{"id":2095,"date":"2026-05-12T03:44:27","date_gmt":"2026-05-12T03:44:27","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&#038;p=2095"},"modified":"2026-05-12T03:44:27","modified_gmt":"2026-05-12T03:44:27","slug":"high-purity-silicon-carbide-wafer-tray-for-semiconductor-cvd-processing","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/fr\/product\/high-purity-silicon-carbide-wafer-tray-for-semiconductor-cvd-processing\/","title":{"rendered":"Plateau pour plaquettes en carbure de silicium de haute puret\u00e9 pour le traitement des semi-conducteurs et CVD"},"content":{"rendered":"<p data-start=\"199\" data-end=\"404\"><img fetchpriority=\"high\" decoding=\"async\" class=\"wp-image-2097 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-300x300.png\" alt=\"\" width=\"288\" height=\"288\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2.png 1000w\" sizes=\"(max-width: 288px) 100vw, 288px\" \/>Le plateau \u00e0 plaquettes en carbure de silicium est un support c\u00e9ramique de pr\u00e9cision \u00e0 hautes performances con\u00e7u pour le traitement des plaquettes de semi-conducteurs, les syst\u00e8mes CVD\/PECVD, les fours \u00e0 vide et les environnements industriels \u00e0 haute temp\u00e9rature.<\/p>\n<p data-start=\"406\" data-end=\"666\">Fabriqu\u00e9 \u00e0 partir de carbure de silicium CVD ou SSiC (carbure de silicium fritt\u00e9) de haute puret\u00e9, ce plateau offre une stabilit\u00e9 thermique, une r\u00e9sistance m\u00e9canique et une r\u00e9sistance chimique exceptionnelles, garantissant une manipulation stable des plaquettes et des performances de processus constantes dans des conditions extr\u00eames.<\/p>\n<p data-start=\"668\" data-end=\"818\">Il est largement utilis\u00e9 dans la fabrication des semi-conducteurs, l'\u00e9pitaxie des LED, le traitement des plaquettes de saphir, le frittage des c\u00e9ramiques de pointe et les syst\u00e8mes thermiques sous vide.<\/p>\n<hr data-start=\"820\" data-end=\"823\" \/>\n<h2 data-section-id=\"1ma7m6t\" data-start=\"825\" data-end=\"840\">Caract\u00e9ristiques principales<\/h2>\n<h3 data-section-id=\"1mskj6p\" data-start=\"842\" data-end=\"888\">Stabilit\u00e9 \u00e0 haute temp\u00e9rature (jusqu'\u00e0 1600\u00b0C+)<\/h3>\n<p data-start=\"889\" data-end=\"1000\">Maintient l'int\u00e9grit\u00e9 structurelle et les performances en fonctionnement continu \u00e0 haute temp\u00e9rature sans d\u00e9formation.<\/p>\n<h3 data-section-id=\"obi2s6\" data-start=\"1002\" data-end=\"1036\">Excellente conductivit\u00e9 thermique<\/h3>\n<p data-start=\"1037\" data-end=\"1136\">Assure un transfert de chaleur rapide et uniforme, r\u00e9duisant les gradients de temp\u00e9rature et am\u00e9liorant le rendement du processus.<\/p>\n<h3 data-section-id=\"hstd5z\" data-start=\"1138\" data-end=\"1175\">R\u00e9sistance sup\u00e9rieure aux chocs thermiques<\/h3>\n<p data-start=\"1176\" data-end=\"1248\">R\u00e9siste \u00e0 des cycles de chauffage et de refroidissement rapides sans se fissurer ni se d\u00e9former.