{"id":2331,"date":"2026-05-29T03:20:28","date_gmt":"2026-05-29T03:20:28","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&#038;p=2331"},"modified":"2026-05-29T03:21:23","modified_gmt":"2026-05-29T03:21:23","slug":"silicon-carbide-horizontal-process-tube-for-lpcvd-cvd-semiconductor-processes","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/fr\/product\/silicon-carbide-horizontal-process-tube-for-lpcvd-cvd-semiconductor-processes\/","title":{"rendered":"Tube de traitement horizontal en carbure de silicium pour les proc\u00e9d\u00e9s semi-conducteurs LPCVD\/CVD"},"content":{"rendered":"<p class=\"isSelectedEnd\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2332 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-2.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Le tube de traitement horizontal du carbure de silicium (SiC) est con\u00e7u pour les applications LPCVD, CVD, de diffusion, d'oxydation et de recuit \u00e0 haute temp\u00e9rature dans la fabrication de semi-conducteurs, de panneaux photovolta\u00efques et de mat\u00e9riaux avanc\u00e9s.<\/p>\n<p class=\"isSelectedEnd\">En tant qu'\u00e9l\u00e9ment central de la chambre de r\u00e9action dans les syst\u00e8mes de traitement thermique horizontaux, le tube de traitement affecte directement l'uniformit\u00e9 de la temp\u00e9rature, le contr\u00f4le de la contamination, la stabilit\u00e9 du processus et la dur\u00e9e de vie globale de l'\u00e9quipement.<\/p>\n<p class=\"isSelectedEnd\">Nos tubes de traitement horizontaux en carbure de silicium sont fabriqu\u00e9s \u00e0 l'aide d'une technologie avanc\u00e9e d'impression 3D monolithique combin\u00e9e \u00e0 un rev\u00eatement de carbure de silicium CVD de tr\u00e8s haute puret\u00e9. La structure monobloc sans soudure \u00e9limine les joints de soudure et les points faibles li\u00e9s \u00e0 l'assemblage, ce qui am\u00e9liore consid\u00e9rablement la fiabilit\u00e9 m\u00e9canique et la r\u00e9sistance aux fuites dans le cadre d'un fonctionnement continu \u00e0 haute temp\u00e9rature.<\/p>\n<p class=\"isSelectedEnd\">Par rapport aux tubes de traitement en quartz classiques, le carbure de silicium offre une conductivit\u00e9 thermique nettement plus \u00e9lev\u00e9e, une meilleure r\u00e9sistance aux chocs thermiques, une r\u00e9sistance sup\u00e9rieure \u00e0 la corrosion et une dur\u00e9e de vie op\u00e9rationnelle plus longue, en particulier dans les environnements de traitement agressifs contenant de l'oxyde et du chlore.<\/p>\n<p class=\"isSelectedEnd\">Ce produit est optimis\u00e9 pour les environnements de traitement propre de qualit\u00e9 semi-conducteur n\u00e9cessitant une faible g\u00e9n\u00e9ration de particules, une faible contamination m\u00e9tallique et des performances thermiques stables jusqu'\u00e0 1250\u00b0C.<\/p>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>Caract\u00e9ristiques principales<\/h1>\n<h2><img decoding=\"async\" class=\"size-medium wp-image-2333 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-1.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Structure SiC monolithique d'une seule pi\u00e8ce<\/h2>\n<p class=\"isSelectedEnd\">Le corps int\u00e9gr\u00e9 en carbure de silicium imprim\u00e9 en 3D \u00e9limine les coutures, les points de brasage et les fuites potentielles que l'on trouve dans les structures assembl\u00e9es traditionnelles.