 a fejlett f\u00e9lvezet\u0151 h\u0151kezel\u00e9si alkalmaz\u00e1sokhoz.<\/p>\n<h2>Kiv\u00e1l\u00f3 h\u0151vezet\u0151 k\u00e9pess\u00e9g<\/h2>\n<p class=\"isSelectedEnd\">A szil\u00edciumkarbid sokkal nagyobb h\u0151vezet\u0151 k\u00e9pess\u00e9get biztos\u00edt, mint a kvarc vagy a timf\u00f6ld, ami seg\u00edt el\u00e9rni:<\/p>\n<ul data-spread=\"false\">\n<li>Gyorsabb h\u0151reakci\u00f3<\/li>\n<li>Jav\u00edtott axi\u00e1lis \u00e9s radi\u00e1lis h\u0151m\u00e9rs\u00e9kleti egyenletess\u00e9g<\/li>\n<li>Stabil ostyafeldolgoz\u00e1si felt\u00e9telek<\/li>\n<\/ul>\n<h2>Kiemelked\u0151 termikus \u00fct\u00e9s\u00e1ll\u00f3s\u00e1g<\/h2>\n<p class=\"isSelectedEnd\">A cs\u0151 reped\u00e9s, deform\u00e1ci\u00f3 vagy bevonatlepattan\u00e1s n\u00e9lk\u00fcl b\u00edrja az ism\u00e9telt gyors f\u0171t\u00e9si \u00e9s h\u0171t\u00e9si ciklusokat.<\/p>\n<h2>Hossz\u00fa \u00e9lettartam<\/h2>\n<p class=\"isSelectedEnd\">A kvarc technol\u00f3giai cs\u00f6vekkel \u00f6sszehasonl\u00edtva a SiC cs\u00f6vek a k\u00f6vetkez\u0151ket k\u00edn\u00e1lj\u00e1k:<\/p>\n<ul data-spread=\"false\">\n<li>Hosszabb csereintervallumok<\/li>\n<li>Alacsonyabb karbantart\u00e1si gyakoris\u00e1g<\/li>\n<li>Cs\u00f6kkentett kamra le\u00e1ll\u00e1si id\u0151<\/li>\n<li>Jav\u00edtott teljes tulajdonl\u00e1si k\u00f6lts\u00e9g (TCO)<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>Tipikus alkalmaz\u00e1sok<\/h1>\n<h2><img decoding=\"async\" class=\"size-medium wp-image-2334 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>F\u00e9lvezet\u0151gy\u00e1rt\u00e1s<\/h2>\n<p class=\"isSelectedEnd\">Alkalmas:<\/p>\n<ul data-spread=\"false\">\n<li>LPCVD rendszerek<\/li>\n<li>CVD lev\u00e1laszt\u00f3 berendez\u00e9s<\/li>\n<li>Oxid\u00e1ci\u00f3s kemenc\u00e9k<\/li>\n<li>Diff\u00fazi\u00f3s kemenc\u00e9k<\/li>\n<li>Izz\u00edt\u00e1si rendszerek<\/li>\n<li>Wafer h\u0151kezel\u00e9si elj\u00e1r\u00e1sok<\/li>\n<\/ul>\n<h2>Fotovoltaikus ipar<\/h2>\n<p class=\"isSelectedEnd\">Felhaszn\u00e1lva:<\/p>\n<ul data-spread=\"false\">\n<li>Napelemes diff\u00fazi\u00f3s feldolgoz\u00e1s<\/li>\n<li>Fel\u00fcleti passziv\u00e1l\u00e1s<\/li>\n<li>V\u00e9konyr\u00e9teg-lev\u00e1laszt\u00e1s<\/li>\n<li>Magas h\u0151m\u00e9rs\u00e9klet\u0171 ostyakezel\u00e9s<\/li>\n<\/ul>\n<h2>Fejlett anyagfeldolgoz\u00e1s<\/h2>\n<p class=\"isSelectedEnd\">Alkalmazhat\u00f3:<\/p>\n<ul data-spread=\"false\">\n<li>Karboniz\u00e1ci\u00f3s folyamatok<\/li>\n<li>Nitrid\u00e1ci\u00f3s kezel\u00e9s<\/li>\n<li>Funkcion\u00e1lis v\u00e9konyr\u00e9teg-k\u00e9pz\u00e9s<\/li>\n<li>Fel\u00fcleti aktiv\u00e1l\u00e1s \u00e9s