{"id":2095,"date":"2026-05-12T03:44:27","date_gmt":"2026-05-12T03:44:27","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&#038;p=2095"},"modified":"2026-05-12T03:44:27","modified_gmt":"2026-05-12T03:44:27","slug":"high-purity-silicon-carbide-wafer-tray-for-semiconductor-cvd-processing","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/es\/product\/high-purity-silicon-carbide-wafer-tray-for-semiconductor-cvd-processing\/","title":{"rendered":"Bandeja para obleas de carburo de silicio de gran pureza para el procesamiento de semiconductores y CVD"},"content":{"rendered":"<p data-start=\"199\" data-end=\"404\"><img fetchpriority=\"high\" decoding=\"async\" class=\"wp-image-2097 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-300x300.png\" alt=\"\" width=\"288\" height=\"288\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2.png 1000w\" sizes=\"(max-width: 288px) 100vw, 288px\" \/>La bandeja para obleas de carburo de silicio es un soporte cer\u00e1mico de precisi\u00f3n de alto rendimiento dise\u00f1ado para el procesamiento de obleas de semiconductores, sistemas CVD\/PECVD, hornos de vac\u00edo y entornos industriales de alta temperatura.<\/p>\n<p data-start=\"406\" data-end=\"666\">Fabricada con CVD SiC o SSiC (carburo de silicio sinterizado) de gran pureza, esta bandeja ofrece una estabilidad t\u00e9rmica, una resistencia mec\u00e1nica y una resistencia qu\u00edmica excepcionales, lo que garantiza una manipulaci\u00f3n estable de las obleas y un rendimiento constante del proceso en condiciones extremas.<\/p>\n<p data-start=\"668\" data-end=\"818\">Se utiliza ampliamente en la fabricaci\u00f3n de semiconductores, epitaxia LED, procesamiento de obleas de zafiro, sinterizaci\u00f3n de cer\u00e1mica avanzada y sistemas t\u00e9rmicos de vac\u00edo.<\/p>\n<hr data-start=\"820\" data-end=\"823\" \/>\n<h2 data-section-id=\"1ma7m6t\" data-start=\"825\" data-end=\"840\">Caracter\u00edsticas principales<\/h2>\n<h3 data-section-id=\"1mskj6p\" data-start=\"842\" data-end=\"888\">Estabilidad a altas temperaturas (hasta 1600\u00b0C+)<\/h3>\n<p data-start=\"889\" data-end=\"1000\">Mantiene la integridad estructural y el rendimiento en condiciones de funcionamiento continuo a altas temperaturas sin sufrir deformaciones.<\/p>\n<h3 data-section-id=\"obi2s6\" data-start=\"1002\" data-end=\"1036\">Excelente conductividad t\u00e9rmica<\/h3>\n<p data-start=\"1037\" data-end=\"1136\">Garantiza una transferencia de calor r\u00e1pida y uniforme, reduciendo los gradientes de temperatura y mejorando el rendimiento del proceso.<\/p>\n<h3 data-section-id=\"hstd5z\" data-start=\"1138\" data-end=\"1175\">Resistencia superior a los choques t\u00e9rmicos<\/h3>\n<p data-start=\"1176\" data-end=\"1248\">Soporta ciclos r\u00e1pidos de calentamiento y enfriamiento sin agrietarse ni deformarse.<\/p>\n<h3 data-section-id=\"1wy3za\" data-start=\"1250\" data-end=\"1278\">Alta resistencia mec\u00e1nica<\/h3>\n<p data-start=\"1279\" data-end=\"1377\">La estructura reforzada proporciona una excelente capacidad de carga y estabilidad dimensional a largo plazo.<\/p>\n<h3 data-section-id=\"1cdcof9\" data-start=\"1379\" data-end=\"1411\">Resistencia qu\u00edmica y al plasma<\/h3>\n<p data-start=\"1412\" data-end=\"1521\">Alta resistencia a los \u00e1cidos, \u00e1lcalis, gases corrosivos y entornos de plasma utilizados en los procesos de semiconductores.