{"id":2095,"date":"2026-05-12T03:44:27","date_gmt":"2026-05-12T03:44:27","guid":{"rendered":"https:\/\/www.xkh-ceramics.com\/?post_type=product&#038;p=2095"},"modified":"2026-05-12T03:44:27","modified_gmt":"2026-05-12T03:44:27","slug":"high-purity-silicon-carbide-wafer-tray-for-semiconductor-cvd-processing","status":"publish","type":"product","link":"https:\/\/www.xkh-ceramics.com\/de\/product\/high-purity-silicon-carbide-wafer-tray-for-semiconductor-cvd-processing\/","title":{"rendered":"Hochreine Siliziumkarbid-Waferablage f\u00fcr die Halbleiter- und CVD-Verarbeitung"},"content":{"rendered":"<p data-start=\"199\" data-end=\"404\"><img fetchpriority=\"high\" decoding=\"async\" class=\"wp-image-2097 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-300x300.png\" alt=\"\" width=\"288\" height=\"288\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-2.png 1000w\" sizes=\"(max-width: 288px) 100vw, 288px\" \/>Die Siliziumkarbid-Waferschale ist ein hochleistungsf\u00e4higer keramischer Pr\u00e4zisionstr\u00e4ger, der f\u00fcr die Bearbeitung von Halbleiterwafern, CVD\/PECVD-Systeme, Vakuum\u00f6fen und industrielle Hochtemperaturumgebungen entwickelt wurde.<\/p>\n<p data-start=\"406\" data-end=\"666\">Die aus hochreinem CVD-SiC oder SSiC (gesintertes Siliziumkarbid) hergestellte Schale bietet eine hervorragende thermische Stabilit\u00e4t, mechanische Festigkeit und chemische Best\u00e4ndigkeit und gew\u00e4hrleistet eine stabile Handhabung der Wafer und eine gleichbleibende Prozessleistung unter extremen Bedingungen.<\/p>\n<p data-start=\"668\" data-end=\"818\">Es findet breite Anwendung in der Halbleiterherstellung, der LED-Epitaxie, der Bearbeitung von Saphirwafern, dem Sintern von Hochleistungskeramik und in thermischen Vakuumsystemen.<\/p>\n<hr data-start=\"820\" data-end=\"823\" \/>\n<h2 data-section-id=\"1ma7m6t\" data-start=\"825\" data-end=\"840\">Wesentliche Merkmale<\/h2>\n<h3 data-section-id=\"1mskj6p\" data-start=\"842\" data-end=\"888\">Hohe Temperaturstabilit\u00e4t (bis zu 1600\u00b0C+)<\/h3>\n<p data-start=\"889\" data-end=\"1000\">Erh\u00e4lt die strukturelle Integrit\u00e4t und Leistung im Dauerbetrieb bei hohen Temperaturen ohne Verformung.<\/p>\n<h3 data-section-id=\"obi2s6\" data-start=\"1002\" data-end=\"1036\">Ausgezeichnete W\u00e4rmeleitf\u00e4higkeit<\/h3>\n<p data-start=\"1037\" data-end=\"1136\">Sorgt f\u00fcr eine schnelle und gleichm\u00e4\u00dfige W\u00e4rme\u00fcbertragung, reduziert Temperaturgradienten und verbessert die Prozessausbeute.<\/p>\n<h3 data-section-id=\"hstd5z\" data-start=\"1138\" data-end=\"1175\">Hervorragende Temperaturwechselbest\u00e4ndigkeit<\/h3>\n<p data-start=\"1176\" data-end=\"1248\">H\u00e4lt schnellen Heiz- und K\u00fchlzyklen stand, ohne zu brechen oder sich zu verziehen.