<\/p>\n<p class=\"isSelectedEnd\">Les avantages comprennent<\/p>\n<ul data-spread=\"false\">\n<li>Une plus grande stabilit\u00e9 structurelle<\/li>\n<li>Am\u00e9lioration de l'int\u00e9grit\u00e9 du vide<\/li>\n<li>Meilleure coh\u00e9rence dimensionnelle<\/li>\n<li>R\u00e9duction de la concentration des contraintes thermiques<\/li>\n<\/ul>\n<h2>Rev\u00eatement CVD SiC de tr\u00e8s haute puret\u00e9<\/h2>\n<p class=\"isSelectedEnd\">Le rev\u00eatement dense de carbure de silicium CVD fournit :<\/p>\n<ul data-spread=\"false\">\n<li>Impuret\u00e9s de surface inf\u00e9rieures \u00e0 5 ppm<\/li>\n<li>Excellente inertie chimique<\/li>\n<li>R\u00e9duction de la contamination par les particules<\/li>\n<li>R\u00e9sistance sup\u00e9rieure \u00e0 l'oxydation et aux gaz chlor\u00e9s<\/li>\n<\/ul>\n<p class=\"isSelectedEnd\">Le tube de traitement convient donc aux applications de traitement thermique des semi-conducteurs de pointe.<\/p>\n<h2>Excellente conductivit\u00e9 thermique<\/h2>\n<p class=\"isSelectedEnd\">Le carbure de silicium pr\u00e9sente une conductivit\u00e9 thermique beaucoup plus \u00e9lev\u00e9e que le quartz ou l'alumine, ce qui permet d'atteindre les objectifs fix\u00e9s :<\/p>\n<ul data-spread=\"false\">\n<li>R\u00e9ponse thermique plus rapide<\/li>\n<li>Am\u00e9lioration de l'uniformit\u00e9 de la temp\u00e9rature axiale et radiale<\/li>\n<li>Conditions stables de traitement des plaquettes<\/li>\n<\/ul>\n<h2>R\u00e9sistance exceptionnelle aux chocs thermiques<\/h2>\n<p class=\"isSelectedEnd\">Le tube peut supporter des cycles r\u00e9p\u00e9t\u00e9s de chauffage et de refroidissement rapides sans fissure, d\u00e9formation ou \u00e9clatement du rev\u00eatement.<\/p>\n<h2>Longue dur\u00e9e de vie<\/h2>\n<p class=\"isSelectedEnd\">Par rapport aux tubes de traitement en quartz, les tubes en SiC offrent :<\/p>\n<ul data-spread=\"false\">\n<li>Intervalles de remplacement plus longs<\/li>\n<li>R\u00e9duction de la fr\u00e9quence d'entretien<\/li>\n<li>R\u00e9duction des temps d'arr\u00eat de la chambre<\/li>\n<li>Am\u00e9lioration du co\u00fbt total de possession (TCO)<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>Applications typiques<\/h1>\n<h2><img decoding=\"async\" class=\"size-medium wp-image-2334 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Silicon-Carbide-Horizontal-Process-Tube-for-LPCVDCVD-Semiconductor-Processes.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>Fabrication de semi-conducteurs<\/h2>\n<p class=\"isSelectedEnd\">Convient pour :<\/p>\n<ul data-spread=\"false\">\n<li>Syst\u00e8mes LPCVD<\/li>\n<li>\u00c9quipement de d\u00e9p\u00f4t CVD<\/li>\n<li>Fours d'oxydation<\/li>\n<li>Fours de diffusion<\/li>\n<li>Syst\u00e8mes de recuit<\/li>\n<li>Proc\u00e9d\u00e9s de traitement thermique des plaquettes<\/li>\n<\/ul>\n<h2>Industrie photovolta\u00efque<\/h2>\n<p class=\"isSelectedEnd\">Utilis\u00e9 dans :<\/p>\n<ul data-spread=\"false\">\n<li>Traitement de la diffusion des cellules solaires<\/li>\n<li>Passivation de surface<\/li>\n<li>D\u00e9p\u00f4t