<\/p>\n<h3 data-section-id=\"1vb1ood\" data-start=\"1523\" data-end=\"1557\">Mecanizado de alta precisi\u00f3n<\/h3>\n<p data-start=\"1558\" data-end=\"1663\">El rectificado CNC garantiza tolerancias estrechas, planitud y superficies de contacto de obleas lisas para sistemas automatizados.<\/p>\n<hr data-start=\"1665\" data-end=\"1668\" \/>\n<h2 data-section-id=\"1lh3gui\" data-start=\"1670\" data-end=\"1690\">Dise\u00f1o estructural<\/h2>\n<h3 data-section-id=\"1s8wich\" data-start=\"1692\" data-end=\"1726\">Dise\u00f1o de ranura anular multizona<\/h3>\n<ul data-start=\"1727\" data-end=\"1850\">\n<li data-section-id=\"gkdwm3\" data-start=\"1727\" data-end=\"1745\">Reduce el peso<\/li>\n<li data-section-id=\"18issq2\" data-start=\"1746\" data-end=\"1777\">Mejora la uniformidad t\u00e9rmica<\/li>\n<li data-section-id=\"l3j2gw\" data-start=\"1778\" data-end=\"1807\">Mejora la disipaci\u00f3n del calor<\/li>\n<li data-section-id=\"1tnc39l\" data-start=\"1808\" data-end=\"1850\">Minimiza la concentraci\u00f3n de tensiones t\u00e9rmicas<\/li>\n<\/ul>\n<p data-start=\"1852\" data-end=\"1942\">Esta estructura est\u00e1 optimizada para el procesamiento de obleas a alta temperatura y aplicaciones de vac\u00edo.<\/p>\n<hr data-start=\"1944\" data-end=\"1947\" \/>\n<h3 data-section-id=\"10p8bw6\" data-start=\"1949\" data-end=\"1984\">Sistema de costillas de refuerzo radial<\/h3>\n<ul data-start=\"1985\" data-end=\"2144\">\n<li data-section-id=\"93l2pt\" data-start=\"1985\" data-end=\"2018\">Aumenta la rigidez mec\u00e1nica<\/li>\n<li data-section-id=\"xmgkcx\" data-start=\"2019\" data-end=\"2054\">Evita la deformaci\u00f3n bajo carga<\/li>\n<li data-section-id=\"16xz56l\" data-start=\"2055\" data-end=\"2088\">Mejora la estabilidad rotacional<\/li>\n<li data-section-id=\"1i3nv5f\" data-start=\"2089\" data-end=\"2144\">Prolonga la vida \u00fatil en entornos t\u00e9rmicos c\u00edclicos<\/li>\n<\/ul>\n<hr data-start=\"2146\" data-end=\"2149\" \/>\n<h3 data-section-id=\"erqgsk\" data-start=\"2151\" data-end=\"2181\">Superficie mecanizada de precisi\u00f3n<\/h3>\n<ul data-start=\"2182\" data-end=\"2334\">\n<li data-section-id=\"tdalbr\" data-start=\"2182\" data-end=\"2215\">Gran planitud y consistencia<\/li>\n<li data-section-id=\"1jpgedk\" data-start=\"2216\" data-end=\"2250\">Interfaz de contacto de oblea lisa<\/li>\n<li data-section-id=\"muk23v\" data-start=\"2251\" data-end=\"2297\">Compatible con sistemas de automatizaci\u00f3n rob\u00f3tica<\/li>\n<li data-section-id=\"t302yy\" data-start=\"2298\" data-end=\"2334\">Reduce el riesgo de generaci\u00f3n de part\u00edculas<\/li>\n<\/ul>\n<hr data-start=\"2336\" data-end=\"2339\" \/>\n<h3 data-section-id=\"1jxpmtp\" data-start=\"2341\" data-end=\"2371\">Interfaz de montaje central<\/h3>\n<p data-start=\"2372\" data-end=\"2415\">La estructura central perforada con precisi\u00f3n garantiza:<\/p>\n<ul data-start=\"2416\" data-end=\"2541\">\n<li data-section-id=\"1prbs8w\" data-start=\"2416\" data-end=\"2441\">Fijaci\u00f3n estable del eje<\/li>\n<li data-section-id=\"cemghk\" data-start=\"2442\" data-end=\"2483\">Alineaci\u00f3n precisa en sistemas de hornos<\/li>\n<li data-section-id=\"pxfn4\" data-start=\"2484\" data-end=\"2541\">Compatibilidad con equipos automatizados de manipulaci\u00f3n de obleas<\/li>\n<\/ul>\n<hr data-start=\"2543\" data-end=\"2546\" \/>\n<h3 