<\/p>\n<h3 data-section-id=\"1wy3za\" data-start=\"1250\" data-end=\"1278\">Hohe mechanische Festigkeit<\/h3>\n<p data-start=\"1279\" data-end=\"1377\">Die verst\u00e4rkte Struktur sorgt f\u00fcr eine ausgezeichnete Tragf\u00e4higkeit und langfristige Formstabilit\u00e4t.<\/p>\n<h3 data-section-id=\"1cdcof9\" data-start=\"1379\" data-end=\"1411\">Chemikalien- und Plasmabest\u00e4ndigkeit<\/h3>\n<p data-start=\"1412\" data-end=\"1521\">Hochgradig resistent gegen S\u00e4uren, Laugen, korrosive Gase und Plasma-Umgebungen, die in Halbleiterprozessen verwendet werden.<\/p>\n<h3 data-section-id=\"1vb1ood\" data-start=\"1523\" data-end=\"1557\">Ultrahochpr\u00e4zisions-Bearbeitung<\/h3>\n<p data-start=\"1558\" data-end=\"1663\">CNC-Schleifen gew\u00e4hrleistet enge Toleranzen, Ebenheit und glatte Waferkontaktfl\u00e4chen f\u00fcr automatisierte Systeme.<\/p>\n<hr data-start=\"1665\" data-end=\"1668\" \/>\n<h2 data-section-id=\"1lh3gui\" data-start=\"1670\" data-end=\"1690\">Struktureller Entwurf<\/h2>\n<h3 data-section-id=\"1s8wich\" data-start=\"1692\" data-end=\"1726\">Multi-Zone Ringnut-Design<\/h3>\n<ul data-start=\"1727\" data-end=\"1850\">\n<li data-section-id=\"gkdwm3\" data-start=\"1727\" data-end=\"1745\">Reduziert das Gewicht<\/li>\n<li data-section-id=\"18issq2\" data-start=\"1746\" data-end=\"1777\">Verbessert die thermische Gleichm\u00e4\u00dfigkeit<\/li>\n<li data-section-id=\"l3j2gw\" data-start=\"1778\" data-end=\"1807\">Verbessert die W\u00e4rmeableitung<\/li>\n<li data-section-id=\"1tnc39l\" data-start=\"1808\" data-end=\"1850\">Minimiert die Konzentration thermischer Spannungen<\/li>\n<\/ul>\n<p data-start=\"1852\" data-end=\"1942\">Diese Struktur ist f\u00fcr die Bearbeitung von Hochtemperatur-Wafern und f\u00fcr Vakuumanwendungen optimiert.<\/p>\n<hr data-start=\"1944\" data-end=\"1947\" \/>\n<h3 data-section-id=\"10p8bw6\" data-start=\"1949\" data-end=\"1984\">Radiales Verst\u00e4rkungsrippensystem<\/h3>\n<ul data-start=\"1985\" data-end=\"2144\">\n<li data-section-id=\"93l2pt\" data-start=\"1985\" data-end=\"2018\">Erh\u00f6ht die mechanische Steifigkeit<\/li>\n<li data-section-id=\"xmgkcx\" data-start=\"2019\" data-end=\"2054\">Verhindert Verformung unter Last<\/li>\n<li data-section-id=\"16xz56l\" data-start=\"2055\" data-end=\"2088\">Verbessert die Rotationsstabilit\u00e4t<\/li>\n<li data-section-id=\"1i3nv5f\" data-start=\"2089\" data-end=\"2144\">Verl\u00e4ngert die Lebensdauer in zyklischen thermischen Umgebungen<\/li>\n<\/ul>\n<hr data-start=\"2146\" data-end=\"2149\" \/>\n<h3 data-section-id=\"erqgsk\" data-start=\"2151\" data-end=\"2181\">Pr\u00e4zise bearbeitete Oberfl\u00e4che<\/h3>\n<ul data-start=\"2182\" data-end=\"2334\">\n<li data-section-id=\"tdalbr\" data-start=\"2182\" data-end=\"2215\">Hohe Ebenheit und Konsistenz<\/li>\n<li data-section-id=\"1jpgedk\" data-start=\"2216\" data-end=\"2250\">Glatte Waferkontakt-Schnittstelle<\/li>\n<li data-section-id=\"muk23v\" data-start=\"2251\" data-end=\"2297\">Kompatibel mit