m\u00f3dos\u00edt\u00e1s<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>Folyamat kompatibilit\u00e1s<\/h1>\n<h2>Kompatibilis technol\u00f3giai l\u00e9gk\u00f6r\u00f6k<\/h2>\n<ul data-spread=\"false\">\n<li>Oxig\u00e9n (O\u2082)<\/li>\n<li>Nitrog\u00e9n (N\u2082)<\/li>\n<li>Nagy tisztas\u00e1g\u00fa inert g\u00e1zok<\/li>\n<li>Szab\u00e1lyozott kl\u00f3rtartalm\u00fa g\u00e1zok<\/li>\n<li>Oxid\u00e1l\u00f3 l\u00e9gk\u00f6r\u00f6k<\/li>\n<\/ul>\n<h2>Tipikus folyamatablak<\/h2>\n<table>\n<tbody>\n<tr>\n<th>Param\u00e9ter<\/th>\n<th>Specifik\u00e1ci\u00f3<\/th>\n<\/tr>\n<tr>\n<td>Maxim\u00e1lis folyamatos \u00fczemi h\u0151m\u00e9rs\u00e9klet<\/td>\n<td>1250\u00b0C<\/td>\n<\/tr>\n<tr>\n<td>Nyom\u00e1s tartom\u00e1ny<\/td>\n<td>LPCVD v\u00e1kuumt\u00f3l k\u00f6zel l\u00e9gk\u00f6ri h\u0151m\u00e9rs\u00e9kletig<\/td>\n<\/tr>\n<tr>\n<td>H\u0151sokk-ellen\u00e1ll\u00e1s<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<\/tr>\n<tr>\n<td>Sziv\u00e1rg\u00e1s Szoross\u00e1g<\/td>\n<td>\u2264 1\u00d710-\u2079 Pa-m\u00b3\/s<\/td>\n<\/tr>\n<tr>\n<td>Fel\u00fcleti \u00e9rdess\u00e9g<\/td>\n<td>Ra \u2264 0,8-1,6 \u00b5m<\/td>\n<\/tr>\n<tr>\n<td>Bevonat tisztas\u00e1ga<\/td>\n<td>\uff1c 5 ppm<\/td>\n<\/tr>\n<tr>\n<td>Szubsztr\u00e1t szennyez\u0151d\u00e9s<\/td>\n<td>\uff1c 300 ppm<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>M\u0171szaki specifik\u00e1ci\u00f3k<\/h1>\n<table>\n<tbody>\n<tr>\n<td>T\u00e9tel<\/td>\n<td>Specifik\u00e1ci\u00f3<\/td>\n<\/tr>\n<tr>\n<td>Term\u00e9k neve<\/td>\n<td>Szil\u00edcium-karbid v\u00edzszintes folyamat cs\u0151<\/td>\n<\/tr>\n<tr>\n<td>Anyag<\/td>\n<td>Nagy tisztas\u00e1g\u00fa szil\u00edcium-karbid<\/td>\n<\/tr>\n<tr>\n<td>Bevonat<\/td>\n<td>CVD SiC bevonat<\/td>\n<\/tr>\n<tr>\n<td>Gy\u00e1rt\u00e1si folyamat<\/td>\n<td>Monolitikus 3D nyomtat\u00e1s<\/td>\n<\/tr>\n<tr>\n<td>Maxim\u00e1lis \u00fczemi h\u0151m\u00e9rs\u00e9klet<\/td>\n<td>\u2264 1250\u00b0C<\/td>\n<\/tr>\n<tr>\n<td>H\u0151vezet\u0151 k\u00e9pess\u00e9g<\/td>\n<td>Magas<\/td>\n<\/tr>\n<tr>\n<td>H\u0151sokk-ellen\u00e1ll\u00e1s<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<\/tr>\n<tr>\n<td>Korr\u00f3zi\u00f3\u00e1ll\u00f3s\u00e1g<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<\/tr>\n<tr>\n<td>Fel\u00fcleti \u00e9rdess\u00e9g<\/td>\n<td>Ra \u2264 0,8-1,6 \u00b5m<\/td>\n<\/tr>\n<tr>\n<td>Bevonat szennyez\u0151d\u00e9sek<\/td>\n<td>\uff1c 5 ppm<\/td>\n<\/tr>\n<tr>\n<td>Sziv\u00e1rg\u00e1s Szoross\u00e1g<\/td>\n<td>\u2264 1\u00d710-\u2079 Pa-m\u00b3\/s<\/td>\n<\/tr>\n<tr>\n<td>Tipikus alkalmaz\u00e1sok<\/td>\n<td>LPCVD \/ CVD \/ Diff\u00fazi\u00f3 \/ Oxid\u00e1ci\u00f3<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>El\u0151ny\u00f6k a hagyom\u00e1nyos folyamatcs\u00f6vekkel szemben<\/h1>\n<table>\n<tbody>\n<tr>\n<td>Ingatlan<\/td>\n<td>SiC folyamat cs\u0151<\/td>\n<td>Kvarc cs\u0151<\/td>\n<td>Alum\u00ednium-oxid cs\u0151<\/td>\n<\/tr>\n<tr>\n<td>H\u0151vezet\u0151 k\u00e9pess\u00e9g<\/td>\n<td>Magas<\/td>\n<td>Alacsony<\/td>\n<td>Alacsony<\/td>\n<\/tr>\n<tr>\n<td>H\u0151sokk-ellen\u00e1ll\u00e1s<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<td>Gyenge<\/td>\n<td>M\u00e9rs\u00e9kelt<\/td>\n<\/tr>\n<tr>\n<td>Korr\u00f3zi\u00f3\u00e1ll\u00f3s\u00e1g<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<td>M\u00e9rs\u00e9kelt<\/td>\n<td>J\u00f3<\/td>\n<\/tr>\n<tr>\n<td>R\u00e9szecsk\u00e9k ellen\u0151rz\u00e9se<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<td>M\u00e9rs\u00e9kelt<\/td>\n<td>M\u00e9rs\u00e9kelt<\/td>\n<\/tr>\n<tr>\n<td>\u00c9lettartam<\/td>\n<td>Hossz\u00fa<\/td>\n<td>R\u00f6vid<\/td>\n<td>K\u00f6zepes<\/td>\n<\/tr>\n<tr>\n<td>Magas h\u0151m\u00e9rs\u00e9klet\u0171 stabilit\u00e1s<\/td>\n<td>Kiv\u00e1l\u00f3<\/td>\n<td>M\u00e9rs\u00e9kelt<\/td>\n<td>J\u00f3<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>Testreszab\u00e1si lehet\u0151s\u00e9gek<\/h1>\n<p class=\"isSelectedEnd\">Egyedi specifik\u00e1ci\u00f3k \u00e1llnak rendelkez\u00e9sre az \u00fcgyf\u00e9l felszerel\u00e9si ig\u00e9nyei szerint, bele\u00e9rtve:<\/p>\n<ul data-spread=\"false\">\n<li>Cs\u0151 \u00e1tm\u00e9r\u0151je \u00e9s hossza<\/li>\n<li>Falvastags\u00e1g optimaliz\u00e1l\u00e1sa<\/li>\n<li>Karim\u00e1k \u00e9s interf\u00e9sz szerkezetek<\/li>\n<li>Funkcion\u00e1lis g\u00e1zny\u00edl\u00e1sok<\/li>\n<li>Bels\u0151\/k\u00fcls\u0151 bevonat konfigur\u00e1ci\u00f3k<\/li>\n<li>Fel\u00fcletpol\u00edroz\u00e1si fokozatok<\/li>\n<li>Tisztas\u00e1gi el\u0151\u00edr\u00e1sok<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>GYIK<\/h1>\n<h2>1. k\u00e9rd\u00e9s: Mi\u00e9rt v\u00e1lassza a szil\u00edcium-karbidot a kvarcfolyamatcs\u00f6vek helyett?<\/h2>\n<p class=\"isSelectedEnd\">A szil\u00edciumkarbid nagyobb h\u0151vezet\u0151 k\u00e9pess\u00e9get, alacsonyabb szennyezetts\u00e9get, jobb h\u0151sokk\u00e1ll\u00f3s\u00e1got \u00e9s l\u00e9nyegesen hosszabb \u00e9lettartamot biztos\u00edt, mint a kvarc, k\u00fcl\u00f6n\u00f6sen a magas h\u0151m\u00e9rs\u00e9klet\u0171 f\u00e9lvezet\u0151 folyamatokban.<\/p>\n<h2>2. k\u00e9rd\u00e9s: Milyen elj\u00e1r\u00e1sok kompatibilisek ezzel a cs\u0151vel?<\/h2>\n<p class=\"isSelectedEnd\">A cs\u0151 alkalmas LPCVD, CVD, diff\u00fazi\u00f3, oxid\u00e1ci\u00f3, l\u00e1gy\u00edt\u00e1s, passziv\u00e1l\u00e1s \u00e9s egy\u00e9b magas h\u0151m\u00e9rs\u00e9klet\u0171 h\u0151kezel\u00e9si alkalmaz\u00e1sokhoz.