{"id":2110,"date":"2026-05-12T06:26:35","date_gmt":"2026-05-12T06:26:35","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&#038;p=2110"},"modified":"2026-05-12T06:28:57","modified_gmt":"2026-05-12T06:28:57","slug":"full-cvd-sic-wafer-carrier-tray-plate-for-semiconductor-mocvd-etching-equipment","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/es\/product\/full-cvd-sic-wafer-carrier-tray-plate-for-semiconductor-mocvd-etching-equipment\/","title":{"rendered":"Placa de Soporte para Obleas de SiC con CVD Completo para Equipos de MOCVD y Grabado de Semiconductores"},"content":{"rendered":"<p data-start=\"199\" data-end=\"387\"><img fetchpriority=\"high\" decoding=\"async\" class=\"size-medium wp-image-2111 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-3.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/>La placa de bandeja cer\u00e1mica de SiC es un soporte de obleas de alto rendimiento dise\u00f1ado para procesos avanzados de semiconductores como MOCVD, epitaxia y grabado ICP. Est\u00e1 disponible en dos estructuras:<\/p>\n<ul data-start=\"389\" data-end=\"486\">\n<li data-section-id=\"1a2m83y\" data-start=\"389\" data-end=\"434\">Sustrato de grafito con revestimiento de CVD SiC<\/li>\n<li data-section-id=\"h6gq41\" data-start=\"435\" data-end=\"486\">Bandeja monol\u00edtica de CVD SiC de gran pureza (\u226599,99%)<\/li>\n<\/ul>\n<p data-start=\"488\" data-end=\"728\">En comparaci\u00f3n con los soportes de grafito convencionales, este producto ofrece una estabilidad t\u00e9rmica, una resistencia a la corrosi\u00f3n y una vida \u00fatil significativamente mejores, por lo que resulta ideal para los exigentes entornos de fabricaci\u00f3n de semiconductores a alta temperatura.<\/p>\n<p data-start=\"730\" data-end=\"847\">Se utiliza ampliamente en la producci\u00f3n de LED de GaN, la fabricaci\u00f3n de semiconductores de potencia y los sistemas de procesamiento de obleas de precisi\u00f3n.<\/p>\n<hr data-start=\"849\" data-end=\"852\" \/>\n<h1 data-section-id=\"1j1pcx4\" data-start=\"854\" data-end=\"885\"><span role=\"text\">Principales caracter\u00edsticas y ventajas<\/span><\/h1>\n<h3 data-section-id=\"1alapmz\" data-start=\"887\" data-end=\"931\"><span role=\"text\">1. Resistencia a temperaturas ultraelevadas<\/span><\/h3>\n<ul data-start=\"932\" data-end=\"1084\">\n<li data-section-id=\"n8q3t9\" data-start=\"932\" data-end=\"970\">Funcionamiento estable a 1100-1200\u00b0C+.<\/li>\n<li data-section-id=\"zbjl5k\" data-start=\"971\" data-end=\"1033\">Adecuado para entornos adversos de MOCVD y crecimiento epitaxial<\/li>\n<li data-section-id=\"1p7r2f0\" data-start=\"1034\" data-end=\"1084\">Sin deformaci\u00f3n en ciclos t\u00e9rmicos prolongados<\/li>\n<\/ul>\n<h3 data-section-id=\"1xbme7x\" data-start=\"1086\" data-end=\"1132\"><span role=\"text\">2. Protecci\u00f3n superior del revestimiento CVD SiC<\/span><\/h3>\n<ul data-start=\"1133\" data-end=\"1295\">\n<li data-section-id=\"1yg8xxq\" data-start=\"1133\" data-end=\"1163\">Pureza hasta 99,999% SiC<\/li>\n<li data-section-id=\"fof224\" data-start=\"1164\" data-end=\"1228\">El revestimiento denso impide la penetraci\u00f3n de gases y la erosi\u00f3n del sustrato<\/li>\n<li