Roboter-Automatisierungssystemen<\/li>\n<li data-section-id=\"t302yy\" data-start=\"2298\" data-end=\"2334\">Reduziert das Risiko der Partikelbildung<\/li>\n<\/ul>\n<hr data-start=\"2336\" data-end=\"2339\" \/>\n<h3 data-section-id=\"1jxpmtp\" data-start=\"2341\" data-end=\"2371\">Zentrale Montageschnittstelle<\/h3>\n<p data-start=\"2372\" data-end=\"2415\">Die pr\u00e4zise gebohrte Mittelstruktur gew\u00e4hrleistet:<\/p>\n<ul data-start=\"2416\" data-end=\"2541\">\n<li data-section-id=\"1prbs8w\" data-start=\"2416\" data-end=\"2441\">Stabile Wellenbefestigung<\/li>\n<li data-section-id=\"cemghk\" data-start=\"2442\" data-end=\"2483\">Genaue Ausrichtung in Ofensystemen<\/li>\n<li data-section-id=\"pxfn4\" data-start=\"2484\" data-end=\"2541\">Kompatibilit\u00e4t mit automatisierten Wafer-Handling-Ger\u00e4ten<\/li>\n<\/ul>\n<hr data-start=\"2543\" data-end=\"2546\" \/>\n<h3 data-section-id=\"gqycxw\" data-start=\"2548\" data-end=\"2573\">Verst\u00e4rkter \u00e4u\u00dferer Ring<\/h3>\n<ul data-start=\"2574\" data-end=\"2688\">\n<li data-section-id=\"17dniqy\" data-start=\"2574\" data-end=\"2605\">Verbessert das strukturelle Gleichgewicht<\/li>\n<li data-section-id=\"yaoils\" data-start=\"2606\" data-end=\"2639\">Verbessert die Vibrationsfestigkeit<\/li>\n<li data-section-id=\"16bzx41\" data-start=\"2640\" data-end=\"2688\">Verst\u00e4rkt die Haltbarkeit der Kanten w\u00e4hrend des Betriebs<\/li>\n<\/ul>\n<hr data-start=\"2690\" data-end=\"2693\" \/>\n<h2 data-section-id=\"rb24ym\" data-start=\"2695\" data-end=\"2714\">Material-Optionen<\/h2>\n<h3 data-section-id=\"87v3o9\" data-start=\"2716\" data-end=\"2749\">CVD-Siliziumkarbid (CVD-SiC)<\/h3>\n<ul data-start=\"2750\" data-end=\"2880\">\n<li data-section-id=\"1qjlbs6\" data-start=\"2750\" data-end=\"2771\">Ultrahohe Reinheit<\/li>\n<li data-section-id=\"ujmjxb\" data-start=\"2772\" data-end=\"2803\">\u00c4u\u00dferst geringe Verschmutzung<\/li>\n<li data-section-id=\"1529x9w\" data-start=\"2804\" data-end=\"2833\">Ausgezeichnete Oberfl\u00e4chenqualit\u00e4t<\/li>\n<li data-section-id=\"3atv6m\" data-start=\"2834\" data-end=\"2880\">Ideal f\u00fcr fortschrittliche Halbleiterprozesse<\/li>\n<\/ul>\n<hr data-start=\"2882\" data-end=\"2885\" \/>\n<h3 data-section-id=\"gwj4n0\" data-start=\"2887\" data-end=\"2922\">Gesintertes Siliziumkarbid (SSiC)<\/h3>\n<ul data-start=\"2923\" data-end=\"3068\">\n<li data-section-id=\"16na2wg\" data-start=\"2923\" data-end=\"2952\">Hohe Festigkeit und Dichte<\/li>\n<li data-section-id=\"v14n1q\" data-start=\"2953\" data-end=\"2982\">Ausgezeichnete Verschlei\u00dffestigkeit<\/li>\n<li data-section-id=\"1s1u32c\" data-start=\"2983\" data-end=\"3015\">Stabil in rauen Umgebungen<\/li>\n<li data-section-id=\"1586k58\" data-start=\"3016\" data-end=\"3068\">Geeignet f\u00fcr industrielle Hochtemperatursysteme<\/li>\n<\/ul>\n<hr data-start=\"3070\" data-end=\"3073\" \/>\n<h3 