{"id":2036,"date":"2026-05-08T05:18:41","date_gmt":"2026-05-08T05:18:41","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?p=2036"},"modified":"2026-05-08T05:19:21","modified_gmt":"2026-05-08T05:19:21","slug":"advanced-ceramic-components-in-semiconductor-manufacturing-electrostatic-chuck-principles-and-trends","status":"publish","type":"post","link":"https:\/\/www.xkh-ceramics.com\/hu\/advanced-ceramic-components-in-semiconductor-manufacturing-electrostatic-chuck-principles-and-trends\/","title":{"rendered":"Fejlett ker\u00e1mia alkatr\u00e9szek a f\u00e9lvezet\u0151gy\u00e1rt\u00e1sban: Elektrosztatikus tokm\u00e1nyok alapelvei \u00e9s trendjei"},"content":{"rendered":"<h2 class=\"wp-block-heading\">1. Bevezet\u00e9s: A fejlett ker\u00e1mi\u00e1k szerepe a f\u00e9lvezet\u0151 berendez\u00e9sekben<\/h2>\n\n\n\n<p class=\"wp-block-paragraph\">A modern f\u00e9lvezet\u0151gy\u00e1rt\u00e1sban a berendez\u00e9sek sz\u00e9ls\u0151s\u00e9ges k\u00f6r\u00fclm\u00e9nyek k\u00f6z\u00f6tt m\u0171k\u00f6dnek, p\u00e9ld\u00e1ul v\u00e1kuumk\u00f6rnyezetben, magas h\u0151m\u00e9rs\u00e9kleten, plazmaexpoz\u00edci\u00f3nak kit\u00e9ve \u00e9s ultraprec\u00edzi\u00f3s mozg\u00e1svez\u00e9rl\u00e9ssel. A hagyom\u00e1nyos f\u00e9mes anyagok gyakran nem felelnek meg a stabilit\u00e1s, a tisztas\u00e1g, az elektromos szigetel\u00e9s \u00e9s a h\u0151kezel\u00e9s egy\u00fcttes k\u00f6vetelm\u00e9nyeinek.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">A fejlett m\u0171szaki ker\u00e1mi\u00e1k - p\u00e9ld\u00e1ul a timf\u00f6ld (Al\u2082O\u2083), az alum\u00ednium-nitrid (AlN) \u00e9s a szil\u00edcium-karbid (SiC) - ez\u00e9rt a kritikus f\u00e9lvezet\u0151 alkatr\u00e9szek alapvet\u0151 anyag\u00e1v\u00e1 v\u00e1ltak. A prec\u00edzi\u00f3s alak\u00edt\u00e1s \u00e9s az ultraprec\u00edzi\u00f3s megmunk\u00e1l\u00e1s ut\u00e1n ezeket a ker\u00e1mi\u00e1kat sz\u00e9les k\u00f6rben haszn\u00e1lj\u00e1k a kulcsfontoss\u00e1g\u00fa folyamatberendez\u00e9sekben, bele\u00e9rtve a litogr\u00e1fi\u00e1t, a marat\u00e1st, a v\u00e9konyr\u00e9teg-lev\u00e1laszt\u00e1st, az ionimplant\u00e1ci\u00f3t \u00e9s a k\u00e9miai mechanikai planariz\u00e1l\u00e1st (CMP).<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">Ezen alkatr\u00e9szek k\u00f6z\u00fcl az elektrosztatikus tokm\u00e1ny (ESC) az egyik legfontosabb ker\u00e1mia alap\u00fa funkcion\u00e1lis eszk\u00f6z.<\/p>\n\n\n\n<figure class=\"wp-block-image aligncenter size-full\"><img fetchpriority=\"high\" decoding=\"async\" width=\"426\" height=\"238\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Electrostatic-Chuck-Principles-and-Trends-1.png\" alt=\"\" class=\"wp-image-2038\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Electrostatic-Chuck-Principles-and-Trends-1.png 426w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Electrostatic-Chuck-Principles-and-Trends-1-300x168.