data-section-id=\"gqycxw\" data-start=\"2548\" data-end=\"2573\">Anillo exterior reforzado<\/h3>\n<ul data-start=\"2574\" data-end=\"2688\">\n<li data-section-id=\"17dniqy\" data-start=\"2574\" data-end=\"2605\">Mejora el equilibrio estructural<\/li>\n<li data-section-id=\"yaoils\" data-start=\"2606\" data-end=\"2639\">Mejora la resistencia a las vibraciones<\/li>\n<li data-section-id=\"16bzx41\" data-start=\"2640\" data-end=\"2688\">Refuerza la durabilidad de los bordes durante el funcionamiento<\/li>\n<\/ul>\n<hr data-start=\"2690\" data-end=\"2693\" \/>\n<h2 data-section-id=\"rb24ym\" data-start=\"2695\" data-end=\"2714\">Opciones de material<\/h2>\n<h3 data-section-id=\"87v3o9\" data-start=\"2716\" data-end=\"2749\">Carburo de silicio CVD (CVD SiC)<\/h3>\n<ul data-start=\"2750\" data-end=\"2880\">\n<li data-section-id=\"1qjlbs6\" data-start=\"2750\" data-end=\"2771\">Pureza ultra alta<\/li>\n<li data-section-id=\"ujmjxb\" data-start=\"2772\" data-end=\"2803\">Contaminaci\u00f3n extremadamente baja<\/li>\n<li data-section-id=\"1529x9w\" data-start=\"2804\" data-end=\"2833\">Excelente calidad superficial<\/li>\n<li data-section-id=\"3atv6m\" data-start=\"2834\" data-end=\"2880\">Ideal para procesos avanzados de semiconductores<\/li>\n<\/ul>\n<hr data-start=\"2882\" data-end=\"2885\" \/>\n<h3 data-section-id=\"gwj4n0\" data-start=\"2887\" data-end=\"2922\">Carburo de silicio sinterizado (SSiC)<\/h3>\n<ul data-start=\"2923\" data-end=\"3068\">\n<li data-section-id=\"16na2wg\" data-start=\"2923\" data-end=\"2952\">Alta resistencia y densidad<\/li>\n<li data-section-id=\"v14n1q\" data-start=\"2953\" data-end=\"2982\">Excelente resistencia al desgaste<\/li>\n<li data-section-id=\"1s1u32c\" data-start=\"2983\" data-end=\"3015\">Estable en entornos dif\u00edciles<\/li>\n<li data-section-id=\"1586k58\" data-start=\"3016\" data-end=\"3068\">Adecuado para sistemas industriales de alta temperatura<\/li>\n<\/ul>\n<hr data-start=\"3070\" data-end=\"3073\" \/>\n<h3 data-section-id=\"129y1qt\" data-start=\"3075\" data-end=\"3106\">SiC ligado por reacci\u00f3n (RBSiC)<\/h3>\n<ul data-start=\"3107\" data-end=\"3214\">\n<li data-section-id=\"rz6j8a\" data-start=\"3107\" data-end=\"3134\">Soluci\u00f3n rentable<\/li>\n<li data-section-id=\"dvvzgf\" data-start=\"3135\" data-end=\"3168\">Buena resistencia al choque t\u00e9rmico<\/li>\n<li data-section-id=\"ag3lnk\" data-start=\"3169\" data-end=\"3214\">Adecuado para aplicaciones industriales masivas<\/li>\n<\/ul>\n<hr data-start=\"3216\" data-end=\"3219\" \/>\n<h2 data-section-id=\"1cgu054\" data-start=\"3221\" data-end=\"3248\">Especificaciones t\u00e9cnicas<\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"3250\" data-end=\"3636\">\n<thead data-start=\"3250\" data-end=\"3274\">\n<tr data-start=\"3250\" data-end=\"3274\">\n<th class=\"last:pe-10\" data-start=\"3250\" data-end=\"3257\" data-col-size=\"sm\">Art\u00edculo<\/th>\n<th class=\"last:pe-10\" data-start=\"3257\" data-end=\"3274\" data-col-size=\"sm\">Especificaci\u00f3n<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"3299\" data-end=\"3636\">\n<tr data-start=\"3299\" data-end=\"3336\">\n<td data-start=\"3299\" data-end=\"3310\" data-col-size=\"sm\">Material<\/td>\n<td data-start=\"3310\" data-end=\"3336\" data-col-size=\"sm\">CVD SiC \/ SSiC \/ RBSiC<\/td>\n<\/tr>\n<tr data-start=\"3337\" data-end=\"3361\">\n<td