data-section-id=\"129y1qt\" data-start=\"3075\" data-end=\"3106\">Reaktionsgebundenes SiC (RBSiC)<\/h3>\n<ul data-start=\"3107\" data-end=\"3214\">\n<li data-section-id=\"rz6j8a\" data-start=\"3107\" data-end=\"3134\">Kosteng\u00fcnstige L\u00f6sung<\/li>\n<li data-section-id=\"dvvzgf\" data-start=\"3135\" data-end=\"3168\">Gute Temperaturwechselbest\u00e4ndigkeit<\/li>\n<li data-section-id=\"ag3lnk\" data-start=\"3169\" data-end=\"3214\">Geeignet f\u00fcr industrielle Massenanwendungen<\/li>\n<\/ul>\n<hr data-start=\"3216\" data-end=\"3219\" \/>\n<h2 data-section-id=\"1cgu054\" data-start=\"3221\" data-end=\"3248\">Technische Daten<\/h2>\n<div class=\"TyagGW_tableContainer\">\n<div class=\"group TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\">\n<table class=\"w-fit min-w-(--thread-content-width)\" data-start=\"3250\" data-end=\"3636\">\n<thead data-start=\"3250\" data-end=\"3274\">\n<tr data-start=\"3250\" data-end=\"3274\">\n<th class=\"last:pe-10\" data-start=\"3250\" data-end=\"3257\" data-col-size=\"sm\">Artikel<\/th>\n<th class=\"last:pe-10\" data-start=\"3257\" data-end=\"3274\" data-col-size=\"sm\">Spezifikation<\/th>\n<\/tr>\n<\/thead>\n<tbody data-start=\"3299\" data-end=\"3636\">\n<tr data-start=\"3299\" data-end=\"3336\">\n<td data-start=\"3299\" data-end=\"3310\" data-col-size=\"sm\">Material<\/td>\n<td data-start=\"3310\" data-end=\"3336\" data-col-size=\"sm\">CVD-SiC \/ SSiC \/ RBSiC<\/td>\n<\/tr>\n<tr data-start=\"3337\" data-end=\"3361\">\n<td data-start=\"3337\" data-end=\"3346\" data-col-size=\"sm\">Reinheit<\/td>\n<td data-start=\"3346\" data-end=\"3361\" data-col-size=\"sm\">Bis zu 99,9%<\/td>\n<\/tr>\n<tr data-start=\"3362\" data-end=\"3398\">\n<td data-start=\"3362\" data-end=\"3386\" data-col-size=\"sm\">Betriebstemperatur<\/td>\n<td data-start=\"3386\" data-end=\"3398\" data-col-size=\"sm\">\u2264 1600\u00b0C<\/td>\n<\/tr>\n<tr data-start=\"3399\" data-end=\"3428\">\n<td data-start=\"3399\" data-end=\"3409\" data-col-size=\"sm\">Dichte<\/td>\n<td data-start=\"3409\" data-end=\"3428\" data-col-size=\"sm\">2,3 - 3,9 g\/cm\u00b3<\/td>\n<\/tr>\n<tr data-start=\"3429\" data-end=\"3469\">\n<td data-start=\"3429\" data-end=\"3456\" data-col-size=\"sm\">Widerstandsf\u00e4higkeit gegen thermische Schocks<\/td>\n<td data-start=\"3456\" data-end=\"3469\" data-col-size=\"sm\">Ausgezeichnet<\/td>\n<\/tr>\n<tr data-start=\"3470\" data-end=\"3518\">\n<td data-start=\"3470\" data-end=\"3487\" data-col-size=\"sm\">Oberfl\u00e4che<\/td>\n<td data-start=\"3487\" data-end=\"3518\" data-col-size=\"sm\">Pr\u00e4zisionsgeschliffen \/ poliert<\/td>\n<\/tr>\n<tr data-start=\"3519\" data-end=\"3560\">\n<td data-start=\"3519\" data-end=\"3527\" data-col-size=\"sm\">Form<\/td>\n<td data-start=\"3527\" data-end=\"3560\" data-col-size=\"sm\">Individuell (Rund \/ Ring \/ Teller)<\/td>\n<\/tr>\n<tr data-start=\"3561\" data-end=\"3588\">\n<td