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Electrostatic-Chuck-Principles-and-Trends-1-18x10.png 18w\" sizes=\"(max-width: 426px) 100vw, 426px\" \/><\/figure>\n\n\n\n<h2 class=\"wp-block-heading\">2. Az elektrosztatikus tokm\u00e1nyok m\u0171k\u00f6d\u00e9se \u00e9s alkalmaz\u00e1sa<\/h2>\n\n\n\n<p class=\"wp-block-paragraph\">Egy <a href=\"https:\/\/www.xkh-ceramics.com\/hu\/termekek\/\" data-type=\"page\" data-id=\"1921\">elektrosztatikus tokm\u00e1ny<\/a> egy v\u00e1kuum- vagy plazmak\u00f6rnyezetbe tervezett ostyakezel\u0151 \u00e9s -tart\u00f3 eszk\u00f6z. Lehet\u0151v\u00e9 teszi a rendk\u00edv\u00fcl v\u00e9kony f\u00e9lvezet\u0151 osty\u00e1k stabil \u00e9s egyenletes r\u00f6gz\u00edt\u00e9s\u00e9t mechanikus \u00e9rintkez\u00e9s n\u00e9lk\u00fcl.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">Sz\u00e9les k\u00f6rben haszn\u00e1lj\u00e1k fejlett f\u00e9lvezet\u0151 elj\u00e1r\u00e1sokban, mint p\u00e9ld\u00e1ul:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Plazma marat\u00e1s (ETCH)<\/li>\n\n\n\n<li>Fizikai g\u0151zf\u00e1zis\u00fa lev\u00e1laszt\u00e1s (PVD)<\/li>\n\n\n\n<li>Plazmaer\u0151s\u00edt\u00e9s\u0171 k\u00e9miai g\u0151zf\u00e1zis\u00fa lev\u00e1laszt\u00e1s (PECVD)<\/li>\n\n\n\n<li>Extr\u00e9m ultraibolya litogr\u00e1fia (EUVL)<\/li>\n\n\n\n<li>Ionbe\u00fcltet\u00e9s<\/li>\n<\/ul>\n\n\n\n<p class=\"wp-block-paragraph\">Ezekben az elj\u00e1r\u00e1sokban a lapk\u00e1k energetikai r\u00e9szecsk\u00e9knek \u00e9s h\u0151terhel\u00e9snek vannak kit\u00e9ve. Ez\u00e9rt az elektrosztatikus tokm\u00e1nynak biztos\u00edtania kell a mechanikai stabilit\u00e1st \u00e9s a pontos h\u0151szab\u00e1lyoz\u00e1st.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">3. M\u0171k\u00f6d\u00e9si elv: elektrosztatikus er\u0151 \u00e9s h\u0151kezel\u00e9s<\/h2>\n\n\n\n<p class=\"wp-block-paragraph\">Az elektrosztatikus tokm\u00e1ny az elektromos mez\u0151 \u00e1ltal keltett elektrosztatikus vonz\u00e1s alapj\u00e1n m\u0171k\u00f6dik. Az ellent\u00e9tesen t\u00f6lt\u00f6tt fel\u00fcletek vonz\u00f3er\u0151t hoznak l\u00e9tre, amely biztons\u00e1gosan a hely\u00e9n tartja az osty\u00e1t.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">Az alapvet\u0151 elektrosztatikus k\u00f6lcs\u00f6nhat\u00e1s a k\u00f6vetkez\u0151k\u00e9ppen \u00edrhat\u00f3 le:<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><math xmlns=\"http:\/\/www.w3.org\/1998\/Math\/MathML\"><semantics><mrow><mi>F<\/mi><mo>=<\/mo><mi>k<\/mi><mfrac><mrow><msub><mi>q<\/mi><mn>1<\/mn><\/msub><msub><mi>q<\/mi><mn>2<\/mn><\/msub><\/mrow><msup><mi>r<\/mi><mn>2<\/mn><\/msup><\/mfrac><\/mrow><annotation encoding=\"application\/x-tex\">F = k \\frac{q_1 q_2}{r^2}<\/annotation><\/semantics><\/math>F=kr2q1q2<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><math xmlns=\"http:\/\/www.w3.org\/1998\/Math\/MathML\"><semantics><mrow><msub><mi>q<\/mi><mn>1<\/mn><\/msub><\/mrow><annotation