data-start=\"3337\" data-end=\"3346\" data-col-size=\"sm\">Pureza<\/td>\n<td data-start=\"3346\" data-end=\"3361\" data-col-size=\"sm\">Hasta 99,9%<\/td>\n<\/tr>\n<tr data-start=\"3362\" data-end=\"3398\">\n<td data-start=\"3362\" data-end=\"3386\" data-col-size=\"sm\">Temperatura de funcionamiento<\/td>\n<td data-start=\"3386\" data-end=\"3398\" data-col-size=\"sm\">\u2264 1600\u00b0C<\/td>\n<\/tr>\n<tr data-start=\"3399\" data-end=\"3428\">\n<td data-start=\"3399\" data-end=\"3409\" data-col-size=\"sm\">Densidad<\/td>\n<td data-start=\"3409\" data-end=\"3428\" data-col-size=\"sm\">2,3 - 3,9 g\/cm\u00b3<\/td>\n<\/tr>\n<tr data-start=\"3429\" data-end=\"3469\">\n<td data-start=\"3429\" data-end=\"3456\" data-col-size=\"sm\">Resistencia al choque t\u00e9rmico<\/td>\n<td data-start=\"3456\" data-end=\"3469\" data-col-size=\"sm\">Excelente<\/td>\n<\/tr>\n<tr data-start=\"3470\" data-end=\"3518\">\n<td data-start=\"3470\" data-end=\"3487\" data-col-size=\"sm\">Acabado superficial<\/td>\n<td data-start=\"3487\" data-end=\"3518\" data-col-size=\"sm\">Esmerilado \/ pulido de precisi\u00f3n<\/td>\n<\/tr>\n<tr data-start=\"3519\" data-end=\"3560\">\n<td data-start=\"3519\" data-end=\"3527\" data-col-size=\"sm\">Forma<\/td>\n<td data-start=\"3527\" data-end=\"3560\" data-col-size=\"sm\">Personalizado (Redondo \/ Anillo \/ Placa)<\/td>\n<\/tr>\n<tr data-start=\"3561\" data-end=\"3588\">\n<td data-start=\"3561\" data-end=\"3568\" data-col-size=\"sm\">Talla<\/td>\n<td data-start=\"3568\" data-end=\"3588\" data-col-size=\"sm\">Disponible a medida<\/td>\n<\/tr>\n<tr data-start=\"3589\" data-end=\"3636\">\n<td data-start=\"3589\" data-end=\"3603\" data-col-size=\"sm\">Aplicaci\u00f3n<\/td>\n<td data-start=\"3603\" data-end=\"3636\" data-col-size=\"sm\">Semiconductores \/ CVD \/ Hornos<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"3638\" data-end=\"3641\" \/>\n<h2 data-section-id=\"mu966k\" data-start=\"3643\" data-end=\"3658\">Aplicaciones<\/h2>\n<h3 data-section-id=\"1eipr13\" data-start=\"3660\" data-end=\"3686\">Industria de semiconductores<\/h3>\n<ul data-start=\"3687\" data-end=\"3849\">\n<li data-section-id=\"13x15us\" data-start=\"3687\" data-end=\"3728\">Soporte de obleas para sistemas CVD \/ PECVD<\/li>\n<li data-section-id=\"1ox36e0\" data-start=\"3729\" data-end=\"3774\">Procesos de difusi\u00f3n, oxidaci\u00f3n y recocido<\/li>\n<li data-section-id=\"1t8nanb\" data-start=\"3775\" data-end=\"3811\">RTP y sistemas de crecimiento epitaxial<\/li>\n<li data-section-id=\"1jzl031\" data-start=\"3812\" data-end=\"3849\">Bandejas de transferencia y manipulaci\u00f3n de obleas<\/li>\n<\/ul>\n<hr data-start=\"3851\" data-end=\"3854\" \/>\n<h3 data-section-id=\"l1oj08\" data-start=\"3856\" data-end=\"3881\">LED y optoelectr\u00f3nica<\/h3>\n<ul data-start=\"3882\" data-end=\"3982\">\n<li data-section-id=\"dgfruo\" data-start=\"3882\" data-end=\"3911\">Procesado de obleas de zafiro<\/li>\n<li data-section-id=\"fwvbk7\" data-start=\"3912\" data-end=\"3943\">Sistemas portadores de epitaxia LED<\/li>\n<li data-section-id=\"1gl4kjt\" data-start=\"3944\" data-end=\"3982\">Soporte de sustrato de alta temperatura<\/li>\n<\/ul>\n<hr data-start=\"3984\" data-end=\"3987\" \/>\n<h3 data-section-id=\"480g89\" data-start=\"3989\" data-end=\"4018\">Hornos t\u00e9rmicos y de vac\u00edo<\/h3>\n<ul data-start=\"4019\" data-end=\"4115\">\n<li