data-start=\"3561\" data-end=\"3568\" data-col-size=\"sm\">Gr\u00f6\u00dfe<\/td>\n<td data-start=\"3568\" data-end=\"3588\" data-col-size=\"sm\">Benutzerdefiniert verf\u00fcgbar<\/td>\n<\/tr>\n<tr data-start=\"3589\" data-end=\"3636\">\n<td data-start=\"3589\" data-end=\"3603\" data-col-size=\"sm\">Anmeldung<\/td>\n<td data-start=\"3603\" data-end=\"3636\" data-col-size=\"sm\">Halbleiter \/ CVD \/ Ofen<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/div>\n<\/div>\n<hr data-start=\"3638\" data-end=\"3641\" \/>\n<h2 data-section-id=\"mu966k\" data-start=\"3643\" data-end=\"3658\">Anwendungen<\/h2>\n<h3 data-section-id=\"1eipr13\" data-start=\"3660\" data-end=\"3686\">Halbleiterindustrie<\/h3>\n<ul data-start=\"3687\" data-end=\"3849\">\n<li data-section-id=\"13x15us\" data-start=\"3687\" data-end=\"3728\">Wafertr\u00e4ger f\u00fcr CVD-\/PECVD-Anlagen<\/li>\n<li data-section-id=\"1ox36e0\" data-start=\"3729\" data-end=\"3774\">Diffusion, Oxidation, Gl\u00fchprozesse<\/li>\n<li data-section-id=\"1t8nanb\" data-start=\"3775\" data-end=\"3811\">RTP und epitaktische Wachstumssysteme<\/li>\n<li data-section-id=\"1jzl031\" data-start=\"3812\" data-end=\"3849\">Wafer-Transfer- und -Handhabungsschalen<\/li>\n<\/ul>\n<hr data-start=\"3851\" data-end=\"3854\" \/>\n<h3 data-section-id=\"l1oj08\" data-start=\"3856\" data-end=\"3881\">LED &amp; Optoelektronik<\/h3>\n<ul data-start=\"3882\" data-end=\"3982\">\n<li data-section-id=\"dgfruo\" data-start=\"3882\" data-end=\"3911\">Bearbeitung von Saphir-Wafern<\/li>\n<li data-section-id=\"fwvbk7\" data-start=\"3912\" data-end=\"3943\">LED-Epitaxie-Tr\u00e4gersysteme<\/li>\n<li data-section-id=\"1gl4kjt\" data-start=\"3944\" data-end=\"3982\">Hochtemperatur-Substrattr\u00e4ger<\/li>\n<\/ul>\n<hr data-start=\"3984\" data-end=\"3987\" \/>\n<h3 data-section-id=\"480g89\" data-start=\"3989\" data-end=\"4018\">Vakuum- und Thermo\u00f6fen<\/h3>\n<ul data-start=\"4019\" data-end=\"4115\">\n<li data-section-id=\"kqy2l\" data-start=\"4019\" data-end=\"4055\">Hochtemperatur-Sinterschalen<\/li>\n<li data-section-id=\"jgks7q\" data-start=\"4056\" data-end=\"4083\">Tr\u00e4ger f\u00fcr Vakuum\u00f6fen<\/li>\n<li data-section-id=\"1c2tpui\" data-start=\"4084\" data-end=\"4115\">Vorrichtungen f\u00fcr die thermische Bearbeitung<\/li>\n<\/ul>\n<hr data-start=\"4117\" data-end=\"4120\" \/>\n<h3 data-section-id=\"1owf0zc\" data-start=\"4122\" data-end=\"4148\">Fortschrittliche Fertigung<\/h3>\n<ul data-start=\"4149\" data-end=\"4255\">\n<li data-section-id=\"odfyg7\" data-start=\"4149\" data-end=\"4181\">Pr\u00e4zise Keramikbearbeitung<\/li>\n<li data-section-id=\"1kui91r\" data-start=\"4182\" data-end=\"4215\">Vorrichtungen f\u00fcr die Automatisierungstechnik<\/li>\n<li data-section-id=\"135k87d\" data-start=\"4216\" data-end=\"4255\">Hochstabile mechanische Plattformen<\/li>\n<\/ul>\n<hr data-start=\"4257\" data-end=\"4260\" \/>\n<h2 