encoding=\"application\/x-tex\">q_1<\/annotation><\/semantics><\/math>q1<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><math xmlns=\"http:\/\/www.w3.org\/1998\/Math\/MathML\"><semantics><mrow><msub><mi>q<\/mi><mn>2<\/mn><\/msub><\/mrow><annotation encoding=\"application\/x-tex\">q_2<\/annotation><\/semantics><\/math>q2<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><math xmlns=\"http:\/\/www.w3.org\/1998\/Math\/MathML\"><semantics><mrow><mi>r<\/mi><\/mrow><annotation encoding=\"application\/x-tex\">r<\/annotation><\/semantics><\/math>r<\/p>\n\n\n\n<p class=\"wp-block-paragraph\"><math xmlns=\"http:\/\/www.w3.org\/1998\/Math\/MathML\"><semantics><mrow><mi>F<\/mi><mo>=<\/mo><mi>k<\/mi><mfrac><mrow><msub><mi>q<\/mi><mn>1<\/mn><\/msub><msub><mi>q<\/mi><mn>2<\/mn><\/msub><\/mrow><msup><mi>r<\/mi><mn>2<\/mn><\/msup><\/mfrac><mo>\u2248<\/mo><mo>\u2212<\/mo><mn>5.06<\/mn><\/mrow><annotation encoding=\"application\/x-tex\">F = k\\frac{q_1 q_2}{r^2} \\approx -5.06<\/annotation><\/semantics><\/math>F=kr2q1q2\u2248-5.06+-<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">Hol:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li><math xmlns=\"http:\/\/www.w3.org\/1998\/Math\/MathML\"><semantics><mrow><mi>F<\/mi><\/mrow><annotation encoding=\"application\/x-tex\">F<\/annotation><\/semantics><\/math>F: elektrosztatikus er\u0151<\/li>\n\n\n\n<li><math xmlns=\"http:\/\/www.w3.org\/1998\/Math\/MathML\"><semantics><mrow><msub><mi>q<\/mi><mn>1<\/mn><\/msub><mo separator=\"true\">,<\/mo><msub><mi>q<\/mi><mn>2<\/mn><\/msub><\/mrow><annotation encoding=\"application\/x-tex\">q_1, q_2<\/annotation><\/semantics><\/math>q1,q2: elektromos t\u00f6lt\u00e9sek<\/li>\n\n\n\n<li><math xmlns=\"http:\/\/www.w3.org\/1998\/Math\/MathML\"><semantics><mrow><mi>r<\/mi><\/mrow><annotation encoding=\"application\/x-tex\">r<\/annotation><\/semantics><\/math>r: a t\u00f6lt\u00e9sek k\u00f6z\u00f6tti t\u00e1vols\u00e1g<\/li>\n\n\n\n<li><math xmlns=\"http:\/\/www.w3.org\/1998\/Math\/MathML\"><semantics><mrow><mi>k<\/mi><\/mrow><annotation encoding=\"application\/x-tex\">k<\/annotation><\/semantics><\/math>k: Coulomb-\u00e1lland\u00f3<\/li>\n<\/ul>\n\n\n\n<p class=\"wp-block-paragraph\">Szerkezetileg egy elektrosztatikus tokm\u00e1ny \u00e1ltal\u00e1ban h\u00e1rom r\u00e9tegb\u0151l \u00e1ll:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li><strong>Dielektromos r\u00e9teg<\/strong>: meghat\u00e1rozza a szigetel\u00e9st \u00e9s az elektromos mez\u0151 eloszl\u00e1s\u00e1t<\/li>\n\n\n\n<li><strong>Elektr\u00f3da r\u00e9teg<\/strong>: elektrosztatikus mez\u0151t hoz l\u00e9tre<\/li>\n\n\n\n<li><strong>Alapr\u00e9teg<\/strong>: mechanikai al\u00e1t\u00e1maszt\u00e1st \u00e9s h\u0151vezet\u00e9st biztos\u00edt<\/li>\n<\/ul>\n\n\n\n<p class=\"wp-block-paragraph\">A h\u0151terhel\u00e9s kezel\u00e9s\u00e9hez a feldolgoz\u00e1s sor\u00e1n \u00e1ltal\u00e1ban h\u00e9liumos h\u00e1toldali h\u0171t\u00e9st vezetnek be, ami jav\u00edtja a h\u0151\u00e1tad\u00e1st az ostya \u00e9s a tokm\u00e1ny fel\u00fclete k\u00f6z\u00f6tt.