de couches minces<\/li>\n<li>Traitement des plaquettes \u00e0 haute temp\u00e9rature<\/li>\n<\/ul>\n<h2>Traitement des mat\u00e9riaux avanc\u00e9s<\/h2>\n<p class=\"isSelectedEnd\">Applicable \u00e0 :<\/p>\n<ul data-spread=\"false\">\n<li>Proc\u00e9d\u00e9s de carbonisation<\/li>\n<li>Traitement par nitridation<\/li>\n<li>Formation de couches minces fonctionnelles<\/li>\n<li>Activation et modification de la surface<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>Compatibilit\u00e9 des processus<\/h1>\n<h2>Atmosph\u00e8res de processus compatibles<\/h2>\n<ul data-spread=\"false\">\n<li>Oxyg\u00e8ne (O\u2082)<\/li>\n<li>Azote (N\u2082)<\/li>\n<li>Gaz inertes de haute puret\u00e9<\/li>\n<li>Gaz chlor\u00e9s contr\u00f4l\u00e9s<\/li>\n<li>Atmosph\u00e8res oxydantes<\/li>\n<\/ul>\n<h2>Fen\u00eatre de processus typique<\/h2>\n<table>\n<tbody>\n<tr>\n<th>Param\u00e8tres<\/th>\n<th>Sp\u00e9cifications<\/th>\n<\/tr>\n<tr>\n<td>Temp\u00e9rature maximale de fonctionnement continu<\/td>\n<td>1250\u00b0C<\/td>\n<\/tr>\n<tr>\n<td>Gamme de pression<\/td>\n<td>Vide LPCVD jusqu'\u00e0 une temp\u00e9rature proche de l'atmosph\u00e8re<\/td>\n<\/tr>\n<tr>\n<td>R\u00e9sistance aux chocs thermiques<\/td>\n<td>Excellent<\/td>\n<\/tr>\n<tr>\n<td>\u00c9tanch\u00e9it\u00e9 aux fuites<\/td>\n<td>\u2264 1\u00d710-\u2079 Pa-m\u00b3\/s<\/td>\n<\/tr>\n<tr>\n<td>Rugosit\u00e9 de surface<\/td>\n<td>Ra \u2264 0,8-1,6 \u00b5m<\/td>\n<\/tr>\n<tr>\n<td>Puret\u00e9 du rev\u00eatement<\/td>\n<td>\uff1c 5 ppm<\/td>\n<\/tr>\n<tr>\n<td>Impuret\u00e9 du substrat<\/td>\n<td>\uff1c 300 ppm<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>Sp\u00e9cifications techniques<\/h1>\n<table>\n<tbody>\n<tr>\n<td>Objet<\/td>\n<td>Sp\u00e9cifications<\/td>\n<\/tr>\n<tr>\n<td>Nom du produit<\/td>\n<td>Tube de traitement horizontal en carbure de silicium<\/td>\n<\/tr>\n<tr>\n<td>Mat\u00e9riau<\/td>\n<td>Carbure de silicium de haute puret\u00e9<\/td>\n<\/tr>\n<tr>\n<td>Rev\u00eatement<\/td>\n<td>Rev\u00eatement CVD SiC<\/td>\n<\/tr>\n<tr>\n<td>Processus de fabrication<\/td>\n<td>Impression 3D monolithique<\/td>\n<\/tr>\n<tr>\n<td>Temp\u00e9rature de fonctionnement maximale<\/td>\n<td>\u2264 1250\u00b0C<\/td>\n<\/tr>\n<tr>\n<td>Conductivit\u00e9 thermique<\/td>\n<td>Haut<\/td>\n<\/tr>\n<tr>\n<td>R\u00e9sistance aux chocs thermiques<\/td>\n<td>Excellent<\/td>\n<\/tr>\n<tr>\n<td>R\u00e9sistance \u00e0 la corrosion<\/td>\n<td>Excellent<\/td>\n<\/tr>\n<tr>\n<td>Rugosit\u00e9 de surface<\/td>\n<td>Ra \u2264 0,8-1,6 \u00b5m<\/td>\n<\/tr>\n<tr>\n<td>Impuret\u00e9s du rev\u00eatement<\/td>\n<td>\uff1c 5 ppm<\/td>\n<\/tr>\n<tr>\n<td>\u00c9tanch\u00e9it\u00e9 aux fuites<\/td>\n<td>\u2264 1\u00d710-\u2079 Pa-m\u00b3\/s<\/td>\n<\/tr>\n<tr>\n<td>Applications typiques<\/td>\n<td>LPCVD \/ CVD \/ Diffusion \/ Oxydation<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>Avantages par rapport aux tubes de traitement traditionnels<\/h1>\n<table>\n<tbody>\n<tr>\n<td>Propri\u00e9t\u00e9<\/td>\n<td>Tube de traitement SiC<\/td>\n<td>Tube en quartz<\/td>\n<td>Tube en alumine<\/td>\n<\/tr>\n<tr>\n<td>Conductivit\u00e9 thermique<\/td>\n<td>Haut<\/td>\n<td>Faible<\/td>\n<td>Faible<\/td>\n<\/tr>\n<tr>\n<td>R\u00e9sistance