data-section-id=\"dysc5y\" data-start=\"4262\" data-end=\"4283\"><img decoding=\"async\" class=\"wp-image-2098 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-300x300.png\" alt=\"\" width=\"276\" height=\"276\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-1.png 1000w\" sizes=\"(max-width: 276px) 100vw, 276px\" \/>Produktvorteile<\/h2>\n<ul data-start=\"4285\" data-end=\"4537\">\n<li data-section-id=\"an6nuo\" data-start=\"4285\" data-end=\"4326\">Ausgezeichnete Hochtemperaturbest\u00e4ndigkeit<\/li>\n<li data-section-id=\"1rm14qx\" data-start=\"4327\" data-end=\"4360\">Hervorragende W\u00e4rmeleitf\u00e4higkeit<\/li>\n<li data-section-id=\"wx5di6\" data-start=\"4361\" data-end=\"4391\">Hohe Dimensionsstabilit\u00e4t<\/li>\n<li data-section-id=\"ymf61l\" data-start=\"4392\" data-end=\"4413\">Lange Lebensdauer<\/li>\n<li data-section-id=\"1v5rrzz\" data-start=\"4414\" data-end=\"4440\">Geringes Kontaminationsrisiko<\/li>\n<li data-section-id=\"ddezgg\" data-start=\"4441\" data-end=\"4472\">Hohe Korrosionsbest\u00e4ndigkeit<\/li>\n<li data-section-id=\"xmyntv\" data-start=\"4473\" data-end=\"4507\">Kompatibel mit Vakuumsystemen<\/li>\n<li data-section-id=\"1ijrpkq\" data-start=\"4508\" data-end=\"4537\">Vollst\u00e4ndig anpassbares Design<\/li>\n<\/ul>\n<hr data-start=\"4539\" data-end=\"4542\" \/>\n<h2 data-section-id=\"1lwg0so\" data-start=\"4544\" data-end=\"4571\"><img decoding=\"async\" class=\"wp-image-2096 alignright\" src=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-300x300.png\" alt=\"\" width=\"280\" height=\"280\" srcset=\"https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-300x300.png 300w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-150x150.png 150w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-768x768.png 768w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-12x12.png 12w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-600x600.png 600w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3-100x100.png 100w, https:\/\/www.xkh-ceramics.com\/wp-content\/uploads\/2026\/05\/CVDSSiC-Silicon-Carbide-Tray-For-Semiconductor-Wafer-Processing-3.png 1000w\" sizes=\"(max-width: 280px) 100vw, 280px\" \/>Anpassungsf\u00e4higkeit<\/h2>\n<p data-start=\"4573\" data-end=\"4649\">Wir unterst\u00fctzen die vollst\u00e4ndige Anpassung auf der Grundlage von Zeichnungen oder Anwendungsanforderungen:<\/p>\n<ul data-start=\"4651\" data-end=\"4883\">\n<li data-section-id=\"1i7bvpn\" data-start=\"4651\" data-end=\"4689\">Durchmesser\/St\u00e4rke-Anpassung<\/li>\n<li data-section-id=\"dmyogn\" data-start=\"4690\" data-end=\"4720\">Optimierung der Schlitzgeometrie<\/li>\n<li data-section-id=\"19luai6\" data-start=\"4721\" data-end=\"4749\">Pr\u00e4zise Befestigungsl\u00f6cher<\/li>\n<li data-section-id=\"r5ngym\" data-start=\"4750\" data-end=\"4781\">Oberfl\u00e4chenpolieren \/ L\u00e4ppen<\/li>\n<li