<\/p>\n<h3 data-section-id=\"1wy3za\" data-start=\"1250\" data-end=\"1278\">Haute r\u00e9sistance m\u00e9canique<\/h3>\n<p data-start=\"1279\" data-end=\"1377\">La structure renforc\u00e9e offre une excellente capacit\u00e9 de charge et une stabilit\u00e9 dimensionnelle \u00e0 long terme.<\/p>\n<h3 data-section-id=\"1cdcof9\" data-start=\"1379\" data-end=\"1411\">R\u00e9sistance aux produits chimiques et au plasma<\/h3>\n<p data-start=\"1412\" data-end=\"1521\">Tr\u00e8s r\u00e9sistant aux acides, aux alcalis, aux gaz corrosifs et aux environnements plasma utilis\u00e9s dans les processus de fabrication des semi-conducteurs.<\/p>\n<h3 data-section-id=\"1vb1ood\" data-start=\"1523\" data-end=\"1557\">Usinage de tr\u00e8s haute pr\u00e9cision<\/h3>\n<p data-start=\"1558\" data-end=\"1663\">La rectification CNC garantit des tol\u00e9rances serr\u00e9es, la plan\u00e9it\u00e9 et des surfaces de contact lisses pour les syst\u00e8mes automatis\u00e9s.<\/p>\n<hr data-start=\"1665\" data-end=\"1668\" \/>\n<h2 data-section-id=\"1lh3gui\" data-start=\"1670\" data-end=\"1690\">Conception structurelle<\/h2>\n<h3 data-section-id=\"1s8wich\" data-start=\"1692\" data-end=\"1726\">Conception de fentes annulaires multizones<\/h3>\n<ul data-start=\"1727\" data-end=\"1850\">\n<li data-section-id=\"gkdwm3\" data-start=\"1727\" data-end=\"1745\">R\u00e9duit le poids<\/li>\n<li data-section-id=\"18issq2\" data-start=\"1746\" data-end=\"1777\">Am\u00e9liore l'uniformit\u00e9 thermique<\/li>\n<li data-section-id=\"l3j2gw\" data-start=\"1778\" data-end=\"1807\">Am\u00e9liore la dissipation de la chaleur<\/li>\n<li data-section-id=\"1tnc39l\" data-start=\"1808\" data-end=\"1850\">Minimise la concentration des contraintes thermiques<\/li>\n<\/ul>\n<p data-start=\"1852\" data-end=\"1942\">Cette structure est optimis\u00e9e pour le traitement des plaquettes \u00e0 haute temp\u00e9rature et les applications sous vide.<\/p>\n<hr data-start=\"1944\" data-end=\"1947\" \/>\n<h3 data-section-id=\"10p8bw6\" data-start=\"1949\" data-end=\"1984\">Syst\u00e8me de nervures de renforcement radial<\/h3>\n<ul data-start=\"1985\" data-end=\"2144\">\n<li data-section-id=\"93l2pt\" data-start=\"1985\" data-end=\"2018\">Augmente la rigidit\u00e9 m\u00e9canique<\/li>\n<li data-section-id=\"xmgkcx\" data-start=\"2019\" data-end=\"2054\">Pr\u00e9vient les d\u00e9formations sous charge<\/li>\n<li data-section-id=\"16xz56l\" data-start=\"2055\" data-end=\"2088\">Am\u00e9liore la stabilit\u00e9 de la rotation<\/li>\n<li data-section-id=\"1i3nv5f\" data-start=\"2089\" data-end=\"2144\">Prolonge la dur\u00e9e de vie dans les environnements thermiques cycliques<\/li>\n<\/ul>\n<hr data-start=\"2146\" data-end=\"2149\" \/>\n<h3 data-section-id=\"erqgsk\" data-start=\"2151\" data-end=\"2181\">Surface usin\u00e9e avec pr\u00e9cision<\/h3>\n<ul data-start=\"2182\" data-end=\"2334\">\n<li data-section-id=\"tdalbr\" data-start=\"2182\" data-end=\"2215\">Grande plan\u00e9it\u00e9 et coh\u00e9rence<\/li>\n<li