<\/p>\n<h2>3. k\u00e9rd\u00e9s: M\u0171k\u00f6dhet-e a cs\u0151 kl\u00f3rtartalm\u00fa l\u00e9gk\u00f6rben?<\/h2>\n<p>Igen. A CVD SiC bevonat kiv\u00e1l\u00f3an ellen\u00e1ll az ellen\u0151rz\u00f6tt kl\u00f3rtartalm\u00fa technol\u00f3giai k\u00f6rnyezeteknek.<\/p>","protected":false},"excerpt":{"rendered":"<p class=\"isSelectedEnd\">A szil\u00edcium-karbid (SiC) horizont\u00e1lis folyamatcs\u00f6vet magas h\u0151m\u00e9rs\u00e9klet\u0171 LPCVD, CVD, diff\u00fazi\u00f3s, oxid\u00e1ci\u00f3s \u00e9s l\u00e1gy\u00edt\u00e1si alkalmaz\u00e1sokhoz tervezt\u00e9k a f\u00e9lvezet\u0151-, fotovoltaikus \u00e9s fejlett anyaggy\u00e1rt\u00e1sban.<\/p>\n<p class=\"isSelectedEnd\">A horizont\u00e1lis h\u0151feldolgoz\u00f3 rendszerek k\u00f6zponti reakci\u00f3kamra-alkatr\u00e9szek\u00e9nt a folyamatcs\u0151 k\u00f6zvetlen\u00fcl befoly\u00e1solja a h\u0151m\u00e9rs\u00e9klet egyenletess\u00e9g\u00e9t, a szennyez\u0151d\u00e9sek ellen\u0151rz\u00e9s\u00e9t, a folyamat stabilit\u00e1s\u00e1t \u00e9s a berendez\u00e9s teljes \u00e9lettartam\u00e1t.<\/p>","protected":false},"featured_media":2334,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}}},"product_brand":[],"product_cat":[23],"product_tag":[625,626,602,624,609,603,629,627,623,628,622],"class_list":["post-2331","product","type-product","status-publish","has-post-thumbnail","product_cat-silicon-carbide-sic","product_tag-cvd-process-tube","product_tag-cvd-sic-coated-tube","product_tag-high-purity-silicon-carbide-tube","product_tag-lpcvd-process-tube","product_tag-semiconductor-process-tube","product_tag-semiconductor-thermal-processing-tube","product_tag-sic-cvd-tube","product_tag-sic-furnace-tube","product_tag-sic-horizontal-process-tube","product_tag-sic-lpcvd-tube","product_tag-silicon-carbide-horizontal-process-tube","desktop-align-left","tablet-align-left","mobile-align-left","first","instock","shipping-taxable","product-type-simple"],"_links":{"self":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/product\/2331","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/comments?post=2331"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/media\/2334"}],"wp:attachment":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/media?parent=2331"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/product_brand?post=2331"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/product_cat?post=2331"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/product_tag?post=2331"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}