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">4. Oszt\u00e1lyoz\u00e1s: ESC: Coulomb-t\u00edpus\u00fa \u00e9s Johnsen-Rahbek-t\u00edpus\u00fa ESC<\/h2>\n\n\n\n<p class=\"wp-block-paragraph\">Az elektrosztatikus tokm\u00e1nyokat \u00e1ltal\u00e1ban k\u00e9t t\u00edpusba sorolj\u00e1k dielektromos viselked\u00e9s\u00fck alapj\u00e1n:<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">(1) Coulomb-t\u00edpus\u00fa ESC<\/h3>\n\n\n\n<p class=\"wp-block-paragraph\">Ez a t\u00edpus kiz\u00e1r\u00f3lag az elektrosztatikus er\u0151re t\u00e1maszkodik az osty\u00e1k r\u00f6gz\u00edt\u00e9s\u00e9n\u00e9l. Egyszer\u0171bb szerkezet\u0171, de viszonylag kisebb szor\u00edt\u00f3er\u0151t biztos\u00edt.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">(2) Johnsen-Rahbek (J-R) t\u00edpus\u00fa ESC<\/h3>\n\n\n\n<p class=\"wp-block-paragraph\">Ez a t\u00edpus enyhe elektromos vezet\u0151k\u00e9pess\u00e9get vezet be a dielektromos r\u00e9tegbe, ami fokozza a polariz\u00e1ci\u00f3s hat\u00e1sokat \u00e9s n\u00f6veli a szor\u00edt\u00f3er\u0151t.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">A legfontosabb el\u0151ny\u00f6k a k\u00f6vetkez\u0151k:<\/p>\n\n\n\n<ul class=\"wp-block-list\">\n<li>Nagyobb szor\u00edt\u00f3er\u0151 alacsonyabb fesz\u00fclts\u00e9g mellett<\/li>\n\n\n\n<li>Jav\u00edtott ostyakapcsolati stabilit\u00e1s<\/li>\n\n\n\n<li>Jobb teljes\u00edtm\u00e9ny a fejlett f\u00e9lvezet\u0151 csom\u00f3pontokban<\/li>\n<\/ul>\n\n\n\n<p class=\"wp-block-paragraph\">Ez azonban nagyobb anyagegyenletess\u00e9get \u00e9s \u00f6sszetettebb gy\u00e1rt\u00e1si folyamatokat ig\u00e9nyel.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">5. Az ipar\u00e1g fejl\u0151d\u00e9se \u00e9s a piac jellemz\u0151i<\/h2>\n\n\n\n<p class=\"wp-block-paragraph\">A f\u00e9lvezet\u0151gy\u00e1rt\u00e1si kapacit\u00e1s gyors b\u0151v\u00fcl\u00e9se \u00e9s a fejlett csom\u00f3pontok ir\u00e1nti n\u00f6vekv\u0151 kereslet miatt az elektrosztatikus tokm\u00e1nyok piaca folyamatosan n\u00f6vekszik.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">A legfontosabb ipar\u00e1gi jellemz\u0151k a k\u00f6vetkez\u0151k:<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">(1) Magas technol\u00f3giai akad\u00e1lyok<\/h3>\n\n\n\n<p class=\"wp-block-paragraph\">A technol\u00f3gia integr\u00e1lja az anyagtudom\u00e1nyt, az elektrotechnik\u00e1t, a h\u0151kezel\u00e9st \u00e9s az ultraprec\u00edzi\u00f3s megmunk\u00e1l\u00e1st.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">(2) Magas piaci koncentr\u00e1ci\u00f3<\/h3>\n\n\n\n<p class=\"wp-block-paragraph\">A glob\u00e1lis piacot korl\u00e1tozott sz\u00e1m\u00fa, fejlett, er\u0151s integr\u00e1ci\u00f3s k\u00e9pess\u00e9gekkel rendelkez\u0151 gy\u00e1rt\u00f3 uralja.