data-section-id=\"1jpgedk\" data-start=\"2216\" data-end=\"2250\">Interface de contact lisse avec la tranche de silicium<\/li>\n<li data-section-id=\"muk23v\" data-start=\"2251\" data-end=\"2297\">Compatible avec les syst\u00e8mes d'automatisation robotique<\/li>\n<li data-section-id=\"t302yy\" data-start=\"2298\" data-end=\"2334\">R\u00e9duit le risque de g\u00e9n\u00e9ration de particules<\/li>\n<\/ul>\n<hr data-start=\"2336\" data-end=\"2339\" \/>\n<h3 data-section-id=\"1jxpmtp\" data-start=\"2341\" data-end=\"2371\">Interface de montage central<\/h3>\n<p data-start=\"2372\" data-end=\"2415\">La structure centrale perc\u00e9e avec pr\u00e9cision garantit :<\/p>\n<ul data-start=\"2416\" data-end=\"2541\">\n<li data-section-id=\"1prbs8w\" data-start=\"2416\" data-end=\"2441\">Montage stable de l'arbre<\/li>\n<li data-section-id=\"cemghk\" data-start=\"2442\" data-end=\"2483\">Alignement pr\u00e9cis dans les syst\u00e8mes de chauffage<\/li>\n<li data-section-id=\"pxfn4\" data-start=\"2484\" data-end=\"2541\">Compatibilit\u00e9 avec les \u00e9quipements de manutention automatis\u00e9e des gaufrettes<\/li>\n<\/ul>\n<hr data-start=\"2543\" data-end=\"2546\" \/>\n<h3 data-section-id=\"gqycxw\" data-start=\"2548\" data-end=\"2573\">Anneau ext\u00e9rieur renforc\u00e9<\/h3>\n<ul data-start=\"2574\" data-end=\"2688\">\n<li data-section-id=\"17dniqy\" data-start=\"2574\" data-end=\"2605\">Am\u00e9liore l'\u00e9quilibre structurel<\/li>\n<li data-section-id=\"yaoils\" data-start=\"2606\" data-end=\"2639\">Am\u00e9liore la r\u00e9sistance aux vibrations<\/li>\n<li data-section-id=\"16bzx41\" data-start=\"2640\" data-end=\"2688\">Renforce la durabilit\u00e9 des ar\u00eates pendant le fonctionnement<\/li>\n<\/ul>\n<hr data-start=\"2690\" data-end=\"2693\" \/>\n<h2 data-section-id=\"rb24ym\" data-start=\"2695\" data-end=\"2714\">Options de mat\u00e9riaux<\/h2>\n<h3 data-section-id=\"87v3o9\" data-start=\"2716\" data-end=\"2749\">Carbure de silicium CVD (SiC CVD)<\/h3>\n<ul data-start=\"2750\" data-end=\"2880\">\n<li data-section-id=\"1qjlbs6\" data-start=\"2750\" data-end=\"2771\">Ultra-haute puret\u00e9<\/li>\n<li data-section-id=\"ujmjxb\" data-start=\"2772\" data-end=\"2803\">Contamination extr\u00eamement faible<\/li>\n<li data-section-id=\"1529x9w\" data-start=\"2804\" data-end=\"2833\">Excellente qualit\u00e9 de surface<\/li>\n<li data-section-id=\"3atv6m\" data-start=\"2834\" data-end=\"2880\">Id\u00e9al pour les proc\u00e9d\u00e9s de semi-conducteurs avanc\u00e9s<\/li>\n<\/ul>\n<hr data-start=\"2882\" data-end=\"2885\" \/>\n<h3 data-section-id=\"gwj4n0\" data-start=\"2887\" data-end=\"2922\">Carbure de silicium fritt\u00e9 (SSiC)<\/h3>\n<ul data-start=\"2923\" data-end=\"3068\">\n<li data-section-id=\"16na2wg\" data-start=\"2923\" data-end=\"2952\">R\u00e9sistance et densit\u00e9 \u00e9lev\u00e9es<\/li>\n<li data-section-id=\"v14n1q\" data-start=\"2953\" data-end=\"2982\">Excellente r\u00e9sistance \u00e0 l'usure<\/li>\n<li data-section-id=\"1s1u32c\" data-start=\"2983\" data-end=\"3015\">Stable dans les