data-section-id=\"c4ihff\" data-start=\"4782\" data-end=\"4818\">Ultraflache Bearbeitung in Wafer-Qualit\u00e4t<\/li>\n<li data-section-id=\"1lf2kpf\" data-start=\"4819\" data-end=\"4853\">Auswahl hochreiner Materialien<\/li>\n<li data-section-id=\"881e6f\" data-start=\"4854\" data-end=\"4883\">Komplexer struktureller Entwurf<\/li>\n<\/ul>\n<p data-start=\"4885\" data-end=\"4956\">OEM- und ODM-Dienstleistungen f\u00fcr Hersteller von Halbleiterausr\u00fcstung.<\/p>\n<hr data-start=\"4958\" data-end=\"4961\" \/>\n<h2 data-section-id=\"1hryhf7\" data-start=\"4963\" data-end=\"4969\">FAQ<\/h2>\n<h3 data-section-id=\"1rw8tyo\" data-start=\"4971\" data-end=\"5025\">Q1: Wof\u00fcr wird ein Siliziumkarbid-Wafer-Tray verwendet?<\/h3>\n<p data-start=\"5026\" data-end=\"5173\">Es wird zur Unterst\u00fctzung und zum Transport von Wafern bei Halbleiterprozessen wie CVD, PECVD, Diffusion, Oxidation und Hochtemperaturgl\u00fchen verwendet.<\/p>\n<hr data-start=\"5175\" data-end=\"5178\" \/>\n<h3 data-section-id=\"8sm145\" data-start=\"5180\" data-end=\"5230\">F2: Warum wird SiC anstelle von Quarz oder Graphit verwendet?<\/h3>\n<p data-start=\"5231\" data-end=\"5244\">SiC bietet:<\/p>\n<ul data-start=\"5245\" data-end=\"5391\">\n<li data-section-id=\"66suke\" data-start=\"5245\" data-end=\"5278\">H\u00f6here Temperaturbest\u00e4ndigkeit<\/li>\n<li data-section-id=\"1k27992\" data-start=\"5279\" data-end=\"5309\">Bessere mechanische Festigkeit<\/li>\n<li data-section-id=\"1y67fsp\" data-start=\"5310\" data-end=\"5337\">Geringere W\u00e4rmeausdehnung<\/li>\n<li data-section-id=\"1kygjim\" data-start=\"5338\" data-end=\"5361\">L\u00e4ngere Nutzungsdauer<\/li>\n<li data-section-id=\"d0e53t\" data-start=\"5362\" data-end=\"5391\">Bessere chemische Stabilit\u00e4t<\/li>\n<\/ul>\n<hr data-start=\"5393\" data-end=\"5396\" \/>\n<h3 data-section-id=\"c1126k\" data-start=\"5398\" data-end=\"5433\">F3: Kann das Tablett individuell gestaltet werden?<\/h3>\n<p data-start=\"5434\" data-end=\"5527\">Ja. Wir bieten eine vollst\u00e4ndige Anpassung an, einschlie\u00dflich Gr\u00f6\u00dfe, Struktur, Dicke und Befestigungsdesign.<\/p>\n<hr data-start=\"5529\" data-end=\"5532\" \/>\n<h3 data-section-id=\"4sy20p\" data-start=\"5534\" data-end=\"5587\">F4: Ist es f\u00fcr schnelles Heizen und K\u00fchlen geeignet?<\/h3>\n<p data-start=\"5588\" data-end=\"5686\">Ja, SiC hat eine ausgezeichnete Temperaturwechselbest\u00e4ndigkeit und ist daher f\u00fcr Temperaturwechselprozesse geeignet.<\/p>","protected":false},"excerpt":{"rendered":"<p data-start=\"199\" data-end=\"404\">Die Siliziumkarbid-Waferschale ist ein hochleistungsf\u00e4higer keramischer Pr\u00e4zisionstr\u00e4ger, der f\u00fcr die Bearbeitung von Halbleiterwafern, CVD\/PECVD-Systeme, Vakuum\u00f6fen und industrielle Hochtemperaturumgebungen entwickelt wurde.