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">(3) Region\u00e1lis specializ\u00e1ci\u00f3<\/h3>\n\n\n\n<p class=\"wp-block-paragraph\">A cs\u00facstervez\u00e9s \u00e9s a rendszerintegr\u00e1ci\u00f3 a technol\u00f3giailag fejlett r\u00e9gi\u00f3kban \u00f6sszpontosul, m\u00edg a prec\u00edzi\u00f3s ker\u00e1miagy\u00e1rt\u00e1s egyre ink\u00e1bb \u00c1zsia fel\u00e9 tol\u00f3dik.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">(4) N\u00f6vekv\u0151 lokaliz\u00e1ci\u00f3s trend<\/h3>\n\n\n\n<p class=\"wp-block-paragraph\">A hazai f\u00e9lvezet\u0151-\u00f6kosziszt\u00e9m\u00e1k b\u0151v\u00fcl\u00e9s\u00e9vel az elektrosztatikus tokm\u00e1nyok lok\u00e1lis gy\u00e1rt\u00e1sa kezdett kialakulni, b\u00e1r a hossz\u00fa t\u00e1v\u00fa megb\u00edzhat\u00f3s\u00e1g \u00e9s a cs\u00facskateg\u00f3ri\u00e1s folyamatok kompatibilit\u00e1sa tov\u00e1bbra is kih\u00edv\u00e1st jelent.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">6. Kulcsfontoss\u00e1g\u00fa anyagok \u00e9s j\u00f6v\u0151beli fejl\u0151d\u00e9si tendenci\u00e1k<\/h2>\n\n\n\n<p class=\"wp-block-paragraph\">Az elektrosztatikus tokm\u00e1nyok \u00e9s ker\u00e1mia alkatr\u00e9szek j\u00f6v\u0151beli fejleszt\u00e9se a k\u00f6vetkez\u0151kre \u00f6sszpontos\u00edt:<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">(1) Nagy h\u0151vezet\u0151 k\u00e9pess\u00e9g\u0171 ker\u00e1mia<\/h3>\n\n\n\n<p class=\"wp-block-paragraph\">A h\u0151m\u00e9rs\u00e9klet egyenletess\u00e9g\u00e9nek jav\u00edt\u00e1sa optimaliz\u00e1lt AlN \u00e9s SiC anyagokkal.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">(2) Rendk\u00edv\u00fcl nagy tisztas\u00e1g \u00e9s alacsony hibas\u0171r\u0171s\u00e9g<\/h3>\n\n\n\n<p class=\"wp-block-paragraph\">A szennyez\u0151d\u00e9sek \u00e9s mikrohib\u00e1k cs\u00f6kkent\u00e9se a plazma\u00e1ll\u00f3s\u00e1g \u00e9s a stabilit\u00e1s jav\u00edt\u00e1sa \u00e9rdek\u00e9ben.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">(3) T\u00f6bbr\u00e9teg\u0171 kompozit szerkezetek<\/h3>\n\n\n\n<p class=\"wp-block-paragraph\">Az elektromos szigetel\u00e9s, a mechanikai szil\u00e1rds\u00e1g \u00e9s a h\u0151teljes\u00edtm\u00e9ny kiegyens\u00falyoz\u00e1sa.<\/p>\n\n\n\n<h3 class=\"wp-block-heading\">(4) Meghosszabb\u00edtott \u00e9lettartam<\/h3>\n\n\n\n<p class=\"wp-block-paragraph\">A h\u0151ciklusokkal \u00e9s a plazmakorr\u00f3zi\u00f3val szembeni ellen\u00e1ll\u00e1s fokoz\u00e1sa a cser\u00e9k gyakoris\u00e1g\u00e1nak cs\u00f6kkent\u00e9se \u00e9rdek\u00e9ben.