data-section-id=\"kqy2l\" data-start=\"4019\" data-end=\"4055\">Bandejas de sinterizaci\u00f3n a alta temperatura<\/li>\n<li data-section-id=\"jgks7q\" data-start=\"4056\" data-end=\"4083\">Soportes para hornos de vac\u00edo<\/li>\n<li data-section-id=\"1c2tpui\" data-start=\"4084\" data-end=\"4115\">Dispositivos de tratamiento t\u00e9rmico<\/li>\n<\/ul>\n<hr data-start=\"4117\" data-end=\"4120\" \/>\n<h3 data-section-id=\"1owf0zc\" data-start=\"4122\" data-end=\"4148\">Fabricaci\u00f3n avanzada<\/h3>\n<ul data-start=\"4149\" data-end=\"4255\">\n<li data-section-id=\"odfyg7\" data-start=\"4149\" data-end=\"4181\">Procesado cer\u00e1mico de precisi\u00f3n<\/li>\n<li data-section-id=\"1kui91r\" data-start=\"4182\" data-end=\"4215\">Accesorios para equipos de automatizaci\u00f3n<\/li>\n<li data-section-id=\"135k87d\" data-start=\"4216\" data-end=\"4255\">Plataformas mec\u00e1nicas de alta estabilidad<\/li>\n<\/ul>\n<hr data-start=\"4257\" data-end=\"4260\" \/>\n<h2 data-section-id=\"dysc5y\" data-start=\"4262\" data-end=\"4283\"><img decoding=\"async\" class=\"wp-image-2098 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-300x300.png\" alt=\"\" width=\"276\" height=\"276\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1.png 1000w\" sizes=\"(max-width: 276px) 100vw, 276px\" \/>Ventajas del producto<\/h2>\n<ul data-start=\"4285\" data-end=\"4537\">\n<li data-section-id=\"an6nuo\" data-start=\"4285\" data-end=\"4326\">Excelente resistencia a altas temperaturas<\/li>\n<li data-section-id=\"1rm14qx\" data-start=\"4327\" data-end=\"4360\">Conductividad t\u00e9rmica superior<\/li>\n<li data-section-id=\"wx5di6\" data-start=\"4361\" data-end=\"4391\">Gran estabilidad dimensional<\/li>\n<li data-section-id=\"ymf61l\" data-start=\"4392\" data-end=\"4413\">Larga vida \u00fatil<\/li>\n<li data-section-id=\"1v5rrzz\" data-start=\"4414\" data-end=\"4440\">Bajo riesgo de contaminaci\u00f3n<\/li>\n<li data-section-id=\"ddezgg\" data-start=\"4441\" data-end=\"4472\">Gran resistencia a la corrosi\u00f3n<\/li>\n<li data-section-id=\"xmyntv\" data-start=\"4473\" data-end=\"4507\">Compatible con sistemas de vac\u00edo<\/li>\n<li data-section-id=\"1ijrpkq\" data-start=\"4508\" data-end=\"4537\">Dise\u00f1o totalmente personalizable<\/li>\n<\/ul>\n<hr data-start=\"4539\" data-end=\"4542\" \/>\n<h2 data-section-id=\"1lwg0so\" data-start=\"4544\" data-end=\"4571\"><img decoding=\"async\" class=\"wp-image-2096 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-300x300.png\" alt=\"\" width=\"280\" height=\"280\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3.png 1000w\" sizes=\"(max-width: 280px) 100vw, 280px\" \/>Capacidad de personalizaci\u00f3n<\/h2>\n<p data-start=\"4573\" data-end=\"4649\">Admitimos la personalizaci\u00f3n completa en funci\u00f3n de los planos o los requisitos de la aplicaci\u00f3n:<\/p>\n<ul data-start=\"4651\" data-end=\"4883\">\n<li data-section-id=\"1i7bvpn\" data-start=\"4651\" data-end=\"4689\">Personalizaci\u00f3n del di\u00e1metro\/espesor<\/li>\n<li data-section-id=\"dmyogn\" data-start=\"4690\" data-end=\"4720\">Optimizaci\u00f3n de la geometr\u00eda de las ranuras<\/li>\n<li data-section-id=\"19luai6\" data-start=\"4721\" data-end=\"4749\">Orificios de montaje de precisi\u00f3n<\/li>\n<li data-section-id=\"r5ngym\" data-start=\"4750\" data-end=\"4781\">Pulido \/ lapeado de superficies<\/li>\n<li data-section-id=\"c4ihff\" data-start=\"4782\" data-end=\"4818\">Mecanizado ultraplano para obleas<\/li>\n<li data-section-id=\"1lf2kpf\" data-start=\"4819\" data-end=\"4853\">Selecci\u00f3n de materiales de gran pureza<\/li>\n<li data-section-id=\"881e6f\" data-start=\"4854\" data-end=\"4883\">Dise\u00f1o estructural complejo<\/li>\n<\/ul>\n<p data-start=\"4885\" data-end=\"4956\">Servicios OEM y ODM disponibles para fabricantes de equipos semiconductores.