environnements difficiles<\/li>\n<li data-section-id=\"1586k58\" data-start=\"3016\" data-end=\"3068\">Convient aux syst\u00e8mes industriels \u00e0 haute temp\u00e9rature<\/li>\n<\/ul>\n<hr data-start=\"3070\" data-end=\"3073\" \/>\n<h3 data-section-id=\"129y1qt\" data-start=\"3075\" data-end=\"3106\">SiC li\u00e9 par r\u00e9action (RBSiC)<\/h3>\n<ul data-start=\"3107\" data-end=\"3214\">\n<li data-section-id=\"rz6j8a\" data-start=\"3107\" data-end=\"3134\">Une solution rentable<\/li>\n<li data-section-id=\"dvvzgf\" data-start=\"3135\" data-end=\"3168\">Bonne r\u00e9sistance aux chocs thermiques<\/li>\n<li data-section-id=\"ag3lnk\" data-start=\"3169\" data-end=\"3214\">Convient aux applications industrielles de masse<\/li>\n<\/ul>\n<hr data-start=\"3216\" data-end=\"3219\" \/>\n<h2 data-section-id=\"1cgu054\" data-start=\"3221\" data-end=\"3248\">Sp\u00e9cifications techniques<\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"3250\" data-end=\"3636\">\n<thead data-start=\"3250\" data-end=\"3274\">\n<tr data-start=\"3250\" data-end=\"3274\">\n<th class=\"last:pe-10\" data-start=\"3250\" data-end=\"3257\" data-col-size=\"sm\">Objet<\/th>\n<th class=\"last:pe-10\" data-start=\"3257\" data-end=\"3274\" data-col-size=\"sm\">Sp\u00e9cifications<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"3299\" data-end=\"3636\">\n<tr data-start=\"3299\" data-end=\"3336\">\n<td data-start=\"3299\" data-end=\"3310\" data-col-size=\"sm\">Mat\u00e9riau<\/td>\n<td data-start=\"3310\" data-end=\"3336\" data-col-size=\"sm\">CVD SiC \/ SSiC \/ RBSiC<\/td>\n<\/tr>\n<tr data-start=\"3337\" data-end=\"3361\">\n<td data-start=\"3337\" data-end=\"3346\" data-col-size=\"sm\">La puret\u00e9<\/td>\n<td data-start=\"3346\" data-end=\"3361\" data-col-size=\"sm\">Jusqu'\u00e0 99,9%<\/td>\n<\/tr>\n<tr data-start=\"3362\" data-end=\"3398\">\n<td data-start=\"3362\" data-end=\"3386\" data-col-size=\"sm\">Temp\u00e9rature de fonctionnement<\/td>\n<td data-start=\"3386\" data-end=\"3398\" data-col-size=\"sm\">\u2264 1600\u00b0C<\/td>\n<\/tr>\n<tr data-start=\"3399\" data-end=\"3428\">\n<td data-start=\"3399\" data-end=\"3409\" data-col-size=\"sm\">Densit\u00e9<\/td>\n<td data-start=\"3409\" data-end=\"3428\" data-col-size=\"sm\">2,3 - 3,9 g\/cm\u00b3<\/td>\n<\/tr>\n<tr data-start=\"3429\" data-end=\"3469\">\n<td data-start=\"3429\" data-end=\"3456\" data-col-size=\"sm\">R\u00e9sistance aux chocs thermiques<\/td>\n<td data-start=\"3456\" data-end=\"3469\" data-col-size=\"sm\">Excellent<\/td>\n<\/tr>\n<tr data-start=\"3470\" data-end=\"3518\">\n<td data-start=\"3470\" data-end=\"3487\" data-col-size=\"sm\">Finition de la surface<\/td>\n<td data-start=\"3487\" data-end=\"3518\" data-col-size=\"sm\">Polissage de pr\u00e9cision<\/td>\n<\/tr>\n<tr data-start=\"3519\" data-end=\"3560\">\n<td data-start=\"3519\" data-end=\"3527\" data-col-size=\"sm\">Forme<\/td>\n<td data-start=\"3527\" data-end=\"3560\" data-col-size=\"sm\">Personnalis\u00e9 (rond \/ anneau \/ plaque)<\/td>\n<\/tr>\n<tr