data-section-id=\"i9f016\" data-start=\"1229\" data-end=\"1295\">Elimina la contaminaci\u00f3n por part\u00edculas de grafito en el procesamiento de obleas<\/li>\n<\/ul>\n<h3 data-section-id=\"r23teu\" data-start=\"1297\" data-end=\"1349\"><span role=\"text\">3. Excelente resistencia a la corrosi\u00f3n y a los productos qu\u00edmicos<\/span><\/h3>\n<ul data-start=\"1350\" data-end=\"1472\">\n<li data-section-id=\"jgfj1d\" data-start=\"1350\" data-end=\"1412\">Resistente a HF, H\u2082SO\u2084, HCl y gases de proceso reactivos.<\/li>\n<li data-section-id=\"1yalk8d\" data-start=\"1413\" data-end=\"1472\">Ideal para entornos agresivos de grabado de semiconductores<\/li>\n<\/ul>\n<h3 data-section-id=\"ughzy4\" data-start=\"1474\" data-end=\"1528\"><span role=\"text\">4. Alta conductividad t\u00e9rmica y calentamiento uniforme<\/span><\/h3>\n<ul data-start=\"1529\" data-end=\"1642\">\n<li data-section-id=\"10oy89q\" data-start=\"1529\" data-end=\"1594\">Garantiza una distribuci\u00f3n uniforme de la temperatura en toda la superficie de la oblea<\/li>\n<li data-section-id=\"1rsv4ef\" data-start=\"1595\" data-end=\"1642\">Mejora la calidad de la pel\u00edcula y la estabilidad del proceso<\/li>\n<\/ul>\n<h3 data-section-id=\"rhgagc\" data-start=\"1644\" data-end=\"1672\"><span role=\"text\">5. Larga vida \u00fatil<\/span><\/h3>\n<ul data-start=\"1673\" data-end=\"1796\">\n<li data-section-id=\"1wgev4f\" data-start=\"1673\" data-end=\"1743\">Vida \u00fatil hasta 4 veces superior a la de las bandejas tradicionales de grafito<\/li>\n<li data-section-id=\"tsrdbt\" data-start=\"1744\" data-end=\"1796\">Menor tiempo de inactividad y menor frecuencia de sustituci\u00f3n<\/li>\n<\/ul>\n<p><img decoding=\"async\" class=\"alignnone size-medium wp-image-2114\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/> <img decoding=\"async\" class=\"alignnone size-medium wp-image-2113\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-1.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/> <img loading=\"lazy\" decoding=\"async\" class=\"alignnone size-medium wp-image-2112\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-300x300.png\" alt=\"\" width=\"300\" height=\"300\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/Full-CVD-SiC-Wafer-Carrier-Tray-Plate-for-Semiconductor-MOCVD-Etching-Equipment-2.png 1000w\" sizes=\"(max-width: 300px) 100vw, 300px\" \/><\/p>\n<hr data-start=\"1798\" data-end=\"1801\" \/>\n<h1 data-section-id=\"10k15yz\" data-start=\"1803\" data-end=\"1833\"><span role=\"text\">Especificaciones t\u00e9cnicas<\/span><\/h1>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"1835\" data-end=\"2207\">\n<thead data-start=\"1835\" data-end=\"1856\">\n<tr data-start=\"1835\" data-end=\"1856\">\n<th class=\"last:pe-10\" data-start=\"1835\" data-end=\"1847\" data-col-size=\"sm\">Par\u00e1metro<\/th>\n<th class=\"last:pe-10\" data-start=\"1847\" data-end=\"1856\" data-col-size=\"md\">Valor<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"1877\" data-end=\"2207\">\n<tr data-start=\"1877\" data-end=\"1938\">\n<td data-start=\"1877\" data-end=\"1893\" data-col-size=\"sm\">Tipo de material<\/td>\n<td data-start=\"1893\" data-end=\"1938\" data-col-size=\"md\">Grafito + recubrimiento CVD SiC \/ CVD SiC completo<\/td>\n<\/tr>\n<tr data-start=\"1939\" data-end=\"1993\">\n<td data-start=\"1939\" data-end=\"1952\" data-col-size=\"sm\">Pureza del SiC<\/td>\n<td data-start=\"1952\" data-end=\"1993\" data-col-size=\"md\">\u226599.9% (recubierto), \u226599.99% (monol\u00edtico)<\/td>\n<\/tr>\n<tr data-start=\"1994\" data-end=\"2032\">\n<td data-start=\"1994\" data-end=\"2011\" data-col-size=\"sm\">Di\u00e1metro<\/td>\n<td data-start=\"2011\" data-end=\"2032\" data-col-size=\"md\">\u03a6380 mm - \u03a6600 mm<\/td>\n<\/tr>\n<tr data-start=\"2033\" data-end=\"2072\">\n<td data-start=\"2033\" data-end=\"2057\" data-col-size=\"sm\">Temperatura de funcionamiento<\/td>\n<td data-col-size=\"md\" data-start=\"2057\" data-end=\"2072\">1100-1200\u00b0C<\/td>\n<\/tr>\n<tr data-start=\"2073\" data-end=\"2104\">\n<td data-start=\"2073\" data-end=\"2096\" data-col-size=\"sm\">Conductividad t\u00e9rmica<\/td>\n<td data-col-size=\"md\" data-start=\"2096\" data-end=\"2104\">Alta<\/td>\n<\/tr>\n<tr data-start=\"2105\" data-end=\"2163\">\n<td data-start=\"2105\" data-end=\"2128\" data-col-size=\"sm\">Resistencia a la corrosi\u00f3n<\/td>\n<td data-col-size=\"md\" data-start=\"2128\" data-end=\"2163\">Excelente (resistente a HF, H\u2082SO\u2084)<\/td>\n<\/tr>\n<tr data-start=\"2164\" data-end=\"2207\">\n<td data-start=\"2164\" data-end=\"2179\" data-col-size=\"sm\">Vida \u00fatil<\/td>\n<td data-start=\"2179\" data-end=\"2207\" data-col-size=\"md\">~4\u00d7 bandejas de grafito<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"2209\" data-end=\"2212\" \/>\n<h1 data-section-id=\"18cvqw\" data-start=\"2214\" data-end=\"2237\"><span role=\"text\">\u00c1mbitos de aplicaci\u00f3n<\/span><\/h1>\n<h3 data-section-id=\"bm5nu5\" data-start=\"2239\" data-end=\"2274\"><span role=\"text\">Fabricaci\u00f3n de semiconductores<\/span><\/h3>\n<ul data-start=\"2275\" data-end=\"2438\">\n<li data-section-id=\"pooj76\" data-start=\"2275\" data-end=\"2326\">MOCVD (dep\u00f3sito qu\u00edmico org\u00e1nico de vapor met\u00e1lico)<\/li>\n<li data-section-id=\"c8v0nb\" data-start=\"2327\" data-end=\"2370\">Crecimiento epitaxial de obleas (GaN, SiC, etc.)<\/li>\n<li data-section-id=\"15uw81h\" data-start=\"2371\" data-end=\"2396\">Procesos de grabado ICP<\/li>\n<li data-section-id=\"1xtyszn\" data-start=\"2397\" data-end=\"2438\">Sistemas de manipulaci\u00f3n de obleas de alta precisi\u00f3n<\/li>\n<\/ul>\n<h3 data-section-id=\"yf7wep\" data-start=\"2440\" data-end=\"2460\"><span role=\"text\">Industria LED<\/span><\/h3>\n<ul data-start=\"2461\" data-end=\"2545\">\n<li data-section-id=\"b1ebdf\" data-start=\"2461\" data-end=\"2508\">Producci\u00f3n de LED azules y blancos de alta luminosidad<\/li>\n<li data-section-id=\"9w14a9\" data-start=\"2509\" data-end=\"2545\">Dispositivos optoelectr\u00f3nicos basados en GaN<\/li>\n<\/ul>\n<h3 data-section-id=\"d5g3k9\" data-start=\"2547\" data-end=\"2575\"><span role=\"text\">Electr\u00f3nica avanzada<\/span><\/h3>\n<ul data-start=\"2576\" data-end=\"2670\">\n<li data-section-id=\"14t88vj\" data-start=\"2576\" data-end=\"2600\">Semiconductores de potencia<\/li>\n<li data-section-id=\"8rvytg\" data-start=\"2601\" data-end=\"2627\">Dispositivos