<\/p>\n\n\n\n<h2 class=\"wp-block-heading\">7. K\u00f6vetkeztet\u00e9s<\/h2>\n\n\n\n<p class=\"wp-block-paragraph\">Az elektrosztatikus tokm\u00e1nyok, mint a f\u00e9lvezet\u0151 berendez\u00e9sek alapvet\u0151 ker\u00e1miafunkci\u00f3s alkatr\u00e9szei, a fejlett anyagtudom\u00e1ny, az elektrosztatika \u00e9s a h\u0151technika integr\u00e1lj\u00e1k egym\u00e1st. Teljes\u00edtm\u00e9ny\u00fck k\u00f6zvetlen\u00fcl befoly\u00e1solja az ostyafeldolgoz\u00e1s pontoss\u00e1g\u00e1t \u00e9s a gy\u00e1rt\u00e1si hozamot.<\/p>\n\n\n\n<p class=\"wp-block-paragraph\">Ahogy a f\u00e9lvezet\u0151 elj\u00e1r\u00e1sok tov\u00e1bb fejl\u0151dnek a nagyobb pontoss\u00e1g \u00e9s a kisebb node-ok fel\u00e9, a nagy teljes\u00edtm\u00e9ny\u0171 ker\u00e1mia alkatr\u00e9szek ir\u00e1nti kereslet tov\u00e1bb fog n\u0151ni, ami az anyagok \u00e9s a gy\u00e1rt\u00e1si technol\u00f3gi\u00e1k folyamatos innov\u00e1ci\u00f3j\u00e1t \u00f6szt\u00f6nzi.<\/p>","protected":false},"excerpt":{"rendered":"<p>1. Introduction: Role of Advanced Ceramics in Semiconductor Equipment In modern semiconductor manufacturing, equipment operates under extreme conditions such as vacuum environments, high temperatures, plasma exposure, and ultra-precision motion control. Traditional metallic materials often fail to meet the combined requirements of stability, cleanliness, electrical insulation, and thermal management. Advanced engineering ceramics\u2014such as alumina (Al\u2082O\u2083), aluminum [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":2038,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"","adv-header-id-meta":"","stick-header-meta":"","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"footnotes":""},"categories":[3],"tags":[46,37,102,96,91,68,103,93,92,101,95,89,98,55,90,78,94,100,97,99],"class_list":["post-2036","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-industry-news","tag-advanced-ceramics","tag-alumina-ceramics","tag-aluminum-nitride","tag-coulomb-force","tag-dielectric-materials","tag-electrostatic-chuck","tag-esc","tag-etching-process","tag-helium-cooling","tag-ion-implantation","tag-johnsen-rahbek","tag-plasma-process","tag-precision-machining","tag-semiconductor","tag-semiconductor-equipment","tag-silicon-carbide","tag-thermal-management","tag-thin-film-deposition","tag-vacuum-environment","tag-wafer-handling"],"_links":{"self":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/posts\/2036","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/comments?post=2036"}],"version-history":[{"count":2,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/posts\/2036\/revisions"}],"predecessor-version":[{"id":2040,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/posts\/2036\/revisions\/2040"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/media\/2038"}],"wp:attachment":[{"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/media?parent=2036"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/categories?post=2036"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/hu\/wp-json\/wp\/v2\/tags?post=2036"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}