data-start=\"3561\" data-end=\"3588\">\n<td data-start=\"3561\" data-end=\"3568\" data-col-size=\"sm\">Taille<\/td>\n<td data-start=\"3568\" data-end=\"3588\" data-col-size=\"sm\">Disponible sur mesure<\/td>\n<\/tr>\n<tr data-start=\"3589\" data-end=\"3636\">\n<td data-start=\"3589\" data-end=\"3603\" data-col-size=\"sm\">Application<\/td>\n<td data-start=\"3603\" data-end=\"3636\" data-col-size=\"sm\">Semi-conducteurs \/ CVD \/ Four<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"3638\" data-end=\"3641\" \/>\n<h2 data-section-id=\"mu966k\" data-start=\"3643\" data-end=\"3658\">Applications<\/h2>\n<h3 data-section-id=\"1eipr13\" data-start=\"3660\" data-end=\"3686\">Industrie des semi-conducteurs<\/h3>\n<ul data-start=\"3687\" data-end=\"3849\">\n<li data-section-id=\"13x15us\" data-start=\"3687\" data-end=\"3728\">Support de plaquettes pour les syst\u00e8mes CVD \/ PECVD<\/li>\n<li data-section-id=\"1ox36e0\" data-start=\"3729\" data-end=\"3774\">Diffusion, oxydation, processus de recuit<\/li>\n<li data-section-id=\"1t8nanb\" data-start=\"3775\" data-end=\"3811\">RTP et syst\u00e8mes de croissance \u00e9pitaxiale<\/li>\n<li data-section-id=\"1jzl031\" data-start=\"3812\" data-end=\"3849\">Plateaux de transfert et de manutention de plaquettes<\/li>\n<\/ul>\n<hr data-start=\"3851\" data-end=\"3854\" \/>\n<h3 data-section-id=\"l1oj08\" data-start=\"3856\" data-end=\"3881\">LED et opto\u00e9lectronique<\/h3>\n<ul data-start=\"3882\" data-end=\"3982\">\n<li data-section-id=\"dgfruo\" data-start=\"3882\" data-end=\"3911\">Traitement des plaquettes de saphir<\/li>\n<li data-section-id=\"fwvbk7\" data-start=\"3912\" data-end=\"3943\">Syst\u00e8mes de support pour l'\u00e9pitaxie des LED<\/li>\n<li data-section-id=\"1gl4kjt\" data-start=\"3944\" data-end=\"3982\">Support de substrat \u00e0 haute temp\u00e9rature<\/li>\n<\/ul>\n<hr data-start=\"3984\" data-end=\"3987\" \/>\n<h3 data-section-id=\"480g89\" data-start=\"3989\" data-end=\"4018\">Fours sous vide et fours thermiques<\/h3>\n<ul data-start=\"4019\" data-end=\"4115\">\n<li data-section-id=\"kqy2l\" data-start=\"4019\" data-end=\"4055\">Plateaux de frittage \u00e0 haute temp\u00e9rature<\/li>\n<li data-section-id=\"jgks7q\" data-start=\"4056\" data-end=\"4083\">Supports de four \u00e0 vide<\/li>\n<li data-section-id=\"1c2tpui\" data-start=\"4084\" data-end=\"4115\">Installations de traitement thermique<\/li>\n<\/ul>\n<hr data-start=\"4117\" data-end=\"4120\" \/>\n<h3 data-section-id=\"1owf0zc\" data-start=\"4122\" data-end=\"4148\">Fabrication avanc\u00e9e<\/h3>\n<ul data-start=\"4149\" data-end=\"4255\">\n<li data-section-id=\"odfyg7\" data-start=\"4149\" data-end=\"4181\">Traitement de pr\u00e9cision de la c\u00e9ramique<\/li>\n<li data-section-id=\"1kui91r\" data-start=\"4182\" data-end=\"4215\">Appareils d'automatisation<\/li>\n<li data-section-id=\"135k87d\" data-start=\"4216\" data-end=\"4255\">Plates-formes m\u00e9caniques \u00e0 haute stabilit\u00e9<\/li>\n<\/ul>\n<hr data-start=\"4257\" data-end=\"4260\" \/>\n<h2 