<\/p>\n<p data-start=\"406\" data-end=\"666\">Die aus hochreinem CVD-SiC oder SSiC (gesintertes Siliziumkarbid) hergestellte Schale bietet eine hervorragende thermische Stabilit\u00e4t, mechanische Festigkeit und chemische Best\u00e4ndigkeit und gew\u00e4hrleistet eine stabile Handhabung der Wafer und eine gleichbleibende Prozessleistung unter extremen Bedingungen.<\/p>","protected":false},"featured_media":2097,"comment_status":"open","ping_status":"closed","template":"","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"default","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","ast-disable-related-posts":"","theme-transparent-header-meta":"default","adv-header-id-meta":"","stick-header-meta":"default","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"set","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}},"ast-content-background-meta":{"desktop":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"tablet":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""},"mobile":{"background-color":"var(--ast-global-color-5)","background-image":"","background-repeat":"repeat","background-position":"center center","background-size":"auto","background-attachment":"scroll","background-type":"","background-media":"","overlay-type":"","overlay-color":"","overlay-opacity":"","overlay-gradient":""}}},"product_brand":[],"product_cat":[23],"product_tag":[179,181,183,178,184,177,185,176,180,182,186],"class_list":["post-2095","product","type-product","status-publish","has-post-thumbnail","product_cat-silicon-carbide-sic","product_tag-cvd-sic-tray","product_tag-high-temperature-sic-tray","product_tag-pecvd-wafer-holder","product_tag-semiconductor-ceramic-tray","product_tag-semiconductor-processing-tray","product_tag-sic-wafer-carrier","product_tag-silicon-carbide-ceramic-components","product_tag-silicon-carbide-wafer-tray","product_tag-ssic-wafer-tray","product_tag-vacuum-furnace-tray","product_tag-wafer-processing-carrier","desktop-align-left","tablet-align-left","mobile-align-left","first","instock","shipping-taxable","product-type-simple"],"_links":{"self":[{"href":"https:\/\/www.xkh-ceramics.com\/de\/wp-json\/wp\/v2\/product\/2095","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.xkh-ceramics.com\/de\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.xkh-ceramics.com\/de\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/de\/wp-json\/wp\/v2\/comments?post=2095"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/de\/wp-json\/wp\/v2\/media\/2097"}],"wp:attachment":[{"href":"https:\/\/www.xkh-ceramics.com\/de\/wp-json\/wp\/v2\/media?parent=2095"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/de\/wp-json\/wp\/v2\/product_brand?post=2095"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/de\/wp-json\/wp\/v2\/product_cat?post=2095"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.xkh-ceramics.com\/de\/wp-json\/wp\/v2\/product_tag?post=2095"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}