de alta frecuencia<\/li>\n<li data-section-id=\"4tdco8\" data-start=\"2628\" data-end=\"2670\">Sistemas precisos de deposici\u00f3n de pel\u00edculas finas<\/li>\n<\/ul>\n<hr data-start=\"2672\" data-end=\"2675\" \/>\n<h1 data-section-id=\"1umg5ep\" data-start=\"2677\" data-end=\"2735\"><span role=\"text\">Ventajas de rendimiento frente a las bandejas de grafito tradicionales<\/span><\/h1>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"2737\" data-end=\"3069\">\n<thead data-start=\"2737\" data-end=\"2783\">\n<tr data-start=\"2737\" data-end=\"2783\">\n<th class=\"last:pe-10\" data-start=\"2737\" data-end=\"2744\" data-col-size=\"sm\">Art\u00edculo<\/th>\n<th class=\"last:pe-10\" data-start=\"2744\" data-end=\"2760\" data-col-size=\"sm\">Bandeja de grafito<\/th>\n<th class=\"last:pe-10\" data-start=\"2760\" data-end=\"2783\" data-col-size=\"sm\">Bandeja recubierta de CVD SiC<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"2831\" data-end=\"3069\">\n<tr data-start=\"2831\" data-end=\"2878\">\n<td data-start=\"2831\" data-end=\"2856\" data-col-size=\"sm\">Resistencia a la temperatura<\/td>\n<td data-col-size=\"sm\" data-start=\"2856\" data-end=\"2865\">Medio<\/td>\n<td data-col-size=\"sm\" data-start=\"2865\" data-end=\"2878\">Muy alta<\/td>\n<\/tr>\n<tr data-start=\"2879\" data-end=\"2922\">\n<td data-start=\"2879\" data-end=\"2902\" data-col-size=\"sm\">Resistencia a la corrosi\u00f3n<\/td>\n<td data-col-size=\"sm\" data-start=\"2902\" data-end=\"2909\">Pobre<\/td>\n<td data-col-size=\"sm\" data-start=\"2909\" data-end=\"2922\">Excelente<\/td>\n<\/tr>\n<tr data-start=\"2923\" data-end=\"2971\">\n<td data-start=\"2923\" data-end=\"2948\" data-col-size=\"sm\">Contaminaci\u00f3n por part\u00edculas<\/td>\n<td data-col-size=\"sm\" data-start=\"2948\" data-end=\"2960\">Alto riesgo<\/td>\n<td data-col-size=\"sm\" data-start=\"2960\" data-end=\"2971\">M\u00ednimo<\/td>\n<\/tr>\n<tr data-start=\"2972\" data-end=\"3010\">\n<td data-start=\"2972\" data-end=\"2987\" data-col-size=\"sm\">Vida \u00fatil<\/td>\n<td data-col-size=\"sm\" data-start=\"2987\" data-end=\"2995\">Corto<\/td>\n<td data-col-size=\"sm\" data-start=\"2995\" data-end=\"3010\">3-4\u00d7 m\u00e1s tiempo<\/td>\n<\/tr>\n<tr data-start=\"3011\" data-end=\"3069\">\n<td data-start=\"3011\" data-end=\"3031\" data-col-size=\"sm\">Estabilidad de la superficie<\/td>\n<td data-col-size=\"sm\" data-start=\"3031\" data-end=\"3052\">Se degrada con el tiempo<\/td>\n<td data-col-size=\"sm\" data-start=\"3052\" data-end=\"3069\">Muy estable<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"3071\" data-end=\"3074\" \/>\n<h1 data-section-id=\"7pt5v4\" data-start=\"3076\" data-end=\"3102\"><span role=\"text\">Embalaje y manipulaci\u00f3n<\/span><\/h1>\n<ul data-start=\"3103\" data-end=\"3313\">\n<li data-section-id=\"a3kyzw\" data-start=\"3103\" data-end=\"3142\">Embalaje de grado sala limpia disponible<\/li>\n<li data-section-id=\"3ss3f2\" data-start=\"3143\" data-end=\"3193\">Caja de madera resistente a los golpes o sellado al vac\u00edo<\/li>\n<li data-section-id=\"iuz9t\" data-start=\"3194\" data-end=\"3253\">Dise\u00f1ado para el transporte de semiconductores sin contaminaci\u00f3n<\/li>\n<li data-section-id=\"11l6t4c\" data-start=\"3254\" data-end=\"3313\">Admite tama\u00f1os personalizados (\u03a6380-\u03a6600 mm o dise\u00f1os a medida).