data-section-id=\"dysc5y\" data-start=\"4262\" data-end=\"4283\"><img decoding=\"async\" class=\"wp-image-2098 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-300x300.png\" alt=\"\" width=\"276\" height=\"276\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1.png 1000w\" sizes=\"(max-width: 276px) 100vw, 276px\" \/>Avantages du produit<\/h2>\n<ul data-start=\"4285\" data-end=\"4537\">\n<li data-section-id=\"an6nuo\" data-start=\"4285\" data-end=\"4326\">Excellente r\u00e9sistance aux hautes temp\u00e9ratures<\/li>\n<li data-section-id=\"1rm14qx\" data-start=\"4327\" data-end=\"4360\">Conductivit\u00e9 thermique sup\u00e9rieure<\/li>\n<li data-section-id=\"wx5di6\" data-start=\"4361\" data-end=\"4391\">Grande stabilit\u00e9 dimensionnelle<\/li>\n<li data-section-id=\"ymf61l\" data-start=\"4392\" data-end=\"4413\">Longue dur\u00e9e de vie<\/li>\n<li data-section-id=\"1v5rrzz\" data-start=\"4414\" data-end=\"4440\">Faible risque de contamination<\/li>\n<li data-section-id=\"ddezgg\" data-start=\"4441\" data-end=\"4472\">Forte r\u00e9sistance \u00e0 la corrosion<\/li>\n<li data-section-id=\"xmyntv\" data-start=\"4473\" data-end=\"4507\">Compatible avec les syst\u00e8mes d'aspiration<\/li>\n<li data-section-id=\"1ijrpkq\" data-start=\"4508\" data-end=\"4537\">Conception enti\u00e8rement personnalisable<\/li>\n<\/ul>\n<hr data-start=\"4539\" data-end=\"4542\" \/>\n<h2 data-section-id=\"1lwg0so\" data-start=\"4544\" data-end=\"4571\"><img decoding=\"async\" class=\"wp-image-2096 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-300x300.png\" alt=\"\" width=\"280\" height=\"280\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3.png 1000w\" sizes=\"(max-width: 280px) 100vw, 280px\" \/>Capacit\u00e9 de personnalisation<\/h2>\n<p data-start=\"4573\" data-end=\"4649\">Nous proposons une personnalisation compl\u00e8te sur la base des dessins ou des exigences de l'application :<\/p>\n<ul data-start=\"4651\" data-end=\"4883\">\n<li data-section-id=\"1i7bvpn\" data-start=\"4651\" data-end=\"4689\">Personnalisation du diam\u00e8tre \/ de l'\u00e9paisseur<\/li>\n<li data-section-id=\"dmyogn\" data-start=\"4690\" data-end=\"4720\">Optimisation de la g\u00e9om\u00e9trie des fentes<\/li>\n<li data-section-id=\"19luai6\" data-start=\"4721\" data-end=\"4749\">Trous de montage de pr\u00e9cision<\/li>\n<li data-section-id=\"r5ngym\" data-start=\"4750\" data-end=\"4781\">Polissage de surface \/ rodage<\/li>\n<li data-section-id=\"c4ihff\" data-start=\"4782\" data-end=\"4818\">Usinage ultra-plat de qualit\u00e9 wafer<\/li>\n<li data-section-id=\"1lf2kpf\" data-start=\"4819\" data-end=\"4853\">S\u00e9lection de mat\u00e9riaux de haute puret\u00e9<\/li>\n<li data-section-id=\"881e6f\" data-start=\"4854\" data-end=\"4883\">Conception structurelle complexe<\/li>\n<\/ul>\n<p data-start=\"4885\" data-end=\"4956\">Services OEM et ODM disponibles pour les fabricants d'\u00e9quipements de semi-conducteurs.