aux chocs thermiques<\/td>\n<td>Excellent<\/td>\n<td>Faible<\/td>\n<td>Mod\u00e9r\u00e9<\/td>\n<\/tr>\n<tr>\n<td>R\u00e9sistance \u00e0 la corrosion<\/td>\n<td>Excellent<\/td>\n<td>Mod\u00e9r\u00e9<\/td>\n<td>Bon<\/td>\n<\/tr>\n<tr>\n<td>Contr\u00f4le des particules<\/td>\n<td>Excellent<\/td>\n<td>Mod\u00e9r\u00e9<\/td>\n<td>Mod\u00e9r\u00e9<\/td>\n<\/tr>\n<tr>\n<td>Dur\u00e9e de vie<\/td>\n<td>Longues<\/td>\n<td>Court<\/td>\n<td>Moyen<\/td>\n<\/tr>\n<tr>\n<td>Stabilit\u00e9 \u00e0 haute temp\u00e9rature<\/td>\n<td>Excellent<\/td>\n<td>Mod\u00e9r\u00e9<\/td>\n<td>Bon<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>Options de personnalisation<\/h1>\n<p class=\"isSelectedEnd\">Des sp\u00e9cifications personnalis\u00e9es sont disponibles en fonction des exigences des clients en mati\u00e8re d'\u00e9quipement, y compris :<\/p>\n<ul data-spread=\"false\">\n<li>Diam\u00e8tre et longueur du tube<\/li>\n<li>Optimisation de l'\u00e9paisseur des parois<\/li>\n<li>Structures des brides et des interfaces<\/li>\n<li>Orifices de gaz fonctionnels<\/li>\n<li>Configurations du rev\u00eatement int\u00e9rieur\/ext\u00e9rieur<\/li>\n<li>Niveaux de polissage des surfaces<\/li>\n<li>Normes de propret\u00e9<\/li>\n<\/ul>\n<div contenteditable=\"false\">\n<hr \/>\n<\/div>\n<h1>FAQ<\/h1>\n<h2>Q1 : Pourquoi choisir le carbure de silicium au lieu des tubes de traitement en quartz ?<\/h2>\n<p class=\"isSelectedEnd\">Le carbure de silicium offre une conductivit\u00e9 thermique plus \u00e9lev\u00e9e, une contamination plus faible, une meilleure r\u00e9sistance aux chocs thermiques et une dur\u00e9e de vie nettement plus longue que le quartz, en particulier dans les proc\u00e9d\u00e9s de fabrication de semi-conducteurs \u00e0 haute temp\u00e9rature.<\/p>\n<h2>Q2 : Quels sont les proc\u00e9d\u00e9s compatibles avec ce tube ?<\/h2>\n<p class=\"isSelectedEnd\">Le tube est adapt\u00e9 aux applications LPCVD, CVD, de diffusion, d'oxydation, de recuit, de passivation et autres applications de traitement thermique \u00e0 haute temp\u00e9rature.<\/p>\n<h2>Q3 : Le tube peut-il fonctionner dans des atmosph\u00e8res contenant du chlore ?<\/h2>\n<p>Oui, le rev\u00eatement CVD SiC offre une excellente r\u00e9sistance aux environnements contr\u00f4l\u00e9s contenant du chlore.<\/p>","protected":false},"excerpt":{"rendered":"<p class=\"isSelectedEnd\">Le tube de traitement horizontal du carbure de silicium (SiC) est con\u00e7u pour les applications LPCVD, CVD, de diffusion, d'oxydation et de recuit \u00e0 haute temp\u00e9rature dans la fabrication de semi-conducteurs, de panneaux photovolta\u00efques et de mat\u00e9riaux avanc\u00e9s.<\/p>\n<p class=\"isSelectedEnd\">En tant qu'\u00e9l\u00e9ment central de la chambre de r\u00e9action dans les syst\u00e8mes de traitement thermique horizontaux, le tube de traitement affecte directement l'uniformit\u00e9 de la temp\u00e9rature, le contr\u00f4le de la contamination, la stabilit\u00e9 du processus et la dur\u00e9e de vie globale de l'\u00e9quipement.<\/p>","protected":false},"featured_media":2334,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center 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