<\/p>\n<hr data-start=\"4958\" data-end=\"4961\" \/>\n<h2 data-section-id=\"1hryhf7\" data-start=\"4963\" data-end=\"4969\">PREGUNTAS FRECUENTES<\/h2>\n<h3 data-section-id=\"1rw8tyo\" data-start=\"4971\" data-end=\"5025\">P1: \u00bfPara qu\u00e9 se utiliza una bandeja de obleas de carburo de silicio?<\/h3>\n<p data-start=\"5026\" data-end=\"5173\">Se utiliza para soportar y transportar obleas durante procesos de semiconductores como CVD, PECVD, difusi\u00f3n, oxidaci\u00f3n y recocido a alta temperatura.<\/p>\n<hr data-start=\"5175\" data-end=\"5178\" \/>\n<h3 data-section-id=\"8sm145\" data-start=\"5180\" data-end=\"5230\">P2: \u00bfPor qu\u00e9 utilizar SiC en lugar de cuarzo o grafito?<\/h3>\n<p data-start=\"5231\" data-end=\"5244\">SiC proporciona:<\/p>\n<ul data-start=\"5245\" data-end=\"5391\">\n<li data-section-id=\"66suke\" data-start=\"5245\" data-end=\"5278\">Mayor resistencia a la temperatura<\/li>\n<li data-section-id=\"1k27992\" data-start=\"5279\" data-end=\"5309\">Mayor resistencia mec\u00e1nica<\/li>\n<li data-section-id=\"1y67fsp\" data-start=\"5310\" data-end=\"5337\">Menor dilataci\u00f3n t\u00e9rmica<\/li>\n<li data-section-id=\"1kygjim\" data-start=\"5338\" data-end=\"5361\">Mayor vida \u00fatil<\/li>\n<li data-section-id=\"d0e53t\" data-start=\"5362\" data-end=\"5391\">Mejor estabilidad qu\u00edmica<\/li>\n<\/ul>\n<hr data-start=\"5393\" data-end=\"5396\" \/>\n<h3 data-section-id=\"c1126k\" data-start=\"5398\" data-end=\"5433\">P3: \u00bfSe puede personalizar la bandeja?<\/h3>\n<p data-start=\"5434\" data-end=\"5527\">S\u00ed. Ofrecemos una personalizaci\u00f3n completa que incluye el tama\u00f1o, la estructura, el grosor y el dise\u00f1o de montaje.<\/p>\n<hr data-start=\"5529\" data-end=\"5532\" \/>\n<h3 data-section-id=\"4sy20p\" data-start=\"5534\" data-end=\"5587\">P4: \u00bfEs adecuado para calentamiento y enfriamiento r\u00e1pidos?<\/h3>\n<p data-start=\"5588\" data-end=\"5686\">S\u00ed. El SiC tiene una excelente resistencia al choque t\u00e9rmico, por lo que es adecuado para procesos de ciclos t\u00e9rmicos.<\/p>","protected":false},"excerpt":{"rendered":"<p data-start=\"199\" data-end=\"404\">La bandeja para obleas de carburo de silicio es un soporte cer\u00e1mico de precisi\u00f3n de alto rendimiento dise\u00f1ado para el procesamiento de obleas de semiconductores, sistemas CVD\/PECVD, hornos de vac\u00edo y entornos industriales de alta temperatura.<\/p>\n<p data-start=\"406\" data-end=\"666\">Fabricada con CVD SiC o SSiC (carburo de silicio sinterizado) de gran pureza, esta bandeja ofrece una estabilidad t\u00e9rmica, una resistencia mec\u00e1nica y una resistencia qu\u00edmica excepcionales, lo que garantiza una manipulaci\u00f3n estable de las obleas y un rendimiento constante del proceso en condiciones extremas.<\/p>","protected":false},"featured_media":2097,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center 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