<\/p>\n<hr data-start=\"4958\" data-end=\"4961\" \/>\n<h2 data-section-id=\"1hryhf7\" data-start=\"4963\" data-end=\"4969\">FAQ<\/h2>\n<h3 data-section-id=\"1rw8tyo\" data-start=\"4971\" data-end=\"5025\">Q1 : \u00c0 quoi sert un plateau de plaquettes en carbure de silicium ?<\/h3>\n<p data-start=\"5026\" data-end=\"5173\">Il est utilis\u00e9 pour soutenir et transporter les plaquettes pendant les processus de semi-conducteurs tels que CVD, PECVD, diffusion, oxydation et recuit \u00e0 haute temp\u00e9rature.<\/p>\n<hr data-start=\"5175\" data-end=\"5178\" \/>\n<h3 data-section-id=\"8sm145\" data-start=\"5180\" data-end=\"5230\">Q2 : Pourquoi utiliser le SiC plut\u00f4t que le quartz ou le graphite ?<\/h3>\n<p data-start=\"5231\" data-end=\"5244\">Le SiC fournit :<\/p>\n<ul data-start=\"5245\" data-end=\"5391\">\n<li data-section-id=\"66suke\" data-start=\"5245\" data-end=\"5278\">R\u00e9sistance accrue \u00e0 la temp\u00e9rature<\/li>\n<li data-section-id=\"1k27992\" data-start=\"5279\" data-end=\"5309\">Meilleure r\u00e9sistance m\u00e9canique<\/li>\n<li data-section-id=\"1y67fsp\" data-start=\"5310\" data-end=\"5337\">Dilatation thermique plus faible<\/li>\n<li data-section-id=\"1kygjim\" data-start=\"5338\" data-end=\"5361\">Dur\u00e9e de vie plus longue<\/li>\n<li data-section-id=\"d0e53t\" data-start=\"5362\" data-end=\"5391\">Meilleure stabilit\u00e9 chimique<\/li>\n<\/ul>\n<hr data-start=\"5393\" data-end=\"5396\" \/>\n<h3 data-section-id=\"c1126k\" data-start=\"5398\" data-end=\"5433\">Q3 : Le plateau peut-il \u00eatre personnalis\u00e9 ?<\/h3>\n<p data-start=\"5434\" data-end=\"5527\">Oui. Nous offrons une personnalisation compl\u00e8te, y compris la taille, la structure, l'\u00e9paisseur et la conception du montage.<\/p>\n<hr data-start=\"5529\" data-end=\"5532\" \/>\n<h3 data-section-id=\"4sy20p\" data-start=\"5534\" data-end=\"5587\">Q4 : Est-il adapt\u00e9 au chauffage et au refroidissement rapides ?<\/h3>\n<p data-start=\"5588\" data-end=\"5686\">Oui. Le SiC pr\u00e9sente une excellente r\u00e9sistance aux chocs thermiques, ce qui le rend adapt\u00e9 aux processus de cyclage thermique.<\/p>","protected":false},"excerpt":{"rendered":"<p data-start=\"199\" data-end=\"404\">Le plateau \u00e0 plaquettes en carbure de silicium est un support c\u00e9ramique de pr\u00e9cision \u00e0 hautes performances con\u00e7u pour le traitement des plaquettes de semi-conducteurs, les syst\u00e8mes CVD\/PECVD, les fours \u00e0 vide et les environnements industriels \u00e0 haute temp\u00e9rature.<\/p>\n<p data-start=\"406\" data-end=\"666\">Fabriqu\u00e9 \u00e0 partir de carbure de silicium CVD ou SSiC (carbure de silicium fritt\u00e9) de haute puret\u00e9, ce plateau offre une stabilit\u00e9 thermique, une r\u00e9sistance m\u00e9canique et une r\u00e9sistance chimique exceptionnelles, garantissant une manipulation stable des plaquettes et des performances de processus constantes dans des conditions extr\u00eames.<\/p>","protected":false},"featured_media":2097,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center 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