<\/li>\n<\/ul>\n<hr data-start=\"3315\" data-end=\"3318\" \/>\n<h1 data-section-id=\"62o8y8\" data-start=\"3320\" data-end=\"3349\"><span role=\"text\">Por qu\u00e9 elegir este producto<\/span><\/h1>\n<p data-start=\"3350\" data-end=\"3688\">Esta bandeja portadora de obleas de SiC est\u00e1 dise\u00f1ada para la fabricaci\u00f3n de semiconductores de \u00faltima generaci\u00f3n, donde la pureza, la estabilidad t\u00e9rmica y el control de la contaminaci\u00f3n son fundamentales. Al sustituir a los soportes tradicionales de grafito, mejora significativamente el rendimiento de la producci\u00f3n, reduce los costes de mantenimiento y garantiza un rendimiento estable del proceso a largo plazo.<\/p>\n<hr data-start=\"3690\" data-end=\"3693\" \/>\n<h1 data-section-id=\"1iusff4\" data-start=\"3695\" data-end=\"3704\"><span role=\"text\">PREGUNTAS FRECUENTES<\/span><\/h1>\n<h3 data-section-id=\"1m9x0lv\" data-start=\"3706\" data-end=\"3791\"><span role=\"text\">P1: \u00bfCu\u00e1l es la principal ventaja del recubrimiento CVD SiC frente a las bandejas de grafito?<\/span><\/h3>\n<p data-start=\"3792\" data-end=\"3978\">El recubrimiento CVD SiC proporciona una capa protectora densa y ultrapura que impide la penetraci\u00f3n de gas y el desprendimiento de part\u00edculas de grafito, mejorando enormemente la durabilidad y reduciendo la contaminaci\u00f3n de las obleas.<\/p>\n<hr data-start=\"3980\" data-end=\"3983\" \/>\n<h3 data-section-id=\"7rg8ob\" data-start=\"3985\" data-end=\"4059\"><span role=\"text\">P2: \u00bfPuede utilizarse esta bandeja de SiC en procesos MOCVD de alta temperatura?<\/span><\/h3>\n<p data-start=\"4060\" data-end=\"4219\">S\u00ed. Est\u00e1 dise\u00f1ado espec\u00edficamente para aplicaciones MOCVD y puede funcionar de forma fiable a 1100-1200\u00b0C con una excelente estabilidad t\u00e9rmica y una distribuci\u00f3n uniforme del calor.<\/p>\n<hr data-start=\"4221\" data-end=\"4224\" \/>\n<h3 data-section-id=\"ox8w5l\" data-start=\"4226\" data-end=\"4314\"><span role=\"text\">P3: \u00bfCu\u00e1l es la diferencia entre las bandejas de grafito revestido y las bandejas de CVD SiC completas?<\/span><\/h3>\n<p data-start=\"4315\" data-end=\"4510\" data-is-last-node=\"\" data-is-only-node=\"\">Las bandejas de grafito revestido utilizan un n\u00facleo de grafito con una capa protectora de SiC, mientras que las bandejas de SiC de CVD completo son estructuras monol\u00edticas con mayor pureza, mejor resistencia a la corrosi\u00f3n y mayor vida \u00fatil.<\/p>","protected":false},"excerpt":{"rendered":"<p>The SiC ceramic tray plate is a high-performance wafer carrier designed for advanced semiconductor processes such as MOCVD, epitaxy, and ICP etching. It is available in two structures: Graphite substrate with CVD SiC coating Monolithic high-purity CVD SiC tray (\u226599.99%) Compared with conventional graphite carriers, this product offers significantly improved thermal stability, corrosion resistance, and 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